Techniques are disclosed for forming integrated circuit film bulk acoustic resonator (FBAR) devices having multiple resonator thicknesses on a common substrate. A piezoelectric stack is formed in an STI trench and overgrown onto the STI material. In some cases, the piezoelectric stack can include epitaxially grown AlN. In some cases, the piezoelectric stack can include single crystal (epitaxial) AlN in combination with polycrystalline (e.g., sputtered) AlN. The piezoelectric stack thus forms a central portion having a first resonator thickness and end wings extending from the central portion and having a different resonator thickness. Each wing may also have different thicknesses from one another. Thus, multiple resonator thicknesses can be achieved on a common substrate, and hence, multiple resonant frequencies on that same substrate. The end wings can have metal electrodes formed thereon, and the central portion can have a plurality of IDT electrodes patterned thereon.

Embodiments of a tunable bandpass microelectromechanical (MEMS) filter are described. In one embodiment, such a filter includes a pair of arch beam microresonators, and a pair of voltage sources electrically coupled to apply a pair of adjustable voltage biases across respective ones of the pair of arch beam microresonators. The pair of voltage sources offer independent tuning of the bandwidth of the filter. Based on the structure and arrangement of the filter, it can be tunable by 125% or more by adjustment of the adjustable voltage bias. The filter also has a relatively low bandwidth distortion, can exhibit less than 2.5 dB passband ripple, and can exhibit sideband rejection in the range of at least 26 dB.

An acoustic wave filter includes a substrate having voids formed therein; a first resonator disposed on one or more of the voids, and a second resonator disposed on other of the voids. A first trimming layer is provided in the first resonator, and a second trimming layer is provided in the second resonator. The second trimming layer is formed of a material having an etching rate for a given etchant different from that of the first trimming layer.

Acoustic filters and methods of fabricating acoustic filters are disclosed. A filter includes a single-crystal piezoelectric plate having a front surface and a back surface attached to a substrate, and a plurality of acoustic resonators including a first shunt resonator, a second shunt resonator, and one or more series resonators. Each of the plurality of acoustic resonators includes an interdigital transducer (IDT) formed on the front surface of the piezoelectric plate, interleaved fingers of the IDT disposed on a respective diaphragm formed by a portion of the piezoelectric plate that spans a cavity in the substrate. A frequency setting dielectric layer is formed over the first and second shunt resonators but not over the one or more series resonators. The frequency setting dielectric layer has a thickness t1 on the first shunt resonator and a thickness t2 on the second shunt resonator, where t1 is not equal to t2.

A coupled resonator filter (CRF) tuning circuit is provided. Herein, a CRF structure includes a ferroelectric input resonator, a ferroelectric output resonator, and a ferroelectric tuning resonator coupled to the ferroelectric input resonator and the ferroelectric output resonator via a coupling layer. In embodiments disclosed herein, a tuning controller is configured to cause the coupling layer to be polarized relative to the ferroelectric input resonator or the ferroelectric output resonator. As a result, it is possible to adapt the sustainable filter bandwidth of the CRF structure based on various radio frequency (RF) filtering requirements.

Embodiments may provide, among other things, a frequency filter including one or more series resonators and one or more shunt resonators. The series resonators may have a first periodicity and the shunt resonators may have a second periodicity. The frequency filter may include a control circuit that may be configured to cause a change in frequency of the one or more series resonators or the one or more shunt resonators of less than the first or second periodicity, respectively, and the change in frequency may result in a change to a passband associated with the frequency filter of at least the first or second periodicity. Additional embodiments may be described and/or claimed herein.

A bulk-acoustic wave resonator includes: a membrane layer disposed on a substrate and forming a cavity; a lower electrode disposed on the membrane layer; a piezoelectric layer disposed on the lower electrode; an upper electrode disposed on the piezoelectric layer, and including a frame part disposed at an edge of an active area and having a thickness greater than that of a portion of the upper electrode disposed in a central portion of the active area; and a frequency adjusting layer disposed on the piezoelectric layer and the upper electrode. The frequency adjusting layer is excluded from an inclined surface of the frame part, or a thickness of a portion of the frequency adjusting layer on the inclined surface is less than that of other portions of the frequency adjusting layer. The frequency adjusting layer is disposed on a portion of the piezoelectric layer protruding from the upper electrode.

Embodiments of this disclosure relate to bulk acoustic wave resonators on a substrate. The bulk acoustic wave resonators include a first bulk acoustic wave resonator, a second bulk acoustic wave resonator, a conductor electrically connecting the first bulk acoustic wave resonator to the second bulk acoustic wave resonator, and an air gap positioned between the conductor and a surface of the substrate.

Acoustic filters and methods of fabricating acoustic filters are disclosed. A filter includes a single-crystal piezoelectric plate having a front surface and a back surface attached to a substrate, and a plurality of acoustic resonators including a first shunt resonator, a second shunt resonator, and one or more series resonators. Each of the plurality of acoustic resonators includes an interdigital transducer (IDT) formed on the front surface of the piezoelectric plate, interleaved fingers of the IDT disposed on a respective diaphragm formed by a portion of the piezoelectric plate that spans a cavity in the substrate. A frequency setting dielectric layer is formed over the first and second shunt resonators but not over the one or more series resonators. The frequency setting dielectric layer has a thickness t1 on the first shunt resonator and a thickness t2 on the second shunt resonator, where t1 is not equal to t2.

A method for the batch production of acoustic wave filters comprises: synthesizing N theoretical filters, each filter defined by a set of j theoretical resonator(s) having a triplet C.sub.0ij,eq, .sub.rij,eq and .sub.aij,eq, these parameters grouped into subsets; determining a reference resonator structure for each subset, naturally having a resonant frequency .sub.r,ref, where .sub.aij,eq<.sub.r,ref<.sub.rij,eq; determining, for each theoretical resonator, an elementary building block comprising an intermediate resonator R.sub.ij, a parallel reactance Xp.sub.ij and/or a series reactance Xs.sub.ij, the intermediate resonator R.sub.ij having a triplet C.sub.0ij, .sub.r,ref and .sub.a,ref, the parameters C.sub.0ij, Xpij and/or Xs.sub.ij defined so the elementary building block has a triplet: C.sub.0ij,eq, .sub.rij,eq and .sub.aij,eq; determining the geometrical dimensions of the actual resonators R.sub.ij of the filters so they have a capacitance C.sub.0ij; producing each actual resonator; associating series and/or parallel reactances with actual resonators in order to form the elementary building blocks.