An RF circuit device using modified lattice, lattice, and ladder circuit topologies. The devices can include four resonator devices and four shunt resonator devices. In the ladder topology, the resonator devices are connected in series from an input port to an output port while shunt resonator devices are coupled the nodes between the resonator devices. In the lattice topology, a top and a bottom serial configurations each includes a pair of resonator devices that are coupled to differential input and output ports. A pair of shunt resonators is cross-coupled between each pair of a top serial configuration resonator and a bottom serial configuration resonator. The modified lattice topology adds baluns or inductor devices between top and bottom nodes of the top and bottom serial configurations of the lattice configuration. These topologies may be applied using single crystal or polycrystalline bulk acoustic wave (BAW) resonators.

An electronic device includes a passive substrate. A passive-on-glass (POG) device is on the passive substrate. A bulk acoustic wave (BAW) filter is on the passive substrate. The POG device can be any type of passive component/device, such as an inductor, capacitor, LC-resonator or filter. The POG device can include a piezoelectric material. The POG device and the BAW filter may be side-by-side on the passive substrate.

Methods of forming a shear-mode acoustic wave filter on V-shaped grooves of a [100] crystal orientation Si layer over a substrate and the resulting devices are provided. Embodiments include forming a set of V-shaped grooves in a [100] crystal orientation Si layer over a substrate; and forming a shear-mode acoustic wave filter over the V-shaped grooves, the shear-mode acoustic wave filter including a first metal layer, a thin-film piezoelectric layer, and a second metal layer, wherein the second metal layer is an IDT pattern or a sheet.

A dual-mode resonator, devices employing the dual-mode resonator, and the methods of making the resonator and the devices are disclosed. Embodiments include a dual-mode resonator including a semiconductor substrate; a material on the semiconductor substrate, having a cavity formed therein; a seed layer over the cavity in a V-shape, wherein sides of the V-shape form an angle of 15 to 25 degrees with a horizontal line; a bottom electrode on the seed layer; an acoustic layer on the bottom electrode; a top electrode on the acoustic layer; and a mass loading layer on the top electrode; and a cap over the dual-mode resonator.

A bulk acoustic wave sensor includes a delay layer. The sensor includes an acoustic mirror and a base resonator. The base resonator includes a piezoelectric layer and two electrodes. One or more delay layers are disposed adjacent to the base resonator. A delay layer may be disposed between the base resonator and the acoustic mirror, a delay layer may be disposed on the base resonator opposite to the acoustic mirror, or both. Each delay section is formed of high quality-factor material. The sensor may define a resonant frequency, and the thickness of each delay section may be an integer multiple of half-wavelengths of the resonant frequency.

An RF circuit device using modified lattice, lattice, and ladder circuit topologies. The devices can include four resonator devices and four shunt resonator devices. In the ladder topology, the resonator devices are connected in series from an input port to an output port while shunt resonator devices are coupled the nodes between the resonator devices. In the lattice topology, a top and a bottom serial configurations each includes a pair of resonator devices that are coupled to differential input and output ports. A pair of shunt resonators is cross-coupled between each pair of a top serial configuration resonator and a bottom serial configuration resonator. The modified lattice topology adds baluns or inductor devices between top and bottom nodes of the top and bottom serial configurations of the lattice configuration. These topologies may be applied using single crystal or polycrystalline bulk acoustic wave (BAW) resonators.

An apparatus and method for making an acoustic filter package where the apparatus includes a base layer; a support layer disposed on the base layer; a piezoelectric structure disposed on the support layer; wherein the piezoelectric structure comprises: a piezoelectric layer; a top electrode on a top surface of the piezoelectric layer; a bottom electrode on a bottom surface of the piezoelectric layer; a contact pad coupled to the bottom electrode that extends through an opening in the piezoelectric layer and is coupled to the bottom electrode or the top electrode; and a corrosion resistant pad disposed on the contact pad; and a capping structure disposed on the piezoelectric structure.

The present application relates to a piezoelectric transducer preparation method and a piezoelectric transducer. The method comprises: first, preparing a bottom acoustic reflection layer on a carrier wafer; then preparing a top acoustic reflection layer on a piezoelectric wafer; then combining the side of the bottom acoustic reflection layer that is away from the carrier wafer with the side of the top acoustic reflection layer that is away from the piezoelectric wafer; and finally, thinning the piezoelectric wafer to form a piezoelectric transducer. The carrier wafer performs a carrying function, a piezoelectric film formed by thinning the piezoelectric wafer can be excited by acoustic vibration, and the top acoustic reflection layer and the bottom acoustic reflection layer can limit the acoustic vibration, such that the resulting piezoelectric transducer can work at a high frequency. The piezoelectric transducer prepared by using the method has a specific stacking combination and a piezoelectric film, can excite and support a high-performance acoustic vibration mode, has a low inherent loss, and can obtain a higher capacitance per unit area while maintaining the unit area, such that a good working performance of the prepared piezoelectric transducer is achieved.

A formation method of a filter device includes: forming a first layer by providing a first substrate and forming a resonance device preprocessing layer with a first side and a second side opposite to the first side, wherein the first substrate is located on the first side; forming a second layer by providing a second substrate and forming a first passive device with a third side and a fourth side opposite to the third side, wherein the second substrate is located on the third side; connecting the first layer located on the fourth side and the second layer located on the second side; removing the first substrate; and forming at least one first resonance device based on the resonance device preprocessing layer. The resonance device and the passive device are integrated in one die to form a filter device, which requires less space in an RF front-end chip.

Methods of forming a thin-film piezoelectric acoustic filter, a GaN-channel/buffer Bragg reflector, and a monolithically integrated GaN HEMT PA and CMOS over a [111] crystal orientation Si handle of a SOI wafer and resulting devices are provided. Embodiments include providing a SOI wafer including a [111] crystal orientation Si handle, a BOX layer, and a top Si layer; forming a CMOS device over the top Si layer; and forming a Bragg reflector over the [111] crystal orientation Si handle wafer, the Bragg reflector including a GaN stack with alternating layers of high/low acoustic impedance.