Apparatuses and methods are described. This apparatus includes a bridge die having first contacts on a die surface being in a molding layer of a reconstituted wafer. The reconstituted wafer has a wafer surface including a layer surface of the molding layer and the die surface. A redistribution layer on the wafer surface includes electrically conductive and dielectric layers to provide conductive routing and conductors. The conductors extend away from the die surface and are respectively coupled to the first contacts at bottom ends thereof. At least second and third IC dies respectively having second contacts on corresponding die surfaces thereof are interconnected to the bridge die and the redistribution layer. A first portion of the second contacts are interconnected to top ends of the conductors opposite the bottom ends thereof in part for alignment of the at least second and third IC dies to the bridge die.

Disclosed is a method that includes: providing semiconductor dies, each of the semiconductor dies having a thinner active region surrounded by a thicker inactive region so that each of the semiconductor dies has a first cavity vertically aligned with the thinner active region and laterally surrounded by the thicker inactive region; providing a metal carrier having connection parts secured to the metal carrier, each of the connection parts dimensioned to fit within the first cavity of one of the semiconductor dies; inserting each of the connection parts of the metal carrier into the respective first cavity of the corresponding semiconductor die; after the inserting, attaching the metal carrier to the semiconductor dies; and after the attaching, singulating the metal carrier so that each of the connection parts of the metal carrier remains attached to the corresponding semiconductor die.

A semiconductor device may include first and second conductor plates opposed to each other via first and second semiconductor chips, a first conductor spacer interposed between the first semiconductor chip and the second conductor plate, a second conductor spacer interposed between the second semiconductor chip and the second conductor plate, and an encapsulant provided between the first and second conductor plates. A lower surface of the second conductor plate may include a first joint area where the first conductor spacer is joined, a second joint area where the second conductor spacer is joined, an adhesion area to which the encapsulant adheres, and a separation area from which the encapsulant is separated. The adhesion area may surround the first joint area, the second joint area, and the separation area. The separation area may be located between the first and the second joint areas.

A semiconductor package including an organic interposer includes: first and second semiconductor chips each having active surfaces having connection pads disposed thereon; the organic interposer disposed on the active surfaces of the first and second semiconductor chips and including a wiring layer electrically connected to the connection pads; barrier layers disposed on side surfaces of the first and second semiconductor chips; and an encapsulant encapsulating at least portions of the first and second semiconductor chips.

In an embodiment, a semiconductor apparatus comprises: a semiconductor chip, a substrate, and a bonding layer located between the semiconductor chip and the substrate that bonds the semiconductor chip and the substrate, wherein the bonding layer comprises sintered metal that comprises a plurality of voids, and wherein at least a portion of the plurality of voids are filled with a specific material having fluidity at a temperature higher than a preset temperature and is curable after being heated and melted.

A semiconductor device includes a wiring board, a semiconductor chip, and a connecting member provided between a surface of the wiring board and a functional surface of the semiconductor chip. The connecting member extends a distance between the wiring board surface and the functional surface. A sealing material seals a gap space between the wiring board and the semiconductor chip. An electrode is formed at the wiring board surface and arranged outside of an outer periphery of the sealing material. A lateral distance between an outer periphery of the semiconductor chip and the outer periphery of the sealing material is between 0.1 mm and a lateral distance from the outer periphery of the semiconductor chip to the electrode.

An integrated circuit (IC) device package includes a structure having a base and walls extending from the base, at least one IC die mounted to the base within the walls, each die having a top surface parallel to the base and having a thickness extending along an axis, perpendicular to the top surface, at most equal to a height of the walls, a thermally conductive heat spreader extending parallel to the base above the die and the walls, and an interface layer including an adhesive layer portion disposed between the walls and the heat spreader to adhere the heat spreader to the walls, and a thermal interface material (TIM) layer portion coplanar with, and laterally displaced from, the adhesive layer portion, the TIM layer portion being disposed in thermally conductive relationship between the heat spreader and each respective die, to dissipate heat from each respective die to the heat spreader.

An electronic module comprises a sealing part 90, a rear surface-exposed conductor 10, 20, 30, a rear surface-unexposed conductor 40, 50 and a second connector 70 for electrically connecting an electronic element 15, 25 to the rear surface-unexposed conductor 40, 50. The rear surface-unexposed conductor 40, 50 is positioned on a front surface side compared with the rear surface-exposed part 12, 22, 32. The second connection tip part 72 is positioned on a rear surface side compared with the second connection base part 71. A distance H in a thickness direction between a rear surface side end part of the second connection base part 71 and a rear surface side end part of the second connection tip part 72 is larger than a width W of the second connection tip part 72 of the second connector 70.

A package structure includes a first redistribution structure, an insulating material over the first redistribution structure, a die embedded in the insulating material, a second redistribution structure over the die and the insulating material, and a first via extending through the insulating material, wherein the first via includes a first inner conductive core, and a first outer conductive shielding layer, wherein the insulating material is disposed between the first inner conductive core and the first outer conductive shielding layer, and wherein the first outer conductive shielding layer has an annular shape in a top-down view.

A semiconductor package including an organic interposer includes: first and second semiconductor chips each having active surfaces having connection pads disposed thereon; the organic interposer disposed on the active surfaces of the first and second semiconductor chips and including a wiring layer electrically connected to the connection pads; barrier layers disposed onside surfaces of the first and second semiconductor chips; and an encapsulant encapsulating at least portions of the first and second semiconductor chips.