An apparatus includes a wavelength-tunable laser and an electronic controller. The electronic controller is configured to control the wavelength-tunable laser such that an output wavelength of the wavelength-tunable laser performs a zigzag in time. The wavelength-tunable laser is capable of rapidly and densely scanning wavelengths across a broad spectral range.

An optical filter includes a first loop mirror, a second loop mirror, a first waveguide optically coupled to the first loop mirror and the second loop mirror, a second waveguide optically coupled to the first loop mirror and the second loop mirror, a first access waveguide optically coupled to the first waveguide, a second access waveguide optically coupled to the second waveguide, and an output section, wherein the first loop mirror includes a first loop waveguide and a first multiplexer/demultiplexer, the second loop mirror includes a second loop waveguide and a second multiplexer/demultiplexer, the output section includes a third loop waveguide, a third multiplexer/demultiplexer, a third waveguide, and a fourth waveguide, the third loop waveguide optically coupled to the second loop waveguide and the third multiplexer/demultiplexer, the third waveguide and the fourth waveguide optically coupled to the third multiplexer/demultiplexer, and the output section.

A method of fabricating a composite integrated optical device includes providing a substrate comprising a silicon layer, forming a waveguide in the silicon layer, and forming a layer comprising a metal material coupled to the silicon layer. The method also includes providing an optical detector, forming a metal-assisted bond between the metal material and a first portion of the optical detector, forming a direct semiconductor-semiconductor bond between the waveguide, and a second portion of the optical detector.

The invention relates to a process for fabricating a semiconductor diode (1) via transfer of a semiconductor stack (20) then local etching to form a semiconductor pad (30), the production of the semiconductor pad (30) comprising a plurality of sequences comprising a dry etch that leaves a residual segment (23.1; 22.1), formation of a hard-mask spacer (42.1; 43.1), then a wet etch of the residual segment (23.1; 22.1).

An optoelectronic device includes a substrate and at least three emitters, which are disposed on the substrate and are configured to emit respective beams of light. A plurality of waveguides are disposed on the substrate and have respective input ends coupled to receive the beams of light from respective ones of the emitters, and curve adiabatically from the input ends to respective output ends of the waveguides, which are arranged on the substrate in an array having a predefined pitch. Control circuitry is configured to apply a temporal modulation independently to each of the beams of light.

An optical semiconductor device includes: a semiconductor substrate including a first main surface and a second main surface; a stacked body that is formed on the first main surface and includes an active layer and a contact layer arranged on a side opposite to the semiconductor substrate with respect to the active layer; a first electrode in contact with the contact layer; and a second electrode formed on the second main surface. The stacked body includes a light transmitting portion formed by not covering at least part of a surface of the contact layer on a side opposite to the semiconductor substrate with the first electrode. The optical semiconductor device is configured such that a waveguide mode is not formed by current application through the first electrode and the second electrode in a state in which the light transmitting portion is not in optical contact with an external member.

A Distributed Feedback Laser (DFB) mounted on a Silicon Photonic Integrated Circuit (Si PIC), the DFB having a longitudinal length which extends from a first end of the DFB laser to a second end of the DFB laser, the DFB laser comprising: an epi stack, the epi stack comprising: one or more active material layers; a layer comprising a partial grating, the partial grating extending from the second end of the DFB laser, only partially along the longitudinal length of the DFB laser such that it does not extend to the first end of the DFB laser; a highly reflective medium located at the first end of the DFB laser; and a back facet located at the second end of the DFB laser.

A laser system for generating a narrow linewidth semiconductor light beam includes a substrate, a gain chip affixed on the substrate and configured to amplify light beam, and an optical feedback photonic chip affixed on the substrate, optically coupled to the gain chip, and configured to output light beam, which has a narrow linewidth around a resonant frequency of the optical feedback photonic chip, to the gain chip.

Described herein are IC devices that include hybrid lasers formed with a bonding layer. Hybrid lasers include an active light-emitting region coupled to a waveguide. In a hybrid laser, the waveguide and the light-emitting regions are formed separately from different materials, e.g., the waveguide is a single-crystal silicon, and the light-emitting region includes III-V semiconductors. An amorphous group IV material, such as silicon or germanium, is advantageously used to bond the light-emitting region to the waveguide.

A method for fabricating an integrated structure, using a fabrication system having a CMOS line and a photonics line, includes the steps of: in the photonics line, fabricating a first photonics component in a silicon wafer; transferring the wafer from the photonics line to the CMOS line; and in the CMOS line, fabricating a CMOS component in the silicon wafer. Additionally, a monolithic integrated structure includes a silicon wafer with a waveguide and a CMOS component formed therein, wherein the waveguide structure includes a ridge extending away from the upper surface of the silicon wafer. A monolithic integrated structure is also provided which has a photonics component and a CMOS component formed therein, the photonics component including a waveguide having a width of 0.5 μm to 13 μm.