A microelectronic device includes a doped region of semiconductor material having a first region and an opposite second region. The microelectronic device is configured to provide a first operational potential at the first region and to provide a second operational potential at the second region. The microelectronic device includes field plate segments in trenches extending into the doped region. Each field plate segment is separated from the semiconductor material by a trench liner of dielectric material. The microelectronic device further includes circuitry electrically connected to each of the field plate segments. The circuitry is configured to apply bias potentials to the field plate segments. The bias potentials are monotonic with respect to distances of the field plate segments from the first region of the doped region.

A semiconductor device has a semiconductor wafer with a plurality of semiconductor die. The semiconductor wafer has a low resistivity. An insulating layer is formed over the semiconductor wafer. A first IPD is formed over the insulating layer. The first IPD can be a capacitor, resistor, or inductor. A second IPD is formed over a second surface of the semiconductor wafer opposite the first surface of the semiconductor wafer. An interconnect structure is formed over the first IPD. An interconnect substrate is provided with the semiconductor die disposed over the interconnect substrate. A bond wire is formed between the interconnect structure and the interconnect substrate. Alternatively, an active device is formed in a second surface of the semiconductor die opposite the first surface of the semiconductor die. The semiconductor die incorporates the hybrid substrate to allow IPD and active devices to be formed from a single substrate.

A semiconductor device is disclosed. In one example, the semiconductor device includes: an electronic component having a top surface, a bottom surface, and two end portions; a plurality of contacts disposed on the top surface; and a plurality of metal nodes disposed on the plurality of contacts. The plurality of contacts includes two end contacts disposed at the two end portions respectively and at least one intermediate contact disposed between the two end contacts. The plurality of metal nodes includes two end metal nodes disposed on the two end contacts respectively and at least one intermediate metal node disposed on the at least one intermediate contact.

A surface mount component is disclosed including an electrically insulating beam that is thermally conductive. The electrically insulating beam has a first end and a second end that is opposite the first end. The surface mount component includes a thin-film component formed on the electrically insulating beam adjacent the first end of the electrically insulating beam. A heat sink terminal is formed on the electrically insulating beam adjacent a second end of the electrically insulating beam. In some embodiments, the thin-film component has an area power capacity of greater than about 0.17 W/mm.sup.2 at about 28 GHz.

Lands (11c and 11d) are parts of base plates (104c and 104d), and electrodes of a shunt resistor (103U) are put on and connected to the lands (11c and 11d). Slits (130 and 131) are formed in the lands (11c and 11d) to separate a main electric circuit in which a main current flows and control terminals (123 and 124) with which the electric potentials of the electrodes of the shunt resistor (103U) are detected. Leading end portions of the slits (130 and 131) extend to the vicinity of the electrodes of the shunt resistor (103U).

In an example, there is disclosed a configurable impedance element, having: a first impedance network including a plurality of series impedance elements and providing an initial impedance; a trim impedance network parallel to the first impedance network, including a plurality of corresponding impedance elements to the impedance elements of the first impedance network; and antifuses between the impedance elements of the first impedance network and their corresponding impedance elements of the trim network. There is also disclosed an integrated circuit including the impedance element, and a method of manufacturing and configuring the impedance element.

Various embodiments disclosed relate to embedded components in glass core layers for semiconductor assemblies. The present disclosure includes a semiconductor assembly with a glass core having one or more cavities and a component embedded into the glass core at the one or more cavities portion, the component at least partially embedded in the glass core, and a semiconductor die attached to the substrate.

Various embodiments disclosed relate to embedded components in glass core layers for semiconductor assemblies. The present disclosure includes a semiconductor assembly with a glass core having one or more cavities and a component embedded into the glass core at the one or more cavities portion, the component at least partially embedded in the glass core, and a semiconductor die attached to the substrate.

Various embodiments disclosed relate to embedded components in glass core layers for semiconductor assemblies. The present disclosure includes a semiconductor assembly with a glass core having one or more cavities and a component embedded into the glass core at the one or more cavities portion, the component at least partially embedded in the glass core, and a semiconductor die attached to the substrate.

An intermediate connector includes a power source bus bar as an elongated thin plate to be connected to each power source pad of a semiconductor integrated circuit, a ground bus bar as an elongated thin plate to be connected to each ground pad of the semiconductor integrated circuit, a thin film insulator layer formed between the power source bus bar and the ground bus bar, and a conductive path portion as an elongated thin plate including a plurality of conductive paths to be connected to each signal pad of the semiconductor integrated circuit. The power source bus bar, the ground bus bar, and the conductive path portion are arranged in parallel correspondingly to a parallel arrangement of a power source pad row, a ground pad row, and a signal pad row of the semiconductor integrated circuit.