Patent classifications
H01J2237/1405
User interface for an electron microscope
A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively.
Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections
A scanning electron microscopy system may include an electron-optical sub-system and a controller. The electron-optical sub-system may include an electron source and an electron-optical column configured to direct an electron beam to a sample. The electron-optical column may include a double-lens assembly, a beam limiting aperture disposed between a first and second lens of the double-lens assembly, and a detector assembly configured to detect electrons scattered from the sample. In embodiments, the controller of the scanning electron microscopy system may be configured to: cause the electron-optical sub-system to form a flooding electron beam and perform flooding scans of the sample with the flooding electron beam; cause the electron-optical sub-system to form an imaging electron beam and perform imaging scans of the sample with the imaging electron beam; receive images acquired by the detector assembly during the imaging scans; and determine characteristics of the sample based on the images.
Scanning electron microscope and objective lens
There is provided a scanning electron microscope which has a sample chamber capable of being evacuated to a low vacuum. The scanning electron microscope includes an electron gun for emitting an electron beam, an objective lens for focusing the emitted beam onto a sample, and a sample chamber in which the sample is housed. The objective lens includes an inner polepiece, an outer polepiece disposed outside the inner polepiece and facing the sample chamber, at least one through-hole extending through the inner and outer polepieces, and at least one cover member that closes off the through-hole. An opening is formed between the inner polepiece and the outer polepiece. The objective lens causes leakage of magnetic field from the opening toward the sample. The sample chamber has a degree of vacuum lower than that in an inner space that forms an electron beam path inside the inner polepiece.
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD FOR ALIGNING THE MULTI-BEAM PARTICLE MICROSCOPE, AND COMPUTER PROGRAM PRODUCT
For aligning magnetic lenses in a multi-beam particle microscope, an electrically controllable mechanical alignment and fixing mechanism with an actuator system is provided for at least one global alignable magnetic lens. The mechanism is configured to mechanically align and mechanically fix a position of the at least one alignable magnetic lens in the particle optical beam path in a plane orthogonal to the optical axis of the multi-beam particle microscope. A controller is configured to electrically control the electrically controllable mechanical alignment and fixing mechanism.
TRANSMISSION ELECTRON MICROSCOPE WITH VARIABLE EFFECTIVE FOCAL LENGTH
In a transmission electron microscope, an intermediate lens assembly receives a beam of electrons after leaving a primary lens and forms an image of a sample in a sample holder. The intermediate lens assembly comprises a first lens, a second lens, a first port in a first port plane and a second port in a second port plane. The first port and the second port receive a wave front manipulating device for manipulating the wave front of the beam. In a first mode, a controller controls the first and second lenses to direct the diffraction pattern into a second diffraction plane wherein the second diffraction plane is coincident with the first port plane. In a second mode, the controller controls the first and second lenses to direct the diffraction pattern into a third diffraction plane wherein the third diffraction plane is coincident with the second port plane.
Charged particle beam device, and method for controlling charged particle beam device
The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG. 6A).
MULTI-BEAM IMAGE ACQUISITION APPARATUS AND DRIFT CORRECTION METHOD FOR MULTIPLE SECONDARY ELECTRON BEAMS
According to one aspect of the present invention, a multi-beam image acquisition apparatus, includes: a deflector configured to cause at least one detector of the detector array to detect a signal waveform caused by an incidence position of a detected secondary electron beam on the at least one detector of the detector array detecting multiple secondary electron beams emitted due to irradiating an object with multiple primary electron beams in a case that a predetermined period of time has passed from start of irradiation of the multiple primary electron beams by deflecting the multiple secondary electron beams; a deviation amount calculation circuit configured to calculate a deviation amount of the incidence position using the signal waveform; and a corrector configured to correct incidence positions of the multiple secondary electron beams on the detector array so as to reduce the deviation amount.