Patent classifications
H01L33/0058
Narrow-Band Frequency Filters and Splitters, Photonic Sensors, and Cavities Having Pre-Selected Cavity Modes
Waveguides and electromagnetic cavities fabricated in hyperuniform disordered materials with complete photonic bandgaps are provided. Devices comprising electromagnetic cavities fabricated in hyperuniform disordered materials with complete photonic bandgaps are provided. Devices comprising waveguides fabricated in hyperuniform disordered materials with complete photonic bandgaps are provided. The devices include electromagnetic splitters, filters, and sensors.
METHODS FOR THE GROWTH OF A GRAPHENE LAYER STRUCTURE ON A SUBSTRATE AND AN OPTO-ELECTRONIC DEVICE
The present invention relates to methods for the growth of a graphene layer structure on a substrate, wherein the substrate has a first surface for contacting a susceptor and a second surface for the formation of a graphene layer structure, wherein the substrate is a laminate wafer comprising a silicon support providing the first surface and a germanium layer providing the second surface: and opto-electronic devices obtainable therefrom.
Narrow-band frequency filters and splitters, photonic sensors, and cavities having pre-selected cavity modes
Waveguides and electromagnetic cavities fabricated in hyperuniform disordered materials with complete photonic bandgaps are provided. Devices comprising electromagnetic cavities fabricated in hyperuniform disordered materials with complete photonic bandgaps are provided. Devices comprising waveguides fabricated in hyperuniform disordered materials with complete photonic bandgaps are provided. The devices include electromagnetic splitters, filters, and sensors.
FLEXIBLE SILICON INFRARED EMITTER
An apparatus includes a flexible silicon (Si) substrate, such as a crystalline n-type substrate, and a heterostructure structure formed on the silicon substrate. The heterojunction structure includes a first layered structured deposited on a first side of the silicon substrate. The first layered structured includes a first amorphous intrinsic silicon layer, an amorphous n-type or p-type silicon layer, and a transparent conductive layer. The second layered structure includes a second amorphous intrinsic silicon layer, an amorphous p-type or n-type silicon layer, and a transparent conductive layer. The heterostructure structure is configured to operate as a photovoltaic cell and an infrared light emitting diode.