A display device includes: a pixel located on a substrate in a display area; and an optical structure located on the substrate in a non-display area, the optical structure including a first layer. A refractive index of the first layer is greater than a refractive index of the substrate.

A display device includes a substrate including a display area for displaying an image, and a non-display area around the display area, fan-out lines above the substrate, top antistatic layers along edges of a top surface above the substrate, and electrically connected to the fan-out lines, lead lines below the substrate, side connecting lines on sides of the substrate, and electrically connecting the fan-out lines and the lead lines, and bottom antistatic layers along edges of a bottom surface below the substrate, and electrically connected to the lead lines.

A display apparatus includes a light-emitting diode disposed on a substrate, the light-emitting diode including a first electrode arranged in a display area, a second electrode disposed on the first electrode, and an emission layer disposed between the first electrode and the second electrode, and a main common voltage line arranged in a non-display area outside the display area, the main common voltage line electrically connected to the second electrode, the main common voltage line including an inner edge adjacent to the display area and an outer edge opposite to the inner edge, and a pattern including bars arranged in a direction from the inner edge to the outer edge.

A light-emitting device includes a semiconductor stack, a first electrode, a first electrode pad, and second electrode pads. The semiconductor stack includes a first semiconductor layer, a first mesa formed on the first semiconductor layer, and second mesas spaced apart from each other and formed on the first semiconductor layer and separated from the first mesa. The first mesa and the second mesas respectively include a second semiconductor layer on having a second conductivity type different from a first conductivity type of the semiconductor stack. The first electrode covers and contacts the first mesa and is electrically connected to the first semiconductor layer. The first electrode pad is formed on the first mesa and is connected to the first electrode layer. The second electrode pads are formed on the second mesas, and are electrically connected to the second semiconductor layer of each of the second mesas.

A micro light-emitting element includes a first conductivity type semiconductor layer including a lower surface on which an uneven pattern is formed, an active layer provided on the first conductivity type semiconductor layer, a second conductivity type semiconductor layer provided on the active layer, at least one electrode provided on the second conductivity type semiconductor layer, and a transparent coating layer including a first surface covering the lower surface of the first conductivity type semiconductor layer, and a second surface facing the first surface and having a second surface roughness that is less than a first surface roughness of the lower surface of the first conductivity type semiconductor layer.

Provided is a light-emitting diode (LED) device that includes a continuous non-segmented edge contact along at least one side of a semiconductor layer. A first set of independent contacts connected to a first doped layer and a set of edge contacts connected to the second doped layer. Multiple conductive vias connect the independent contacts to the first doped layer, allowing differing corresponding via currents to be applied to the first doped layer through the vias independent of one another.

Discussed is a display device including a semiconductor light emitting device. A display device can include a substrate, first assembly electrodes, second assembly electrodes and the first assembly electrodes spaced apart from each other on the substrate, an insulating layer disposed on the second assembly electrode, an assembly barrier wall including a predetermined assembly hole and disposed on the insulating layer, a plating layer electrically connected to the first assembly electrode and the second assembly electrode, and a semiconductor light emitting device disposed in the assembly hole and electrically connected to the first assembly electrode and the second assembly electrode by the plating layer.

A light-emitting device includes a semiconductor stack, first and second insulative layers, a reflective conductive structure, and first and second pads. The semiconductor stack includes a first semiconductor layer, and a mesa having an active region having a second semiconductor layer and formed on the first semiconductor layer. The first insulative layer is formed on the semiconductor stack and has first openings. The reflective conductive structure is formed on the first insulative layer and is electrically connected to the second semiconductor layer through the first openings. The second insulative layer is formed on the reflective conductive structure and includes second openings and a contact area covering portions overlapped with the first and second openings. A first pad is formed on the second insulative layer and electrically connected to the first semiconductor layer. A second pad formed on the second insulative layer and electrically connected to the second semiconductor layer.

A method for fabricating a light emitting element includes preparing a substrate, and forming a first semiconductor material layer, a light emitting material layer, a second semiconductor material layer and an electrode material layer on the substrate, forming semiconductor rods spaced apart from each other by etching the first semiconductor material layer, the light emitting material layer, the second semiconductor material layer and the electrode material layer in a direction perpendicular to an upper surface of the substrate, forming an insulating layer surrounding sides of the semiconductor rods through a sol-gel process by immersing the substrate, including the semiconductor rods, in a solution containing a precursor material, and forming light emitting elements by separating the semiconductor rods, including the insulating layer, from the substrate, and the light emitting elements have an external quantum efficiency of 20.2±0.6%.

A pixel structure is provided. The pixel structure includes a substrate and a conductive line electrically connected to the substrate. The ratio of the height to the width of the conductive line is between 0.5 and 6. The pixel structure also includes an electrode electrically connected to the conductive line and a conversion element electrically connected to the conductive lines through the electrode.