Patent classifications
H03H3/04
Film bulk acoustic resonator fabrication method
Methods of fabricating acoustic resonators are disclosed. A back surface of a piezoelectric plate is bonded to a surface of a substrate. Thickness measurements are made at a plurality of positions on the piezoelectric plate. Excess material is removed from the front surface of the piezoelectric plate in accordance with the thickness measurements to improve a thickness uniformity of the piezoelectric plate. A conductor pattern is formed on the front surface, the conductor pattern including a plurality of interdigital transducers (IDTs) of a plurality of resonators. Cavities are formed in the substrate such that portions of the single-crystal piezoelectric plate form a plurality of diaphragms spanning respective cavities, wherein interleaved fingers of each IDT of the plurality of IDTs are disposed on a respective one of the plurality of diaphragms.
Vibration Element, Manufacturing Method Of Vibration Element, Physical Quantity Sensor, Inertial Measurement Device, Electronic Apparatus, And Vehicle
A vibration element includes a base and a vibrating arm extending from the base. The vibrating arm includes an arm positioned between the base and a weight. A weight film is disposed on the weight. The weight has a first principal surface and a second principal surface in a front and back relationship with respect to a center plane of the arm. A center of gravity of the weight is located between the first principal surface and the center plane of the arm. A center of gravity of the weight film is located between the second principal surface and the center plane of the arm.
Vibration Element, Manufacturing Method Of Vibration Element, Physical Quantity Sensor, Inertial Measurement Device, Electronic Apparatus, And Vehicle
A vibration element includes a base and a vibrating arm extending from the base. The vibrating arm includes an arm positioned between the base and a weight. A weight film is disposed on the weight. The weight has a first principal surface and a second principal surface in a front and back relationship with respect to a center plane of the arm. A center of gravity of the weight is located between the first principal surface and the center plane of the arm. A center of gravity of the weight film is located between the second principal surface and the center plane of the arm.
TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH MULTIPLE DIAPHRAGM THICKNESSES AND FABRICATION METHOD
Filter devices and methods are disclosed. A filter device includes a substrate and a piezoelectric plate attached to the substrate, the piezoelectric plate forming diaphragms spanning respective cavities in the substrate. A first portion of the piezoelectric plate has a first thickness. A front surface of a second portion of the piezoelectric plate is recessed relative to a front surface of the first portion of the piezoelectric plate such that the second portion of the piezoelectric plate has a second thickness less than the first thickness. A conductor pattern is formed on the front surfaces of the first and second portions of the piezoelectric plate. The conductor pattern includes a first interdigital transducer (IDT) with interleaved fingers on a diaphragm having the first thickness, and a second IDT with interleaved fingers on a diaphragm having the second thickness.
TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH MULTIPLE DIAPHRAGM THICKNESSES AND FABRICATION METHOD
Filter devices and methods are disclosed. A filter device includes a substrate and a piezoelectric plate attached to the substrate, the piezoelectric plate forming diaphragms spanning respective cavities in the substrate. A first portion of the piezoelectric plate has a first thickness. A front surface of a second portion of the piezoelectric plate is recessed relative to a front surface of the first portion of the piezoelectric plate such that the second portion of the piezoelectric plate has a second thickness less than the first thickness. A conductor pattern is formed on the front surfaces of the first and second portions of the piezoelectric plate. The conductor pattern includes a first interdigital transducer (IDT) with interleaved fingers on a diaphragm having the first thickness, and a second IDT with interleaved fingers on a diaphragm having the second thickness.
PIEZOELECTRIC RESONATOR UNIT AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing a piezoelectric resonator unit that includes mounting a piezoelectric resonator on a base member, the piezoelectric resonator including a piezoelectric element and a pair of excitation electrodes facing each other with the piezoelectric element interposed therebetween, each of the pair of excitation electrodes including an underlying layer containing chromium and a surface layer on the underlying layer; forming chromium oxide on the surface layer of each of the pair of excitation electrodes by oxidizing chromium diffused from the underlying layer such that an amount of the chromium oxide is larger on the surface layer of the excitation electrode on a base member side than on the surface layer of the excitation electrode on a lid member side among the pair of excitation electrodes; and joining a lid member to the base member such that the piezoelectric resonator is between the base member and the lid member.
PIEZOELECTRIC RESONATOR UNIT AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing a piezoelectric resonator unit that includes mounting a piezoelectric resonator on a base member, the piezoelectric resonator including a piezoelectric element and a pair of excitation electrodes facing each other with the piezoelectric element interposed therebetween, each of the pair of excitation electrodes including an underlying layer containing chromium and a surface layer on the underlying layer; forming chromium oxide on the surface layer of each of the pair of excitation electrodes by oxidizing chromium diffused from the underlying layer such that an amount of the chromium oxide is larger on the surface layer of the excitation electrode on a base member side than on the surface layer of the excitation electrode on a lid member side among the pair of excitation electrodes; and joining a lid member to the base member such that the piezoelectric resonator is between the base member and the lid member.
BULK ACOUSTIC RESONATOR
A bulk acoustic resonator includes: a substrate; a first electrode disposed on the substrate; a piezoelectric layer disposed to cover at least a portion of the first electrode; a second electrode disposed to cover at least a portion of the piezoelectric layer; a metal pad connected to the first electrode and the second electrode; and a protective layer disposed to cover at least the metal pad.
TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH REDUCED SPURIOUS MODES
Acoustic filters, resonators and methods of making acoustic filters are disclosed. An acoustic resonator device includes a substrate. A back surface of a piezoelectric plate is attached to the substrate, a portion of the piezoelectric plate forming a diaphragm that spans a cavity in the substrate. A conductor pattern is formed on the front surface of the piezoelectric plate, the conductor pattern including an interdigital transducer (IDTs) with interleaved fingers of the IDT disposed on the diaphragm. A ratio of the mark of the interleaved fingers to the pitch of the interleaved fingers is greater than or equal to 0.2 and less than or equal to 0.3.
TRANSVERSELY-EXCITED FILM BULK ACOUSTIC RESONATOR WITH REDUCED SPURIOUS MODES
Acoustic filters, resonators and methods of making acoustic filters are disclosed. An acoustic resonator device includes a substrate. A back surface of a piezoelectric plate is attached to the substrate, a portion of the piezoelectric plate forming a diaphragm that spans a cavity in the substrate. A conductor pattern is formed on the front surface of the piezoelectric plate, the conductor pattern including an interdigital transducer (IDTs) with interleaved fingers of the IDT disposed on the diaphragm. A ratio of the mark of the interleaved fingers to the pitch of the interleaved fingers is greater than or equal to 0.2 and less than or equal to 0.3.