A method of making a temperature-compensated resonator is presented. The method comprises the steps of: (a) providing a substrate including a device layer; (b) replacing material from the device layer with material having an opposite temperature coefficient of elasticity (TCE) along a pre-determined region of high strain energy density for the resonator; (c) depositing a capping layer over the replacement material; and (d) etch-releasing the resonator from the substrate. The resonator may be a part of a micro electromechanical system (MEMS).

A method for preparing a film bulk acoustic wave device by using a film transfer technology includes: 1) providing an oxide monocrystal substrate; 2) implanting ions from the implantation surface into the oxide monocrystal substrate, and then forming a lower electrode on the implantation surface; or vice versa; and forming a defect layer at the preset depth; 3) providing a support substrate and bonding a structure obtained in step 2) with the support substrate; 4) removing part of the oxide monocrystal substrate along the defect layer so as to obtain an oxide monocrystal film, and transferring the obtained oxide monocrystal film and the lower electrode to the support substrate; 5) etching the support substrate from a bottom of the support substrate to form a cavity; 6) forming an upper electrode on the surface of the oxide monocrystal film.

A front-end module (FEM) for a 6.1 GHz Wi-Fi acoustic wave resonator RF filter circuit. The device can include a power amplifier (PA), a 6.1 GHz resonator, and a diversity switch. The device can further include a low noise amplifier (LNA). The PA is electrically coupled to an input node and can be configured to a DC power detector or an RF power detector. The resonator can be configured between the PA and the diversity switch, or between the diversity switch and an antenna. The LNA may be configured to the diversity switch or be electrically isolated from the switch. Another 6.1 GHZ resonator may be configured between the diversity switch and the LNA. In a specific example, this device integrates a 6.1 GHz PA, a 6.1 GHZ bulk acoustic wave (BAW) RF filter, a single pole two throw (SP2T) switch, and a bypassable LNA into a single device.

An acoustic filter device includes a transversely-excited film bulk acoustic resonator (XBAR) including a plurality of sub-resonators, and conductors connecting the plurality of sub-resonators in series between a first node and a second node. At least one of the conductors connects two of the plurality of sub-resonators and has a shape that minimizes an area of the at least one conductor.

Acoustic filter devices and methods of making filter devices. An acoustic filter device includes a transversely-excited film bulk acoustic resonator (XBAR) including a plurality of sub-resonators and conductors to connect the plurality of sub-resonators in parallel between a first node and a second node. The conductors are configured such that a path length from the first node to the second node is effectively the same through each of the plurality of sub-resonators.

A bulk-acoustic wave resonator includes a resonator having a central portion in which a first electrode, a piezoelectric layer, and a second electrode are sequentially stacked on a substrate, and an extension portion disposed along a periphery of the central portion and in which an insertion layer is disposed below the piezoelectric layer, wherein the insertion layer includes a SiO.sub.2 thin film injected with fluorine (F).

Acoustic filters devices and methods of making the same. A filter device includes a first plurality of acoustic resonators including at least one first series resonator and at least one first shunt resonator. The at least one first series resonator and the at least one first shunt resonator are acoustically coupled along a first shared acoustic track.

Acoustic filters devices and methods of making the same. A filter device includes two or more series resonators acoustically coupled along a shared acoustic track, and two or more shunt resonators electrically coupled to the two or more series resonators.

A piezoelectric element includes a second electrode layer on a second surface of a single-crystal piezoelectric layer. A hole continuous with a through-hole is provided in the second electrode layer. The second electrode layer is made of Pt, Ti, Al, Cu, Au, Ag, Mg, or an alloy including at least one of the metals as a main ingredient. A third electrode layer is on one side of the second electrode layer opposite to the single-crystal piezoelectric layer. The third electrode layer includes at least a portion outside of an edge of the hole with a distance maintained relative to the edge of the hole when viewed in a direction perpendicular or substantially perpendicular to the second surface. The third electrode layer is made of Ni or an alloy including Ni as a main ingredient.

A composite substrate 10 includes a semiconductor substrate 12 and an insulating support substrate 14 that are laminated together. The support substrate 14 includes first and second substrates 14a and 14b made of the same material and bonded together with a strength that allows the first and second substrates 14a and 14b to be separated from each other with a blade. The semiconductor substrate 12 is laminated on a surface of the first substrate 14a opposite a surface thereof bonded to the second substrate 14b.