A semiconductor package includes: a first semiconductor chip stack including a plurality of first semiconductor chips which are stacked in a vertical direction; a bridge die stack disposed to be spaced apart from the first semiconductor chip stack in a horizontal direction and including a plurality of bridge dies which are stacked in the vertical direction, wherein the bridge dies include through electrodes, respectively, and the through electrodes aligned in the vertical direction are connected to each other through a connection electrode between the bridge dies; a redistribution layer disposed over the first semiconductor chip stack and the bridge die stack; a second semiconductor chip disposed over the redistribution layer and configured to receive a voltage through the through electrodes aligned in the vertical direction, the connection electrode, and the redistribution layer; and a voltage regulator configured to adjust the voltage.

A 3D device including: a first level including first transistors and a first interconnect; a second level including second transistors, the second level overlaying the first level; and at least eight electronic circuit units (ECUs), where each of the at least eight ECUs includes a first circuit, the first circuit including a portion of the first transistors, where each of the at least eight ECUs includes a second circuit, the second circuit including a portion of the second transistors, where each of the at least eight ECUs includes a first vertical bus, where the first vertical bus includes greater than eight pillars and less than three hundred pillars, where the first vertical bus provides electrical connections between the first circuit and the second circuit, where the second level is bonded to the first level, and where the bonded includes oxide to oxide bonding regions and metal to metal bonding regions.

An electronic component includes an insulating layer that has a principal surface, a passive device that includes a low voltage pattern that is formed in the insulating layer and a high voltage pattern that is formed in the insulating layer such as to oppose the low voltage pattern in a normal direction to the principal surface and to which a voltage exceeding a voltage to be applied to the low voltage pattern is to be applied, and a shield conductor layer that is formed in the insulating layer such as to be positioned in a periphery of the high voltage pattern in plan view, shields an electric field formed between the low voltage pattern and the high voltage pattern, and suppresses electric field concentration with respect to the high voltage pattern.

Microelectronic devices having stacked electromagnetic coils are disclosed. In one example, a microelectronic device can include a first semiconductor element and a second semiconductor element disposed on the first semiconductor element. The microelectronic device can also include an electromagnetic coil. A first portion of the electromagnetic coil and a second portion of the electromagnetic coil may be spaced apart by the first semiconductor element. A first conductive via extending through the first semiconductor element may connect the first and second portions of the electromagnetic coil. Methods for forming such microelectronic devices are also disclosed.

A semiconductor device has laminated therein three or more chips. The plurality of chips are provided with substrates, transmission coils, and reception coils that are disposed in regions where the transmission coils and the reception coils do not overlap with each other in an in-plane direction of the substrates. The transmission coils are disposed in regions that are in a lamination direction and that are adjacent to and overlap with reception coils of other chips. The reception coils are configured to allow data transmission with respect to the transmission coils that are disposed on the same substrates.

Disclosed are redistribution substrates and semiconductor packages including the same. The semiconductor package comprises a redistribution substrate, a semiconductor chip mounted on the redistribution substrate, and an inductor structure in the redistribution substrate and electrically connected to the semiconductor chip. The inductor structure includes an outer coil pattern including a plurality of vertical parts and a horizontal part that connects the plurality of vertical parts to each other, and an inner coil pattern between the vertical parts and electrically connected to the outer coil pattern. The horizontal part includes a first conductive layer, and a second conductive layer between the first conductive layer and the inner coil pattern. The second conductive layer has a thickness that is less than a thickness of the first conductive layer.

A semiconductor device includes a semiconductor substrate, an interconnection layer and an inductor pattern. The interconnection layer is disposed on the semiconductor substrate. The inductor pattern is electrically connected to the interconnection layer. The inductor pattern includes a first conductive line joined with a first terminal, a second conductive line joined with a second terminal, and a plurality of conductive coils. The conductive coils are joining the first conductive line to the second conductive line, and includes an outer coil joined with the first conductive line, an inner coil joined with the second conductive line and the outer coil. The second conductive line is spaced apart from a first side of the inner coil in a first direction by distance Y, the second terminal is spaced apart from a second side of the inner coil in a second direction by distance X1, wherein X1>1.25Y.

A semiconductor device includes a through-silicon via (TSV) in a TSV zone in a substrate and the TSV extends through the substrate; an ESD cell proximal to a first end of the TSV and in contact with the TSV zone, the ESD cell including a set of diodes electrically connected in parallel to each other; an antenna pad electrically connected to a second end of the TSV; and an antenna electrically connected to the antenna pad and extending in a first direction, the first direction is parallel to a major axis of the TSV. The semiconductor device includes a conductive pillar extending parallel to the TSV at a same side of the substrate as the antenna pad, wherein a first end of the conductive pillar electrically connects to the antenna pad, and a second end of the conductive pillar electrically connects to the set of diodes of the ESD cell.

Provided is an inductor stack structure. The inductor stack structure include a substrate; at least two metal layers sequentially stacked on one side of the substrate, each metal layer at least comprises a first plane inductor; a through hole, which is located between any two neighboring metal layers, first plane inductors in different metal layers are electrically connected through the through hole; and a thickness of the through hole is greater than that of the metal layer.

A microelectronic assembly is provided, comprising a first IC die having an electrical load circuit, a second IC die having a portion of a voltage regulator (VR) electrically coupled to the first IC die, a package substrate having inductors of the VR electrically coupled to the first IC die and the second IC die, and a mold compound between the first IC die and the package substrate. The VR receives power at a first voltage from the package substrate and provides power at a second voltage to the electrical load circuit, the second voltage being lower than the first voltage. In various embodiments, the second IC die is in the mold compound. In some embodiments, the mold compound and the second IC die are comprised in a discrete interposer electrically coupled to the first IC die with die-to-die interconnects and to the package substrate with die-to-package substrate interconnects.