H01J2237/3132

Coating arrangement and method
11021787 · 2021-06-01 · ·

In accordance with various embodiments, a coating arrangement may comprise: an electron beam gun for providing an electron beam; a beam trap for trapping the electron beam; a control device for driving the electron beam gun and/or the beam trap, wherein the control device is configured to switch over the driving between a plurality of configurations, of which: in a first configuration, the electron beam is directed onto the beam trap; and in a second configuration, the electron beam is directed past the beam trap.

WAFER HOLDER FOR FILM DEPOSITION CHAMBER
20210118700 · 2021-04-22 ·

The present disclosure provides a flexible workpiece pedestal capable of tilting a workpiece support surface. The workpiece pedestal further includes a heater mounted on the workpiece support surface. The heater includes a plurality of heating sources such as heating coils. The plurality of heating sources in the heater allows heating the workpiece at different temperatures for different zones of the workpiece. For example, the workpiece can have a central zone heated by a first heating coil, a first outer ring zone that is outside of the central zone heated by a second heating coil, a second outer ring zone that is outside of the first outer ring zone heated by a third heating coil. By using the tunable heating feature and the tilting feature of the workpiece pedestal, the present disclosure can reduce or eliminate the shadowing effect problem of the related workpiece pedestal in the art.

Apparatus and Methods for Beam Processing of Substrates
20210109450 · 2021-04-15 ·

A substrate processing system including a processing chamber, a substrate holder configured to hold and rotate a substrate about an axis perpendicular to a working surface of the substrate; an electron emitter adapted to emit a first electron beam directed at a first surface of a peripheral region of the substrate, the first electron beam having a first beam energy and a first beam current sufficient to vaporize material from the first surface of the peripheral region of the substrate; an airflow system configured to direct a flow of gas across the working surface of the substrate; and an exhaust system configured to collect the gas comprising the material vaporized from the peripheral region.

ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS

Embodiments described herein provide apparatus, software applications, and methods of a coating process, such as an Electron Beam Physical Vapor Deposition (EBPVD) of thermal barrier coatings (TBCs) on objects. The objects may include aerospace components, e.g., turbine vanes and blades, fabricated from nickel and cobalt-based super alloys. The apparatus, software applications, and methods described herein provide at least one of the ability to detect an endpoint of the coating process, i.e., determine when a thickness of a coating satisfies a target value, and the ability for closed-loop control of process parameters.

ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS

Embodiments described herein provide apparatus, software applications, and methods of a coating process, such as an Electron Beam Physical Vapor Deposition (EBPVD) of thermal barrier coatings (TBCs) on objects. The objects may include aerospace components, e.g., turbine vanes and blades, fabricated from nickel and cobalt-based super alloys. The apparatus, software applications, and methods described herein provide at least one of the ability to detect an endpoint of the coating process, i.e., determine when a thickness of a coating satisfies a target value, and the ability for closed-loop control of process parameters.

ASSEMBLY AND CONTAINER FOR PHYSICAL VAPOR DEPOSITION WITH HEAT DISSIPATION
20200248299 · 2020-08-06 ·

Disclosed is an assembly including: a crucible including at least one cavity; a container for a material to be vaporized, the container being intended to be disposed inside the cavity of the crucible. The container includes: a container lateral surface including an upper part and a lower part, the upper part being configured to be at least partially in surface contact with a cavity lateral surface when the container is disposed inside the cavity, the lower part being configured to be distant from the cavity lateral surface to form a free space surrounding the container between the lower part and the cavity lateral surface when the container is disposed inside the cavity; and a container bottom surface configured to be at least partially in contact with a cavity bottom surface.

CARBON MATERIALS

There is described a carbon material comprising sp.sup.2 and sp.sup.3 hybridised carbon. Also described is a method of making a carbon material the method comprising: exposing a substrate to a flux of at least 10.sup.11 carbon ions per cm.sup.2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. Further, electrodes comprising the carbon material are described. The electrodes may operate as an anode in Li ion battery characterised with improved specific capacity and operation life-time.

Plasma driven particle propagation apparatus and pumping method
10593515 · 2020-03-17 · ·

A charged particle propagation apparatus has a generator including a vacuum chamber with a gun therein for discharging a charged particle beam through a beam exit. A higher pressure region adjoins the vacuum chamber at the beam exit and is maintainable at a pressure greater than a pressure of the vacuum chamber. A plasma interface located at the beam exit includes a plasma channel having at least three electrode plates disposed between its first end and its second end. A control system is adapted to apply a sequence of electrical currents to the electrode plates, which cause at least one plasma to move from the first end to the second end of the plasma channel, thereby pumping down the beam exit, and, in use, the charged particle beam is propagated from the vacuum chamber through the, or each, plasma into the higher pressure region.

Coating arrangement and method
20200017953 · 2020-01-16 ·

In accordance with various embodiments, a coating arrangement may comprise: an electron beam gun for providing an electron beam; a beam trap for trapping the electron beam; a control device for driving the electron beam gun and/or the beam trap, wherein the control device is configured to switch over the driving between a plurality of configurations, of which: in a first configuration, the electron beam is directed onto the beam trap; and in a second configuration, the electron beam is directed past the beam trap.

POWER POLISHING APPARATUSES AND METHODS FOR IN-SITU FINISHING AND COATING OF OPTICAL COMPONENT
20200001423 · 2020-01-02 · ·

A finishing and coating apparatus is configured for power polishing optical components. The apparatus includes a housing, a substrate holder, a vacuum pump system, a laser, and a coating source. The housing defines a chamber and the substrate holder is disposed within the chamber and configured to hold one or more optical components. The vacuum pump system is configured to create a vacuum within the chamber. The laser includes a laser engine and a laser beam delivery apparatus configured to direct a beam from the laser engine toward the one or more optical components. The laser is configured to finish the one or more optical components prior to coating the one or more optical components.