A semiconductor device includes a first semiconductor chip adjacent a second semiconductor chip. The first semiconductor chip includes a first surface and a second surface. The second semiconductor chip includes a third surface and a fourth surface. The third surface faces the second surface. A first through-electrode and a second through-electrode are between the first and second surfaces. A third through-electrode is between the third surface and the fourth surface and is connected to the first through-electrode. A fourth through-electrode is between the third surface and the fourth surface and is connected to the second through-electrode. An end of the first through-electrode has a first magnetic polarity on the second surface, and an end of the second through-electrode has a second magnetic polarity opposite to the first magnetic polarity on the second surface.

A semiconductor device includes a first semiconductor chip adjacent a second semiconductor chip. The first semiconductor chip includes a first surface and a second surface. The second semiconductor chip includes a third surface and a fourth surface. The third surface faces the second surface. A first through-electrode and a second through-electrode are between the first and second surfaces. A third through-electrode is between the third surface and the fourth surface and is connected to the first through-electrode. A fourth through-electrode is between the third surface and the fourth surface and is connected to the second through-electrode. An end of the first through-electrode has a first magnetic polarity on the second surface, and an end of the second through-electrode has a second magnetic polarity opposite to the first magnetic polarity on the second surface.

A semiconductor device includes a first semiconductor chip adjacent a second semiconductor chip. The first semiconductor chip includes a first surface and a second surface. The second semiconductor chip includes a third surface and a fourth surface. The third surface faces the second surface. A first through-electrode and a second through-electrode are between the first and second surfaces. A third through-electrode is between the third surface and the fourth surface and is connected to the first through-electrode. A fourth through-electrode is between the third surface and the fourth surface and is connected to the second through-electrode. An end of the first through-electrode has a first magnetic polarity on the second surface, and an end of the second through-electrode has a second magnetic polarity opposite to the first magnetic polarity on the second surface.

A semiconductor device includes a first semiconductor chip adjacent a second semiconductor chip. The first semiconductor chip includes a first surface and a second surface. The second semiconductor chip includes a third surface and a fourth surface. The third surface faces the second surface. A first through-electrode and a second through-electrode are between the first and second surfaces. A third through-electrode is between the third surface and the fourth surface and is connected to the first through-electrode. A fourth through-electrode is between the third surface and the fourth surface and is connected to the second through-electrode. An end of the first through-electrode has a first magnetic polarity on the second surface, and an end of the second through-electrode has a second magnetic polarity opposite to the first magnetic polarity on the second surface.

An anisotropic conductive film composition, an anisotropic conductive film prepared using the same, and a connection structure using the same, the anisotropic conductive film including a binder resin; a curable alicyclic epoxy compound; a curable oxetane compound; a quaternary ammonium catalyst; and conductive particles, wherein the anisotropic conductive film has a heat quantity variation rate of about 15% or less, as measured by differential scanning calorimetry (DSC) and calculated by Equation 1:

Heat quantity variation rate (%)=[(H.sub.0H.sub.1)/H.sub.0]100Equation 1 wherein H.sub.0 is a DSC heat quantity of the anisotropic conductive film, as measured at 25 C. and a time point of 0 hr, and H.sub.1 is a DSC heat quantity of the anisotropic conductive film, as measured after being left at 40 C. for 24 hours.

In accordance with an aspect of the present disclosure, a semiconductor device is provided. The semiconductor device includes a first semiconductor wafer and a second semiconductor wafer, wherein the second semiconductor wafer disposed on the first semiconductor wafer. The first semiconductor wafer includes a first substrate, a first metallization layer, a first dielectric layer, a first magnetic structure, and a first metal pad. The second semiconductor wafer includes a second substrate, a second metallization layer, a second dielectric layer, a second magnetic structure, and a second metal pad. The first magnetic structure is aligned with and in direct contact with the second magnetic structure, and a top surface of the first dielectric layer is in direct contact with a top surface of the second dielectric layer.

A bonding method can include polishing a first bonding layer of a first element for direct bonding, the first bonding layer comprises a first conductive pad and a first non-conductive bonding region. After the polishing, a last chemical treatment can be performed on the polished first bonding layer. After performing the last chemical treatment, the first bonding layer of the first element can be directly bonded to a second bonding layer of a second element without an intervening adhesive, including directly bonding the first conductive pad to a second conductive pad of the second bonding layer and directly bonding the first non-conductive bonding region to a second nonconductive bonding region of the second bonding layer. No treatment or rinse is performed on the first bonding layer between performing the last chemical treatment and directly bonding.

A bonding method can include polishing a first bonding layer of a first element for direct bonding, the first bonding layer comprises a first conductive pad and a first non-conductive bonding region. After the polishing, a last chemical treatment can be performed on the polished first bonding layer. After performing the last chemical treatment, the first bonding layer of the first element can be directly bonded to a second bonding layer of a second element without an intervening adhesive, including directly bonding the first conductive pad to a second conductive pad of the second bonding layer and directly bonding the first non-conductive bonding region to a second nonconductive bonding region of the second bonding layer. No treatment or rinse is performed on the first bonding layer between performing the last chemical treatment and directly bonding.