In embodiments, a semiconductor package may include a first die and a second die. The package may additionally include a serializer/deserializer (SerDes) die coupled with the first and the second dies. The SerDes die may be configured to serialize signals transmitted from the first die to the second die, and deserialize signals received from the second die. Other embodiments may be described and/or claimed.

A semiconductor device includes a first layer including a plurality of wirings arranged in line and space layout and a second layer including a pad electrically connected to at least one of the wirings, wherein the wirings and the pads are patterned by different lithographic processes.

After finishing of the front side CMOS manufacturing process, the silicon wafer is permanently bonded with its front side onto a carrier wafer. The carrier wafer is a high resistivity silicon wafer or a wafer of a dielectric or of a ceramic material. The silicon substrate of the device wafer is thinned from the back side such that the remaining silicon thickness is only a few micrometers. In the area dedicated to a spiral inductor, the substrate material is entirely removed by a masked etching process and the resulting gap is filled with a dielectric material. A spiral inductor coil is formed on the backside of the wafer on top of the dielectric material. The inductor coil is connected to the CMOS circuits on the front side by through-silicon vias.

Disclosed herein is a method comprising: forming a first electrically conductive layer on a first surface of a substrate of semiconductor, wherein the first electrically conductive layer is in electrical contact with the semiconductor; bonding, at the first electrically conductive layer, a support wafer to the substrate of semiconductor; thinning the substrate of semiconductor.

A semiconductor device having a channel between active sections or portions of the device is disclosed. An elastic material, such as dielectric or a polymer, is deposited into the channel and cured to increase flexibility and thermal expansion properties of the semiconductor device. The elastic material reduces the thermal and mechanical mismatch between the semiconductor device and the substrate to which the semiconductor device is coupled in downstream processing to improve reliability. The semiconductor device may also include a plurality of channels formed transverse with respect to each other. Some of the channels extend all the way through the semiconductor device, while other channels extend only partially through the semiconductor device.

A discrete three-dimensional (3-D) processor comprises first and second dice. The first die comprises 3-D memory (3D-M) arrays, whereas the second die comprises logic circuits and at least an off-die peripheral-circuit component of the 3D-M array(s). Typical off-die peripheral-circuit component could be an address decoder, a sense amplifier, a programming circuit, a read-voltage generator, a write-voltage generator, a data buffer, or a portion thereof.

A discrete three-dimensional (3-D) processor comprises stacked first and second dice. The first die comprises three-dimensional memory (3D-M) arrays, whereas the second die comprises at least a portion of a logic/processing circuit and an off-die peripheral-circuit component of the 3D-M array(s). The preferred 3-D processor can be used to compute non-arithmetic function/model. In other applications, the preferred 3-D processor may also be a 3-D configurable computing array, a 3-D pattern processor, or a 3-D neuro-processor.

Disclosed are a display substrate, a preparation method therefor, and a display device. The display substrate includes a display region and a binding region on one side of the display region. The binding region includes a binding structure layer disposed on a base. The binding structure layer includes a composite insulating layer disposed on the base. The binding region further includes a step structure formed by the base and the composite insulating layer. Heights of steps in the step structure decrease sequentially in the direction away from the display region. In the step structure, the base forms a first step having the smallest height. The binding structure layer further includes a signal connection wire having at least a portion thereof the disposed on the step structure and located on the first step. An opening exposing the signal connection wire is provided on the base at the first step.

A semiconductor chip, a semiconductor package including the same, and a method of fabricating the same, the semiconductor chip including a substrate that includes a device region and an edge region; a device layer and a wiring layer that are sequentially stacked on the substrate; a subsidiary pattern on the wiring layer on the edge region; a first capping layer that covers a sidewall of the subsidiary pattern, a top surface of the wiring layer, and a sidewall of the wiring layer, the first capping layer including an upper outer sidewall and a lower outer sidewall, the lower outer sidewall being offset from the upper outer sidewall; and a buried dielectric pattern in contact with the lower outer sidewall of the first capping layer and spaced apart from the upper outer sidewall of the first capping layer.

In an embodiment, a method includes attaching a first package component to a first carrier, the first package component comprising: an aluminum pad disposed adjacent to a substrate; a sacrificial pad disposed adjacent to the substrate, the sacrificial pad comprising a major surface opposite the substrate, a protrusion of the sacrificial pad extending from the major surface; and a dielectric bond layer disposed around the aluminum pad and the sacrificial pad; attaching a second carrier to the first package component and the first carrier, the first package component being interposed between the first carrier and the second carrier; removing the first carrier; planarizing the dielectric bond layer to comprise a top surface being coplanar with the protrusion; and etching a portion of the protrusion.