H03H2003/025

RESONATOR AND METHOD FOR MANUFACTURING THE SAME
20200412331 · 2020-12-31 ·

A resonator includes a silicon substrate, a bottom electrode stacked on a portion of the silicon substrate, a piezoelectric layer covering the bottom electrode and another portion of the silicon substrate, a top electrode stacked on the piezoelectric layer, and a Bragg reflecting ring. The Bragg reflecting ring is formed on a side of the piezoelectric layer connected to the top electrode and surrounds the top electrode. The Bragg reflecting ring includes a Bragg high-resistivity layer and a Bragg low-resistivity layer alternately arranged along the radial direction of the Bragg reflecting ring. An acoustic impedance of the Bragg high-resistivity layer is greater than an acoustic impedance of the Bragg low-resistivity layer. The Bragg reflecting ring forms reflection surfaces to reflect the laterally propagating clutter waves, thereby suppressing the parasitic mode in the working frequency band, improving the frequency response curve of the resonator and the overall performance of the resonator.

Single-Crystal Bulk Acoustic Wave Resonator and Method of Making Thereof
20200389150 · 2020-12-10 ·

A single-crystal bulk acoustic wave resonators with better performance and better manufacturability and a process for fabricating the same are described. A low-acoustic-loss layer of one or more single-crystal and/or poly-crystal piezoelectric materials is epitaxially grown and/or physically deposited on a surrogate substrate, followed with the formation of a bottom electrode and then a support structure on a first side of the piezoelectric layer. The surrogate substrate is subsequently removed to expose a second side of the piezoelectric layer that is opposite to the first side. A top electrode is then formed on the second side of the piezoelectric layer, followed by further processes to complete the BAW resonator and filter fabrication using standard wafer processing steps. In some embodiments, the support structure has a cavity or an acoustic mirror adjacent the first electrode layer to minimize leakage of acoustic wave energy.

BULK ACOUSTIC WAVE RESONATORS HAVING CONVEX SURFACES, AND METHODS OF FORMING THE SAME
20200382091 · 2020-12-03 ·

In bulk acoustic wave (BAW) resonators having convex surfaces, an example BAW resonator includes a first electrode, a piezoelectric layer formed on the first electrode, the piezoelectric layer having a convex surface, and a second electrode formed on the convex surface. An example integrated circuit (IC) package includes a BAW resonator in the IC package, the BAW resonator including a piezoelectric layer having a convex surface.

Acoustic wave device and method of fabricating the same, filter, and multiplexer
10855252 · 2020-12-01 · ·

An acoustic wave device includes: a support substrate; a single piezoelectric substrate that is located on the support substrate and is single-crystal; first electrodes located on a first surface of the piezoelectric substrate; second electrodes located on a second surface of the piezoelectric substrate; and an acoustic mirror that is bonded on the support substrate, is located between the support substrate and the first electrodes in resonance regions where the first electrodes and the second electrodes face each other across at least a part of the piezoelectric substrate, is not located between the support substrate and the first electrodes in at least a part of a region between the resonance regions, and reflects an acoustic wave propagating through the piezoelectric substrate.

HIGH Q BULK ACOUSTIC RESONATOR WITH DIELECTRIC FLAPS
20200366266 · 2020-11-19 ·

A high Q acoustic BAW resonator with high coupling and improved spurious mode suppression is given. The BAW resonator comprises an active resonator region (AR) formed by an overlap of the three layers bottom electrode (BE), piezoelectric layer (PL) and top electrode layer (TE). An inner-flap (IF) is formed by a dielectric 3D structure sitting on a marginal region (MR) of the active resonator region (AR) or adjacent thereto, extending inwardly towards the center thereof and having a section that runs in parallel and distant to the top surface of the resonator keeping an inner gap (IG) thereto or an angle .

Bulk acoustic wave (BAW) and passive-on-glass (POG) filter co-integration

An electronic device includes a passive substrate. A passive-on-glass (POG) device is on the passive substrate. A bulk acoustic wave (BAW) filter is on the passive substrate. The POG device can be any type of passive component/device, such as an inductor, capacitor, LC-resonator or filter. The POG device can include a piezoelectric material. The POG device and the BAW filter may be side-by-side on the passive substrate.

Elastic wave device, high-frequency front-end circuit, and communication apparatus
10797680 · 2020-10-06 · ·

An elastic wave device includes a supporting substrate, an acoustic reflection layer disposed on the supporting substrate, a piezoelectric layer disposed on the acoustic reflection layer, and an interdigital transducer electrode disposed on the piezoelectric layer. The acoustic reflection layer includes three or more low acoustic impedance layers and two or more high acoustic impedance layers. A film thickness of the low acoustic impedance layer closest to the piezoelectric layer is larger than a film thickness of the low acoustic impedance layer closest to the low acoustic impedance layer that is closest to the piezoelectric layer.

FRONT END MODULE FOR 6.5 GHz Wi-Fi ACOUSTIC WAVE RESONATOR RF FILTER CIRCUIT
20200313751 · 2020-10-01 ·

A front end module (FEM) for a 6.5 GHz Wi-Fi acoustic wave resonator RF filter circuit. The device can include a power amplifier (PA), a 6.5 GHz resonator, and a diversity switch. The device can further include a low noise amplifier (LNA). The PA is electrically coupled to an input node and can be configured to a DC power detector or an RF power detector. The resonator can be configured between the PA and the diversity switch, or between the diversity switch and an antenna. The LNA may be configured to the diversity switch or be electrically isolated from the switch. Another 6.5 GHZ resonator may be configured between the diversity switch and the LNA. In a specific example, this device integrates a 6.5 GHz PA, a 6.5 GHZ bulk acoustic wave (BAW) RF filter, a single pole two throw (SP2T) switch, and a bypassable LNA into a single device.

FRONT END MODULE FOR 5.5 GHz Wi-Fi ACOUSTIC WAVE RESONATOR RF FILTER CIRCUIT
20200313750 · 2020-10-01 ·

A front end module (FEM) for a 5.5 GHz Wi-Fi acoustic wave resonator RF filter circuit. The device can include a power amplifier (PA), a 5.5 GHz resonator, and a diversity switch. The device can further include a low noise amplifier (LNA). The PA is electrically coupled to an input node and can be configured to a DC power detector or an RF power detector. The resonator can be configured between the PA and the diversity switch, or between the diversity switch and an antenna. The LNA may be configured to the diversity switch or be electrically isolated from the switch. Another 5.5 GHZ resonator may be configured between the diversity switch and the LNA. In a specific example, this device integrates a 5.5 GHz PA, a 5.5 GHZ bulk acoustic wave (BAW) RF filter, a single pole two throw (SP2T) switch, and a bypassable LNA into a single device.

PIEZOELECTRIC ACOUSTIC RESONATOR MANUFACTURED WITH PIEZOELECTRIC THIN FILM TRANSFER PROCESS
20200313639 · 2020-10-01 ·

A method and structure for a transfer process for an acoustic resonator device. In an example, a bulk acoustic wave resonator (BAWR) with an air reflection cavity is formed. A piezoelectric thin film is grown on a crystalline substrate. One or more patterned electrodes are deposited on the surface of the piezoelectric film. An etched sacrificial layer is deposited over the one or more electrodes and a planarized support layer is deposited over the sacrificial layer. The support layer is etched to form one or more cavities overlying the electrodes to expose the sacrificial layer. The sacrificial layer is etched to release the cavities around the electrodes. Then, a cap layer is fusion bonded to the support layer to enclose the electrodes in the support layer cavities.