H01L31/095

Far-infrared sensor packaging structure

An optical component packaging structure is provided. The optical component packaging structure includes a substrate, a far-infrared sensor chip, a metal covering cap and a light filter. The far-infrared sensor chip is disposed on the substrate and electrically connected to the substrate. The metal covering cap is disposed on the substrate and accommodating the far-infrared sensor chip. The metal covering cap has an opening exposing the far-infrared sensor chip. The light filter is disposed out of the opening and on the inner surface for covering the opening to filter the far-infrared light passing through. The far-infrared sensor chip is surrounded by the metal covering cap, the substrate and the light filter, and the metal covering cap is directly connected with the substrate.

TFT and manufacturing method thereof, array substrate, display panel and diving method, display device

The present disclosure discloses a TFT and a manufacturing method thereof, an array substrate, a display panel and a driving method thereof, and a display device, which relates to the field of display technology, and is provided for solving a problem of a larger overall power consumption of the display device. The TFT comprises a substrate; a first gate, a bottom gate dielectric layer and an insulating layer sequentially stacked on the substrate; a source and a drain arranged on the insulating layer; and a top gate dielectric layer, a second gate and a passivation layer sequentially stacked on the source, the drain and the insulating layer, wherein the first gate or the second gate is a photosensitive material gate. The TFT and the display panel provided by the present disclosure are applied in the display device.

Apparatus for damping and monitoring emissions from light emitting devices

The present invention relates to an apparatus for damping arid monitoring emissions from a light emitting device, particularly a vertical cavity surface emitting laser (VCSEL), comprising: a semi transparent substrate, preferably glass; a light emitting device for generating light emission; a damping layer deposited on a surface of the substrate; and a pair of electrodes, each of which being in direct contact with the damping layer. The damping layer is adapted to decrease the power level of the light emission of the light emitting device by absorption, to a desired level, for instance, to a level that meets eye safety limits. In addition, the damping layer is photosensitive to the light emission of the light emitting device, thereby allowing the pair of electrodes to output an electric signal corresponding to the power level of the light emission of the light emitting device.

SOLID-STATE IMAGE SENSING ELEMENT AND IMAGING SYSTEM

Each of a plurality of pixels arranged in two dimensions includes a photoelectric conversion unit including a pixel electrode, a photoelectric conversion layer provided above the pixel electrode, and a counter electrode provided so as to sandwich the photoelectric conversion layer between the counter electrode and the pixel electrode, and a microlens arranged above the photoelectric conversion unit. The plurality of pixels includes a first pixel and a plurality of second pixels. At least either the pixel electrodes of the plurality of second pixels are smaller than the pixel electrode of the first pixel or the counter electrodes of the plurality of second pixels are smaller than the counter electrode of the first pixel, and a configuration between the counter electrode and the microlens of the first pixel is the same as a configuration between the counter electrode and the microlens of each of the plurality of second pixels.

OPTICAL COMPONENT PACKAGING STRUCTURE
20180269337 · 2018-09-20 ·

The instant disclosure provides an optical component packaging structure which includes a far-infrared sensor chip, a first metal layer, a packaging housing and a covering member. The far-infrared sensor chip includes a semiconductor substrate and a semiconductor stack structure. The semiconductor substrate has a first surface, a second surface which is opposite to the first surface, and a cavity. The semiconductor stack structure is disposed on the first surface of the semiconductor substrate, and a part of the semiconductor stack structure is located above the cavity. The first metal layer is disposed on the second surface of the semiconductor substrate, the packaging housing is used to encapsulate the far-infrared sensor chip and expose at least a part of the far-infrared sensor chip, and the covering member is disposed above the semiconductor stack structure.

Solid-state image sensing element and imaging system

Each of a plurality of pixels arranged in two dimensions includes a photoelectric conversion unit including a pixel electrode, a photoelectric conversion layer provided above the pixel electrode, and a counter electrode provided so as to sandwich the photoelectric conversion layer between the counter electrode and the pixel electrode, and a microlens arranged above the photoelectric conversion unit. The plurality of pixels includes a first pixel and a plurality of second pixels. At least either the pixel electrodes of the plurality of second pixels are smaller than the pixel electrode of the first pixel or the counter electrodes of the plurality of second pixels are smaller than the counter electrode of the first pixel, and a configuration between the counter electrode and the microlens of the first pixel is the same as a configuration between the counter electrode and the microlens of each of the plurality of second pixels.

TFT AND MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE, DISPLAY PANEL AND DIVING METHOD, DISPLAY DEVICE
20180174552 · 2018-06-21 ·

The present disclosure discloses a TFT and a manufacturing method thereof, an array substrate, a display panel and a driving method thereof, and a display device, which relates to the field of display technology, and is provided for solving a problem of a larger overall power consumption of the display device. The TFT comprises a substrate; a first gate, a bottom gate dielectric layer and an insulating layer sequentially stacked on the substrate; a source and a drain arranged on the insulating layer; and a top gate dielectric layer, a second gate and a passivation layer sequentially stacked on the source, the drain and the insulating layer, wherein the first gate or the second gate is a photosensitive material gate. The TFT and the display panel provided by the present disclosure are applied in the display device.

Optical component packaging structure

The instant disclosure provides an optical component packaging structure which includes a far-infrared sensor chip, a first metal layer, a packaging housing and a covering member. The far-infrared sensor chip includes a semiconductor substrate and a semiconductor stack structure. The semiconductor substrate has a first surface, a second surface which is opposite to the first surface, and a cavity. The semiconductor stack structure is disposed on the first surface of the semiconductor substrate, and a part of the semiconductor stack structure is located above the cavity. The first metal layer is disposed on the second surface of the semiconductor substrate, the packaging housing is used to encapsulate the far-infrared sensor chip and expose at least a part of the far-infrared sensor chip, and the covering member is disposed above the semiconductor stack structure.

Photo-Controllable Composite Dielectric Material

A photoconductive device is provided for changing dielectric properties in response to select electromagnetic radiation. The device includes an optical core, an optical filter disposed on the core, and an optically clear insulator disposed on the filter. One example core is a quantum dot. Another example core is an optically clear core overlaid by a photoconductive coating disposed thereon.

SENSOR, MANUFACTURING METHOD THEREOF AND ELECTRONIC DEVICE
20180122841 · 2018-05-03 ·

A sensor, a manufacturing method thereof and an electronic device. The sensor includes: a base substrate; a thin-film transistor (TFT) disposed on the base substrate and including a source electrode; a first insulation layer disposed on the TFT and provided with a first through hole running through the first insulation layer; a conductive layer disposed in the first through hole and on part of the first insulation layer and electrically connected with the source electrode via the first through hole; a bias electrode disposed on the first insulation layer and separate from the conductive layer; a sensing active layer respectively connected with the conductive layer and the bias electrode; and an auxiliary conductive layer disposed on the conductive layer. The sensor and the manufacturing method thereof improve the conductivity and ensure normal transmission of signals by arranging the auxiliary conductive layer on the conductive layer without addition of processes.