A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

The subject of the invention is a method and device for reducing contamination in a plasma reactor, especially contamination by lubricants, particularly for plasma processing of materials. The method is based on the fact that the contaminated gas pumped out of at least one reduced pressure vacuum chamber in the form of a plasma lamp (LA.sub.1, LA.sub.2, LA.sub.3) is purified in at least one purifying plasma lamp (LA.sub.01, LA.sub.02, LA.sub.H, LA.sub.E), in which a glow discharge is initiated between the anodes of the purifying plasma lamp (A01, A02) and the cathodes of the purifying plasma lamp (K.sub.01, K.sub.02), favorably particles of lubricants are cracked and partially polymerized, while processed heavy particles of lubricants are collected in a buffer tank (ZB) and then discharged outside the pumping system. The device contains at least one reduced pressure vacuum chamber in the form of a plasma lamp (LA.sub.1, LA.sub.2, LA.sub.3), it is connected to at least one purifying plasma lamp (LA.sub.01, LA.sub.02, LA.sub.H, LA.sub.E) with a buffer tank (ZB) connected to a vacuum pump (PP). The vacuum tube connecting the plasma lamps (LA.sub.1, LA.sub.2, LA.sub.3) with the purifying plasma lamp (LA.sub.01, LA.sub.02, LA.sub.H, LA.sub.E)) is equipped with a dosing valve (V) for the gaseous admixture medium (MD) to plasma lamps (LA.sub.1, LA.sub.2, LA.sub.3), from which radiation (R.sub.1, R.sub.2, R.sub.3) is directed to the processed material (OM).

The subject of the invention is a method and device for reducing contamination in a plasma reactor, especially contamination by lubricants, particularly for plasma processing of materials. The method is based on the fact that the contaminated gas pumped out of at least one reduced pressure vacuum chamber in the form of a plasma lamp (LA.sub.1, LA.sub.2, LA.sub.3) is purified in at least one purifying plasma lamp (LA.sub.01, LA.sub.02, LA.sub.H, LA.sub.E), in which a glow discharge is initiated between the anodes of the purifying plasma lamp (A01, A02) and the cathodes of the purifying plasma lamp (K.sub.01, K.sub.02), favorably particles of lubricants are cracked and partially polymerized, while processed heavy particles of lubricants are collected in a buffer tank (ZB) and then discharged outside the pumping system. The device contains at least one reduced pressure vacuum chamber in the form of a plasma lamp (LA.sub.1, LA.sub.2, LA.sub.3), it is connected to at least one purifying plasma lamp (LA.sub.01, LA.sub.02, LA.sub.H, LA.sub.E) with a buffer tank (ZB) connected to a vacuum pump (PP). The vacuum tube connecting the plasma lamps (LA.sub.1, LA.sub.2, LA.sub.3) with the purifying plasma lamp (LA.sub.01, LA.sub.02, LA.sub.H, LA.sub.E)) is equipped with a dosing valve (V) for the gaseous admixture medium (MD) to plasma lamps (LA.sub.1, LA.sub.2, LA.sub.3), from which radiation (R.sub.1, R.sub.2, R.sub.3) is directed to the processed material (OM).

A germicidal UV amalgam lamp with an elongated tubular lamp body and at least two filaments located on opposite ends of the lamp body. The lamp body is hermetically sealed with a pinch-sealed portion at both opposite ends, confining a gas volume in which a gas discharge can be produced along a discharge path between the filaments. Each filament has two electrical connectors, each including an internal portion connected to the filament and pinch-sealed into the lamp body. Each connector also includes an external portion located outside the lamp body for electrical connection of the lamp to a controlled power supply. The pinch-sealed portion bears a socket with an electrical temperature sensor and at least two electrical connections mounted to the socket. The at least two electrical connections of the temperature sensor are connected in parallel to the electrical connectors of the filament.

The present invention provides a lamp device comprising: a glass tube configured to cover a discharge space in which a pair of electrodes are arranged so as to face each other; and a bayonet cap portion provided in an end portion of the glass tube and electrically connected to one electrode of the pair of electrodes, wherein the bayonet cap portion is formed to have a shape including a bottom surface and a peripheral surface, and includes, in the bottom surface, a first opening configured to supply a gas to an inside of the bayonet cap portion and a second opening configured to exhaust the gas from the inside of the bayonet cap portion.

The present invention provides a lamp device comprising: a glass tube configured to cover a discharge space in which a pair of electrodes are arranged so as to face each other; and a bayonet cap portion provided in an end portion of the glass tube and electrically connected to one electrode of the pair of electrodes, wherein the bayonet cap portion is formed to have a shape including a bottom surface and a peripheral surface, and includes, in the bottom surface, a first opening configured to supply a gas to an inside of the bayonet cap portion and a second opening configured to exhaust the gas from the inside of the bayonet cap portion.

A gaseous-phase ionizing radiation generator for the voltage controlled production, flux, and use of one or more forms of ionizing electromagnetic and/or particulate radiation including: embodiments to collect and convert the particulate radiation that is generated by the radiation generator into electricity; embodiments that generate electricity from the ionized gas within the radiation generator by means of an auxiliary electrode structure composed of interdigitated individual electrodes of alternating work function; and a method or procedure for the fabrication and the activation of at least one working electrode composed in part of a metal hydride host material that is not formally considered to be radioactive.

A gaseous-phase ionizing radiation generator for the voltage controlled production, flux, and use of one or more forms of ionizing electromagnetic and/or particulate radiation including: embodiments to collect and convert the particulate radiation that is generated by the radiation generator into electricity; embodiments that generate electricity from the ionized gas within the radiation generator by means of an auxiliary electrode structure composed of interdigitated individual electrodes of alternating work function; and a method or procedure for the fabrication and the activation of at least one working electrode composed in part of a metal hydride host material that is not formally considered to be radioactive.

A system for generating broadband radiation is disclosed. The system includes a target material source configured to deliver one or more of a liquid or solid state target material to a plasma-forming region of a chamber. The system further includes a pump source configured to generate pump radiation to excite the target material in the plasma forming region of the chamber to generate broadband radiation. The system is further configured to transmit at least a portion of the broadband radiation generated in the plasma-forming region of the chamber out of the chamber through a windowless aperture.

A broadband radiation source is disclosed. The system may include a plasma containment vessel configured to receive laser radiation from a pump source to sustain a plasma within gas flowed through the plasma containment vessel. The plasma containment vessel may be further configured to transmit at least a portion of broadband radiation emitted by the plasma. The system may also include a recirculation gas loop fluidically coupled to the plasma containment vessel. The recirculation gas loop may be configured to transport heated gas from an outlet of the plasma containment vessel, and further configured to transport cooled gas to an inlet of the plasma containment vessel.