A sample manipulation system for a sample to be used in a charged particle beam process. The sample manipulation system includes a carrier defining a passageway, a wire slidably supported and at least partially housed by the carrier, and a feed mechanism. The wire is configured to slide through the passageway. The wire includes a supported portion and a protruding portion. The supported portion is disposed in the passageway and the protruding portion extends from the carrier for engaging the sample. The feed mechanism is configured to drive the wire through the passageway to control a length of the protruding portion.

Exemplary semiconductor processing systems may include a chamber body including sidewalls and a base. The chamber body may define an interior volume. The systems may include a substrate support extending through the base of the chamber body. The substrate support may be configured to support a substrate within the interior volume. The systems may include a faceplate positioned within the interior volume of the chamber body. The faceplate may define a plurality of apertures through the faceplate. The systems may include a leveling apparatus seated on the substrate support. The leveling apparatus may include a plurality of piezoelectric pressure sensors.

An apparatus for use in a processing chamber is provided. A consumable is within the processing chamber. A scale is positioned to measure a mass of the consumable.

A nanoscale positioning system for positioning a positionable component includes a motion platform including a first end, a second end, a shuttle positioned between the first end and the second end and configured to support the positionable component, a flexure member, and a fluid passage extending through the flexure member from the first end to the second end of the motion platform, and a pressure controller coupled to the motion platform and fluidically connected to the fluid passage, wherein the pressure controller is configured to selectably provide a fluid pressure in the fluid passage to flex the flexure member whereby the shuttle is displaced along a motion axis of the motion platform.

A micro-electromechanical system (MEMS) device includes a silicon substrate; and a Tantalum (Ta) layer comprising a first portion and a second portion, a first portion being suspended over the silicon substrate and configured to move relative to the silicon substrate, and the second portion of the structure being coupled to the silicon substrate and fixed in place relative to the silicon substrate.

A lock for introducing and discharging a sample receiving element into a mass spectrometer is described. Also described is a set comprising a holder for sample receiving elements and a sample receiving element that can be held by the holder. Also described is a mass spectrometer, in particular a MALDI-TOF mass spectrometer.