A method for depositing a conductive coating on a surface is provided, the method including treating the surface by depositing fullerene on the surface to produce a treated surface and depositing the conductive coating on the treated surface. The conductive coating generally includes magnesium. A product and an organic optoelectronic device produced according to the method are also provided.

Discloses is a method of manufacturing a solar cell with an increased power generation area to increase the area used for actual power generation without increasing the size of the solar cell.

The present disclosure is directed to a method of processing a solar cell device. The method comprises detecting at least one inconsistency at a surface of a semiconductor substrate having a solar cell active region formed therein. A deposition pattern is determined based on the location of the at least one inconsistency. A material is selectively deposited on the substrate according to the deposition pattern.

A sensor device provided in the disclosure includes a sensor substrate, a first transparent layer, a collimator layer, and a lens. The first transparent layer is disposed on the sensor substrate, wherein the first transparent layer defines an alignment structure. The collimator layer is disposed on the first transparent layer. The lens is disposed on the collimator layer.

A solar cell includes polysilicon P-type and N-type doped regions on a backside of a substrate, such as a silicon wafer. A trench structure separates the P-type doped region from the N-type doped region. Each of the P-type and N-type doped regions may be formed over a thin dielectric layer. The trench structure may include a textured surface for increased solar radiation collection. Among other advantages, the resulting structure increases efficiency by providing isolation between adjacent P-type and N-type doped regions, thereby preventing recombination in a space charge region where the doped regions would have touched.

Disclosed in embodiments of the present disclosure are a display panel and a manufacturing method therefor, and a display apparatus. The display panel includes: a base substrate; an organic functional film layer provided on the base substrate; an insulating layer provided on the organic functional film layer, a plurality of dents distributed at intervals are provided on one side of the insulating layer distant from the organic functional film layer; and an amorphous silicon solar cell film layer provided at one side of the insulating layer distant from the organic functional film layer, the amorphous silicon solar cell film layer has the same morphology as the surface of the insulating layer where the dents are provided.

A thin film solar cell including a substrate, an insulating layer, a first electrode layer, a photovoltaic conversion layer and a second electrode layer is provided. The insulating layer is disposed on the substrate and includes a plurality of microstructures. An orthographic projection of the plurality of microstructures is a regular geometric shape or an irregular geometric shape regarding to a normal direction of the substrate. The first electrode layer is disposed on the insulating layer. A thickness of the first electrode layer is less than 1 μm or is equal to 1 μm. The photovoltaic conversion layer is disposed on the first electrode layer. The second electrode layer is disposed on the photovoltaic conversion layer.

The present disclosure relates to a method that includes contacting a surface of a first layer that includes a Group III element and a Group V element with a gas that includes HCl, where the first layer is positioned in thermal contact with a wafer positioned in a chamber of a reactor, and the contacting results in a roughening of the surface.

A method for depositing a conductive coating on a surface is provided, the method including treating the surface by depositing fullerene on the surface to produce a treated surface and depositing the conductive coating on the treated surface. The conductive coating generally includes magnesium. A product and an organic optoelectronic device produced according to the method are also provided.

An optical sensor includes a substrate, a first/second/third well disposed in a sensing region, a deep trench isolation structure, and a passivation layer. The substrate has a first conductivity type and includes the sensing region. The first well has a second conductivity type and a first depth. The second well has the second conductivity type and a second depth. The third well has the first conductivity type and a third depth. The deep trench isolation structure is disposed in the substrate and surrounding the sensing region, wherein the depth of the deep trench isolation structure is greater than the first depth, the first depth is greater than the second depth, and the second depth is greater than the third depth. The passivation layer is disposed over the substrate, wherein the passivation layer includes a plurality of protruding portions disposed directly above the sensing region.