Patent classifications
H01L2924/20751
SEMICONDUCTOR DEVICE
The semiconductor device includes a substrate having a main surface, a plurality of conductive patterns provided on the main surface, a plurality of switching elements disposed on one of the conductive patterns, each switching element having a first electrode and a second electrode and being connected to the one of the conductive patterns through its first or second electrode, and at least one first wiring member each directly connecting the first electrodes of two switching elements that are respectively disposed on different conductive patterns and are electrically connected in parallel.
CHIP PACKAGE STRUCTURE AND ELECTRONIC DEVICE
A chip package structure and an electronic equipment may reduce probability of short circuit failure during chip packaging and improve chip reliability. The chip package structure includes: a chip, a substrate, and a lead; the chip is disposed above the substrate; wherein the chip includes a pin pad and a test metal key, and the lead is configured to electrically connect the pin pad and the substrate; the test metal key is disposed in an edge region of the chip that is not under the lead.
CHIP PACKAGE STRUCTURE AND ELECTRONIC DEVICE
A chip package structure and an electronic equipment may reduce probability of short circuit failure during chip packaging and improve chip reliability. The chip package structure includes: a chip, a substrate, and a lead; the chip is disposed above the substrate; wherein the chip includes a pin pad and a test metal key, and the lead is configured to electrically connect the pin pad and the substrate; the test metal key is disposed in an edge region of the chip that is not under the lead.
CHIP PACKAGE STRUCTURE AND ELECTRONIC DEVICE
The present application provides a chip package structure and an electronic device, which could reduce a chip package thickness and implement ultra-thinning of chip package. The chip package structure includes a chip, a substrate, a lead and a lead protection adhesive; the lead is configured to electrically connect the chip and the substrate; the lead protection adhesive is configured to support the lead, where a highest point of the lead protection adhesive is not higher than a highest point of an upper edge of the lead.
CHIP PACKAGE STRUCTURE AND ELECTRONIC DEVICE
The present application provides a chip package structure and an electronic device, which could reduce a chip package thickness and implement ultra-thinning of chip package. The chip package structure includes a chip, a substrate, a lead and a lead protection adhesive; the lead is configured to electrically connect the chip and the substrate; the lead protection adhesive is configured to support the lead, where a highest point of the lead protection adhesive is not higher than a highest point of an upper edge of the lead.
NOBLE METAL-COATED SILVER WIRE FOR BALL BONDING AND METHOD FOR PRODUCING THE SAME, AND SEMICONDUCTOR DEVICE USING NOBLE METAL-COATED SILVER WIRE FOR BALL BONDING AND METHOD FOR PRODUCING THE SAME
A noble metal-coated silver bonding wire suppresses corrosion at the bonding interface even under severe conditions of high temperature and high humidity in automobiles and does not cause energization failure in a semiconductor device in which electrodes of a semiconductor chip and electrodes of lead frames or the like are connected by the bonding wire. The noble metal-coated silver wire for ball bonding wire includes a noble metal coating layer on a core material made of pure silver or a silver alloy, wherein the wire contains at least one sulfur group element, the noble metal coating layer includes at least one palladium layer, the total palladium content relative to the entire wire is 0.01 mass % or more and 5.0 mass % or less, and the total sulfur group element content relative to the entire wire is 0.1 mass ppm or more and 100 mass ppm or less.
NOBLE METAL-COATED SILVER WIRE FOR BALL BONDING AND METHOD FOR PRODUCING THE SAME, AND SEMICONDUCTOR DEVICE USING NOBLE METAL-COATED SILVER WIRE FOR BALL BONDING AND METHOD FOR PRODUCING THE SAME
A noble metal-coated silver bonding wire suppresses corrosion at the bonding interface even under severe conditions of high temperature and high humidity in automobiles and does not cause energization failure in a semiconductor device in which electrodes of a semiconductor chip and electrodes of lead frames or the like are connected by the bonding wire. The noble metal-coated silver wire for ball bonding wire includes a noble metal coating layer on a core material made of pure silver or a silver alloy, wherein the wire contains at least one sulfur group element, the noble metal coating layer includes at least one palladium layer, the total palladium content relative to the entire wire is 0.01 mass % or more and 5.0 mass % or less, and the total sulfur group element content relative to the entire wire is 0.1 mass ppm or more and 100 mass ppm or less.
Floating die package
A floating die package including a cavity formed through sublimation of a sacrificial die encapsulant and sublimation or separation of die attach materials after molding assembly. A pinhole vent in the molding structure is provided as a sublimation path to allow gases to escape, whereby the die or die stack is released from the substrate and suspended in the cavity by the bond wires only.
Floating die package
A floating die package including a cavity formed through sublimation of a sacrificial die encapsulant and sublimation or separation of die attach materials after molding assembly. A pinhole vent in the molding structure is provided as a sublimation path to allow gases to escape, whereby the die or die stack is released from the substrate and suspended in the cavity by the bond wires only.
Bonding wire for semiconductor device
The present invention provides a bonding wire capable of simultaneously satisfying ball bonding reliability and wedge bondability required of bonding wires for memories, the bonding wire including a core material containing one or more of Ga, In, and Sn for a total of 0.1 to 3.0 at % with a balance being made up of Ag and incidental impurities; and a coating layer formed over a surface of the core material, containing one or more of Pd and Pt, or Ag and one or more of Pd and Pt, with a balance being made up of incidental impurities, wherein the coating layer is 0.005 to 0.070 m in thickness.