Signal electrons with high energy that pass near an optical axis, for example, backscattered electrons or secondary electrons in a booster optical system, can be detected. Therefore, there is provided a charged particle beam device including: a charged particle beam source configured to generate a charged particle beam; an objective lens configured to focus the charged particle beam to a sample; and a first charged particle detecting element disposed between the charged particle beam source and the objective lens and configured to detect charged particles generated by an interaction between the charged particle beam and the sample, in which a detection surface of the first charged particle detecting element is disposed on a center axis of the objective lens.

An electron beam irradiation device that can irradiate an object in water with an electron beam is provided. An acceleration tube 11 includes an acceleration space 21 in which an electron beam generated by an electron gun 12 is accelerated and an irradiation port 22 through which the electron beam accelerated in the acceleration space 21 can be irradiated to the outside. Hydrogen gas 32 supply means 13 can supply the acceleration space 21 with hydrogen gas 32 at a predetermined pressure. The hydrogen gas 32 supplied to the acceleration space 21 by the hydrogen gas 32 supply means 13 is emitted from the irradiation port 22 and the electron beam irradiated from the irradiation port 22 passes through the hydrogen gas 32 emitted from the irradiation port 22.

The present disclosure provides a filament power supply for an electron accelerator and an electron accelerator. The filament power supply includes: a rectifier circuit configured to convert a power frequency AC voltage signal into a DC voltage signal; an inverter circuit configured to convert the DC voltage signal into an AC voltage signal; a sampling circuit configured to sample the AC voltage signal to obtain a current sampling signal or a voltage sampling signal; a pulse width modulation control chip configured to adjust a pulse width modulation signal until a voltage of the current sampling signal is equal to that of a reference current signal, or a voltage of the voltage sampling signal is equal to that of a reference voltage signal; a modulation circuit configured to modulate the power frequency AC voltage signal to obtain a modulation signal and output the pulse width modulation signal and the modulation signal.

A charged particle beam device capable of easily discriminating the energy of secondary charged particles is realized. The charged particle beam device includes a charged particle source, a sample stage on which a sample is placed, an objective lens that irradiates the sample with a charged particle beam from the charged particle source, a deflector that deflects secondary charged particles released by irradiating the sample with the charged particle beam, a detector that detects the secondary charged particles deflected by the deflector, a sample voltage control unit that applies a positive voltage to the sample or the sample stage, and a deflection intensity control unit that controls the intensity with which the deflector deflects the secondary charged particles.

To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.

The invention relates to an aberration correcting device for correcting aberrations of focusing lenses in an electron microscope. The device comprises a first and a second electron mirror, each comprising an electron beam reflecting face. Between said mirrors an intermediate space is arranged. The intermediate space comprises an input side and an exit side. The first and second electron mirrors are arranged at opposite sides of the intermediate space, wherein the reflective face of the first and second mirror are arranged facing said intermediate space. The first mirror is arranged at the exit side and the second mirror is arranged at the input side of the intermediate space. In use, the first mirror receives the electron beam coming from the input side and reflects said beam via the intermediate space towards the second mirror. The second mirror receives the electron beam coming from the first mirror, and reflects the electron beam via the intermediate space towards the exit side. The incoming electron beam passes said second mirror at a position spaced apart from the reflection position on the second mirror. At least one of the electron mirrors is arranged to provide a correcting aberration to a reflected electron beam.

The present disclosure provides a filament power supply for an electron accelerator and an electron accelerator. The filament power supply includes: a rectifier circuit configured to convert a power frequency AC voltage signal into a DC voltage signal; an inverter circuit configured to convert the DC voltage signal into an AC voltage signal; a sampling circuit configured to sample the AC voltage signal to obtain a current sampling signal or a voltage sampling signal; a pulse width modulation control chip configured to adjust a pulse width modulation signal until a voltage of the current sampling signal is equal to that of a reference current signal, or a voltage of the voltage sampling signal is equal to that of a reference voltage signal; a modulation circuit configured to modulate the power frequency AC voltage signal to obtain a modulation signal and output the pulse width modulation signal and the modulation signal.

An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.

An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize contaminant particles and means to block or retard the ionized particles to prevent their reaching the beam target.

An apparatus and method for processing a workpiece with a beam is described. The apparatus includes a vacuum chamber having a beam-line for forming a particle beam and treating a workpiece with the particle beam, and a scanner for translating the workpiece through the particle beam. The apparatus further includes a scanner control circuit coupled to the scanner, and configured to control a scan property of the scanner, and a beam control circuit coupled to at least one beam-line component, and configured to control the beam flux of the particle beam according to a duty cycle for switching between at least two different states during processing.