A method for positioning a specimen in a microscope system includes overserving and/or processing a region of interest (ROI) on the specimen. The microscope system includes: an optical axis; a movable specimen stage for receiving a specimen; a memory apparatus for storing data records that describe the positions of the specimen; and a control apparatus, which can control the movement of the specimen stage with the aid of the stored data records. The method includes: holding a specimen region (ROI) in the first position; storing a first data record, by which the first position is described, wherein the first position is defined as independent position; storing a second data record, by which the second position is described, wherein the second position is linked to the independent position; and calling one of the stored data records such that the specimen stage is moved in such a way that the specimen region is held at the position that is described by the called data record.

Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller can be configured to determine the position of the sample based on the signal and in response to the determined position, provide information associated with the determined position for control of one of a first handling unit in a first chamber, a second handling unit in a second chamber, and a beam location unit in the second chamber.

The purpose of the present invention is to provide a height measurement device with which, even when the height of a sample surface varies considerably, it is possible, with a relatively simple configuration, to perform height measurement with high accuracy at various heights. In order to achieve the abovementioned purpose, proposed is an optical height measurement device characterized by being provided with: a stage for retaining a sample; a stage driving unit for adjusting the stage at different heights; a projection optical system for projecting light onto the sample; a detection optical system for receiving light reflected from the sample; and a processing unit for measuring the height of the sample on the basis of a signal outputted from the detection optical system, wherein the projection optical system is provided with a light source that emits light, and an optical path dividing element for branching the optical path of the light emitted from the light source, and the detection optical system is provided with a sensor for receiving light reflected from the sample, and an element for adjusting the light path of the light reflected from the sample in the direction of the sensor prior to reception of the light by the sensor.

A wafer inspection system includes a controller in communication with an electron-beam inspection tool. The controller includes circuitry to: acquire, via an optical imaging tool, coordinates of defects on a sample; set a Field of View (FoV) of the electron-beam inspection tool to a first size to locate a subset of the defects; determine a position of each defect of the subset of the defects based on inspection data generated by the electron-beam inspection tool during a scanning of the sample; adjust the coordinates of the defects based on the determined positions of the subset of the defects; and set the FoV of the electron-beam inspection tool to a second size to locate additional defects based on the adjusted coordinates.

Cryo compatible sample grids having multi-modal cryo-EM compatible GUIDs, according to the present disclosure include an outer support structure that defines a region of the grid for holding one or more samples, and a plurality of inner support structures that define a plurality of apertures that are each configured to hold a sample. Cryo compatible sample grids further include a first identifier located on the outer support structure, and a second identifier located within the region of the grid for holding the one or more samples. The first identifier is readable with an optical detector, while the second identifier is readable with an electron detector (e.g., within an electron microscope). Specifically, the second identifier is readable with an electron detector when one or more teeth and/or holes that comprise the second identifier are filled with ice from a vitrification process.

A method of operating a charged particle beam device is disclosed, including focusing a charged particle beam onto a sample with an objective lens assembly; passing a reflected light beam through a bore of the objective lens assembly to an interferometer; and interferometrically determining a z-position of the sample with the interferometer. A charged particle beam device is disclosed, including a charged particle beam generator which has a charged particle source. A charged particle path for the charged particle beam extends through a bore of an objective lens assembly toward a sample stage. An interferometer is arranged to receive a reflected light beam which passes through the bore of the objective lens assembly.

To provide, in observation of a sample that requires a movement between various devices, a charged particle beam device, a method for processing the sample, and an observation method which facilitate the movement between the devices. The charged particle beam device that processes an observation target on the sample using a charged particle beam includes: a sample stage on which the sample is placed; an observation unit configured to observe the observation target; and a writing unit configured to write information of the observation target in a writing position of the sample.

An observation method includes placing a specimen on a specimen supporting film of a specimen support, attaching the specimen support to a retainer, attaching the retainer to an optical microscope retainer holding base, attaching the optical microscope retainer holding base to a specimen stage of an optical microscope and observing the specimen under the optical microscope, attaching the retainer to a transmission electron microscope retainer holding base, and loading the transmission electron microscope retainer holding base into a transmission electron microscope and observing the specimen under the transmission electron microscope.

A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.

In a substrate support according to one exemplary embodiment, an adhesive is provided between an upper surface of a base and a lower surface of the electrostatic chuck. The base, the adhesive, and the electrostatic chuck provide a supply path for supplying a heat transfer gas between the electrostatic chuck and a substrate. The upper surface of the base defines one or more grooves. The one or more grooves are further away from a center of the upper surface than the supply path. The adhesive is provided to cover an upper end opening of each of the one or more grooves. The heat transfer gas is capable of being supplied to the one or more grooves via the supply path or a different flow path. The substrate support further includes a pressure sensor to measure pressure in the one or more grooves.