An improved architecture for a radio frequency (RF) power amplifier, impedance matching network, and selector switch. One aspect of embodiments of the invention is splitting the functionality of a final stage impedance matching network (IMN) into two parts, comprising a base set of off-chip IMN components and an on-chip IMN tuning component. The on-chip IMN tuning component may be a digitally tunable capacitor (DTC). In one embodiment, an integrated circuit having a power amplifier, an on-chip IMN tuner, and a selector switch is configured to be coupled to an off-chip set of IMN components. In another embodiment, an integrated circuit having an on-chip IMN tuner and a selector switch is configured to be coupled through an off-chip set of IMN components to a separate integrated circuit having an RF power amplifier.

A first wiring is disposed above operating regions of plural unit transistors formed on a substrate. A second wiring is disposed above the substrate. An insulating film is disposed on the first and second wirings. First and second cavities are formed in the insulating film. As viewed from above, the first and second cavities entirely overlap with the first and second wirings, respectively. A first bump is disposed on the insulating film and is electrically connected to the first wiring via the first cavity. A second bump is disposed on the insulating film and is electrically connected to the second wiring via the second cavity. As viewed from above, at least one of the plural operating regions is disposed within the first bump and is at least partially disposed outside the first cavity. The planar configuration of the first cavity and that of the second cavity are substantially identical.

A first wiring is disposed above operating regions of plural unit transistors formed on a substrate. A second wiring is disposed above the substrate. An insulating film is disposed on the first and second wirings. First and second cavities are formed in the insulating film. As viewed from above, the first and second cavities entirely overlap with the first and second wirings, respectively. A first bump is disposed on the insulating film and is electrically connected to the first wiring via the first cavity. A second bump is disposed on the insulating film and is electrically connected to the second wiring via the second cavity. As viewed from above, at least one of the plural operating regions is disposed within the first bump and is at least partially disposed outside the first cavity. The planar configuration of the first cavity and that of the second cavity are substantially identical.

A system and method for packaging a semiconductor device that includes a wall to reduce electromagnetic coupling is presented. A semiconductor device has a substrate on which a first circuit and a second circuit are formed proximate to each other. An isolation wall of electrically conductive material is located between the first circuit and the second circuit, the isolation wall being configured to reduce inductive coupling between the first and second circuits during an operation of the semiconductor device. Several types of isolation walls are presented.

A system and method for packaging a semiconductor device that includes a wall to reduce electromagnetic coupling is presented. A semiconductor device has a substrate on which a first circuit and a second circuit are formed proximate to each other. An isolation wall of electrically conductive material is located between the first circuit and the second circuit, the isolation wall being configured to reduce inductive coupling between the first and second circuits during an operation of the semiconductor device. Several types of isolation walls are presented.

A single semiconductor device package that reduces electromagnetic coupling between elements of a semiconductor device embodied within the package is provided. For a dual-path amplifier, such as a Doherty power amplifier, an isolation feature that separates carrier amplifier elements from peaking amplifier elements is included within the semiconductor device package. The isolation feature can take the form of a structure that is constructed of a conductive material coupled to ground and which separates the elements of the amplifier. The isolation feature can be included in a variety of semiconductor packages, including air cavity packages and overmolded packages. Through the use of the isolation feature provided by embodiments of the present invention a significant improvement in signal isolation between amplifier elements is realized, thereby improving performance of the dual-path amplifier.

A single semiconductor device package that reduces electromagnetic coupling between elements of a semiconductor device embodied within the package is provided. For a dual-path amplifier, such as a Doherty power amplifier, an isolation feature that separates carrier amplifier elements from peaking amplifier elements is included within the semiconductor device package. The isolation feature can take the form of a structure that is constructed of a conductive material coupled to ground and which separates the elements of the amplifier. The isolation feature can be included in a variety of semiconductor packages, including air cavity packages and overmolded packages. Through the use of the isolation feature provided by embodiments of the present invention a significant improvement in signal isolation between amplifier elements is realized, thereby improving performance of the dual-path amplifier.

An integrated circuit device includes a device substrate having first and second opposing surfaces, a first component electrode coupled to the first surface, and a conductive plane coupled to the second surface. The integrated circuit device also includes a plurality of through substrate vias electrically coupling a first region of the first component electrode to the conductive plane through the device substrate, wherein a second adjacent region of the first component electrode is substantially devoid of through substrate vias. Arrangement of the plurality of through substrate vias in the first region is based on a projected current distribution through the first component electrode when the integrated circuit device is operational.

An integrated circuit device includes a device substrate having first and second opposing surfaces, a first component electrode coupled to the first surface, and a conductive plane coupled to the second surface. The integrated circuit device also includes a plurality of through substrate vias electrically coupling a first region of the first component electrode to the conductive plane through the device substrate, wherein a second adjacent region of the first component electrode is substantially devoid of through substrate vias. Arrangement of the plurality of through substrate vias in the first region is based on a projected current distribution through the first component electrode when the integrated circuit device is operational.

Envelope-tracking control techniques are disclosed for highly-efficient radio frequency (RF) power amplifiers. In some cases, a III-V semiconductor material (e.g., GaN or other group III material-nitride (III-N) compounds) MOSFET including a high-k gate dielectric may be used to achieve such highly-efficient RF power amplifiers. The use of a high-k gate dielectric can help to ensure low gate leakage and provide high input impedance for RF power amplifiers. Such high input impedance enables the use of envelope-tracking control techniques that include gate voltage (Vg) modulation of the III-V MOSFET used for the RF power amplifier. In such cases, being able to modulate Vg of the RF power amplifier using, for example, a voltage regulator, can result in double-digit percentage gains in power-added efficiency (PAE). In some instances, the techniques may simultaneously utilize envelope-tracking control techniques that include drain voltage (Vd) modulation of the III-V MOSFET used for the RF power amplifier.