H01J2237/3128

THREE-DIMENSIONAL LAYER-BY-LAYER SHAPING APPARATUS, THREE-DIMENSIONAL LAYER-BY-LAYER SHAPING APPARATUS CONTROL METHOD, AND THREE-DIMENSIONAL LAYER-BY-LAYER SHAPING APPARATUS CONTROL PROGRAM

This invention can maintain the temperature of the shaping plane in a three-dimensional layer-by-layer shaping apparatus. A three-dimensional layer-by-layer shaping apparatus includes a material spreader that spreads the material or materials of a three-dimensional layer-by-layer shaped object onto the shaping plane on which the three-dimensional layer-by-layer shaped object is to be shaped; an electron gun that generates an electron beam; at least one deflector that deflects the electron beam so that it scans the shaping plane one- or two-dimensionally; at least one lens that is positioned between the electron gun and the deflector, and focuses the electron beam; a focus controller that controls the focus of the electron beam based on which region is to be scanned by the electron beam; and a controller that controls the deflecting direction of the deflector and the scanning rate.

QUALITY CONTROL METHOD FOR REGULATING THE OPERATION OF AN ELECTROMECHANICAL APPARATUS, FOR EXAMPLE AN EBM APPARATUS, IN ORDER TO OBTAIN CERTIFIED PROCESSED PRODUCTS
20180113445 · 2018-04-26 ·

The invention relates to a method for regulating the operation of an electromechanical apparatus (1), for example an EBM apparatus, in order to obtain certified processed products, wherein it is provided an initial calibration step that is intended to check the proper functioning of all the component parts of the apparatus (1) structured to ensure the complete functionality and a subsequent quality control step carried out on the obtained products by the carried out working process. The method entails the following steps: defining a plurality of measurement parameters relating to the component parts of the apparatus; measuring at least some of said parameters by means of sensors and/or measurement indicators related to said parameters during at least one processing phase performed by the apparatus; performing a quality control step on the obtained products after the working process obtaining data on any deviation from the expected quality; comparing the detected measurements of said parameters and data on any deviation from the expected quality with corresponding values of reference parameters available for that specific apparatus and for those products; detecting any deviations in one or more of said parameters or said data with respect to the values of the reference parameters; computing, on the basis of such differences, a total correction and regulation value; applying said total correction and regulation value preferably to only one of said parameters prior to the subsequent process, for example to the generation energy of the electrons beam (3). Basically, the method of the present invention allows obtaining semi-finished products free from structural defects by means of a primary check of the correct functioning of the various component parts of the apparatus (calibration procedure), a secondary check of the operational effectiveness of the process itself (operational qualification procedure) and a further final check of the process stability and repeatability within a process window (performance qualification).

Films and the like produced from particles by processing with electron beams, and a method for production thereof

An article composed of sintered particles is produced by depositing ligand-containing particles on a substrate, then scanning the substrate with an electron beam that generates sufficient surface and subsurface heating to substantially eliminate the ligands and melt or sinter the particles into a cohesive film with superior charge carrier properties. The particles are sintered or melted together to form a polycrystalline layer that is substantially ligand-free to form, for example, a film such as a continuous polycrystalline film. The scanning operation is conducted so as to heat treat a controllably localized region at and below a surface of the particles by selecting a rate of deposited energy at the region to exceed a rate of conduction away from the substrate.

METHOD AND DEVICE FOR CHARACTERIZING AN ELECTRON BEAM
20170294288 · 2017-10-12 ·

A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

Method and device for characterizing an electron beam
09721755 · 2017-08-01 · ·

A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

Materials having two surfaces with different coefficients of thermal expansion
09714800 · 2017-07-25 ·

A body comprising at least two components having one or more different properties and a method of producing the same are disclosed. One of the body components is in the form of particles with optional adhesive interlayers. A second of the components has a surface locally melted in a predetermined pattern and only to a predetermined depth by scanning an electron beam there across to incorporate the particles and form a metal composite film. Thereby, a predetermined volumetric concentration of the incorporated particles varies continuously from the locally melted surface so as to provide two surfaces in the body having different coefficients of thermal expansion.

Forming method of plasma resistant oxyfluoride coating layer

The present invention relates to a method of forming a plasma resistant oxyfluoride coating layer, including: mounting a substrate on a substrate holder provided in a chamber; causing an electron beam scanned from an electron gun to be incident on an oxide evaporation source accommodated in a first crucible, and heating, melting, and vaporizing the oxide evaporation source as the electron beam is incident on the oxide evaporation source; vaporizing a fluoride accommodated in a second crucible; and advancing an evaporation gas generated from the oxide evaporation source and a fluorine-containing gas generated from the fluoride toward the substrate, and reacting the evaporation gas generated from the oxide evaporation source and the fluorine-containing gas generated from the fluoride to deposit an oxyfluoride on the substrate. According to the present invention, it is possible to form a dense and stable oxyfluoride coating layer having excellent plasma resistance, suppressed generation of contaminant particles, and no cracks.

Electron gun and system and method using electron gun
12237140 · 2025-02-25 · ·

Examples of an electron gun with a moving cathode station and a moving anode station are described. The moving cathode has a driver that moves the station and comprises a plurality of cathodes with a plurality of bias cups to control a thermal electron emission region by applying a bias voltage to the bias cup. The moving anode station comprises a plurality of anodes and has driver to move the anode station such that a position of each anode is synchronized with a positioned of a respective matching pair of cathode and bias cup. A controller that is in communication with the anode and cathode moving stations controls the bias voltage and the drivers to control the amount of thermal electrons and to synchronize and align a predetermined cathode with a predetermined anode thus controlling the size and parameters of the generated electron beam.

ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN
20250054720 · 2025-02-13 ·

Examples of an electron gun with a moving cathode station and a moving anode station are described. The moving cathode has a driver that moves the station and comprises a plurality of cathodes with a plurality of bias cups to control a thermal electron emission region by applying a bias voltage to the bias cup. The moving anode station comprises a plurality of anodes and has driver to move the anode station such that a position of each anode is synchronized with a positioned of a respective matching pair of cathode and bias cup. A controller that is in communication with the anode and cathode moving stations controls the bias voltage and the drivers to control the amount of thermal electrons and to synchronize and align a predetermined cathode with a predetermined anode thus controlling the size and parameters of the generated electron beam.

Apparatus and method for forming a three-dimensional article
12269092 · 2025-04-08 · ·

An apparatus for forming a three-dimensional article through successively depositing individual layers of powder material that are fused together with an electron beam from an electron beam source so as to form the article according to a computer model thereof. The apparatus includes a chamber a chamber having a first section and a second section openly connected to each other. The first section is configured to receive the individual layers of powder material. The second section comprising an electron beam source, an electromagnetic focus coil having an axially extending, and a reflector coil. The electron beam source is configured to emit an electron beam to fuse the individual layers of powder material. The reflector coil is arranged radially outside the electromagnetic focus coil. The direction of windings of the reflector coil is opposite a direction of windings of the electromagnetic focus coil.