Patent classifications
H01J2235/1291
High brightness x-ray reflection source
An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.
High temperature annealing in X-ray source fabrication
The present disclosure relates to multi-layer X-ray sources having decreased hydrogen within the layer stack and/or tungsten carbide inter-layers between the primary layers of X-ray generating and thermally-conductive materials. The resulting multi-layer target structures allow increased X-ray production, which may facilitate faster scan times for inspection or examination procedures.
System and method for depth-selectable x-ray analysis
A system for x-ray analysis includes at least one x-ray source configured to emit x-rays. The at least one x-ray source includes at least one silicon carbide sub-source on or embedded in at least one thermally conductive substrate and configured to generate the x-rays in response to electron bombardment of the at least one silicon carbide sub-source. At least some of the x-rays emitted from the at least one x-ray source includes Si x-ray emission line x-rays. The system further includes at least one x-ray optical train configured to receive the Si x-ray emission line x-rays and to irradiate a sample with at least some of the Si x-ray emission line x-rays.
A ROTARY ANODE FOR AN X-RAY SOURCE
The rotatable anode of a rotating anode X-ray source has demanding requirements placed upon it. For example, it may rotate at a frequency as high as 200 Hz. X-ray emission is stimulated by applying a large voltage to the cathode, causing electrons to collide with the focal track. The focal spot generated at the electron impact position may have a peak temperature between 2000 C. and 3000 C. The constant rotation of the rotating anode protects the focal track to some extent, however the average temperature of the focal track immediately following a CT acquisition protocol may still be around 1500 C. Therefore, demanding requirements are placed upon the design of the rotating anode. The present application proposes a multi-layer coating for the target region of a rotating X-ray anode which improves mechanical resilience and thermal resilience, whilst reducing the amount of expensive refractory metals required.
Analytical X-ray tube with high thermal performance
An analytical X-ray tube with an anode target material that emits characteristic X-rays in response to excitation by an electron beam may include any of several advantageous features. The target material is deposited on a diamond substrate layer, and a metal carbide intermediate layer may be provided between the target material and substrate that provides enhanced bonding therebetween. An interface layer may also be used that provides an acoustic impedance matching between the target material and the substrate. For a low thermal conductivity target material, a heat dissipation layer of a higher thermal conductivity material may also be included between the target material and substrate to enhance thermal transfer. The target material may have a thickness that corresponds to a maximum penetration depth of the electrons of the electron beam, and the structure may be such that a predetermined temperature range is maintained at the substrate interface.
CODED X-RAY TARGET
A target for generating x-rays includes at least one substrate including a first material and a plurality of discrete structures including at least one second material configured to generate x-rays in response to electron bombardment. The discrete structures are distributed across a first surface of the at least one substrate in an array pattern function A that has a corresponding function B such that a combination operation of the array pattern function A with the corresponding function B generates a resultant function C comprising a first portion with a single peak and a substantially flat second portion surrounding the first portion. The combination operation includes a cross-correlation operation or a convolution operation
HIGH BRIGHTNESS X-RAY REFLECTION SOURCE
An x-ray target, x-ray source, and x-ray system are provided. The x-ray target includes a thermally conductive substrate comprising a surface and at least one structure on or embedded in at least a portion of the surface. The at least one structure includes a thermally conductive first material in thermal communication with the substrate. The first material has a length along a first direction parallel to the portion of the surface in a range greater than 1 millimeter and a width along a second direction parallel to the portion of the surface and perpendicular to the first direction. The width is in a range of 0.2 millimeter to 3 millimeters. The at least one structure further includes at least one layer over the first material. The at least one layer includes at least one second material different from the first material. The at least one layer has a thickness in a range of 2 microns to 50 microns. The at least one second material is configured to generate x-rays upon irradiation by electrons.
Multi-layer X-ray source fabrication
Fabrication of a multi-layer X-ray source is disclosed using bulk structures to fabricate a multi-layer target structure. In one implementation, layers of X-ray generating material, such as tungsten, are interleaved with thermally conductive layers, such as diamond layers. To prevent delamination of the layers, various mechanical, chemical, and/or structural approaches may also be employed.
Multi-layer X-ray source target
The present disclosure relates to the production and use of a multi-layer X-ray source target. In certain implementations, layers of X-ray generating material may be interleaved with thermally conductive layers. To prevent delamination of the layers, various mechanical, chemical, and structural approaches are related, including approaches for reducing the internal stress associated with the deposited layers and for increasing binding strength between layers.
MULTILAYER X-RAY SOURCE TARGET WITH STRESS RELIEVING LAYER
An X-ray source target includes a structure configured to generate X-rays when impacted by an electron beam. The structure has an X-ray generating layer comprising X-ray generating material, and a thermally-conductive layer is adjacent to and in thermal communication with the X-ray generating layer. A stress relieving layer is adjacent to the thermally-conductive layer. The thermally-conductive layer is sandwiched between the X-ray generating layer and the stress relieving layer.