Methods of fabricating acoustic filters. A back-side frequency setting layer is formed on a surface of a substrate and/or a back surface of a piezoelectric plate. The piezoelectric plate is attached to the substrate with the back-side frequency setting layer sandwiched between the substrate and the piezoelectric plate. Portions of the piezoelectric plate and backside frequency setting layer form diaphragms spanning respective cavities in the substrate. A conductor pattern defining a plurality of acoustic resonators is formed on a front surface of the piezoelectric plate. Each of the acoustic resonators includes an interdigital transducer (IDT) with interleaved fingers disposed on a respective diaphragm. A front-side frequency setting layer is formed over the interleaved fingers and the front surface of the diaphragms of one or more shunt resonators. The back-side frequency setting layer is removed from the back surfaces of the diaphragms of one or more series resonators.

An acoustic resonator device with low thermal impedance has a substrate and a single-crystal piezoelectric plate having a back surface attached to a top surface of the substrate via a bonding oxide (BOX) layer. An interdigital transducer (IDT) formed on the front surface of the plate has interleaved fingers disposed on the diaphragm. The piezoelectric plate and the BOX layer are removed from a least a portion of the surface area of the device to provide lower thermal resistance between the IDT and the substrate.

An acoustic resonator device with low thermal impedance has a substrate and a single-crystal piezoelectric plate having a back surface attached to a top surface of the substrate via a bonding oxide (BOX) layer. An interdigital transducer (IDT) formed on the front surface of the plate has interleaved fingers disposed on a diaphragm of the plate that is formed over a cavity in the substrate. The piezoelectric plate and the BOX layer are removed from a least a portion of the surface area of the substrate to provide lower thermal resistance between the IDT and the substrate.

An acoustic wave device is provided that includes a piezoelectric layer including lithium niobate or lithium tantalate, and a series arm resonator and a parallel arm resonator that each include at least a pair of a first electrode and a second electrode on the piezoelectric layer. The acoustic wave device uses a bulk wave in a first thickness-shear mode. Moreover, a film thickness of a first portion of the piezoelectric layer in the series arm resonator is different from a film thickness of a second portion of the piezoelectric layer in the parallel arm resonator. In each of the series arm resonator and the parallel arm resonator, assuming a film thickness of the piezoelectric layer is d and a distance between centers of the first electrode and the second electrode adjacent to each other is p, a ratio d/p is less than or equal to about 0.5.

An acoustic wave device includes a support substrate, and a piezoelectric layer provided on the support substrate. The piezoelectric layer has a first main surface opposite to a second main surface. The piezoelectric layer also includes a first direction orthogonal to a second direction. A first electrode is provided on the piezoelectric layer's first main surface, and a second electrode is provided on the piezoelectric layer's second main surface to face the first electrode. An energy confining portion is provided between the support substrate and the piezoelectric layer. The piezoelectric layer is anisotropic with respect to a coefficient of linear expansion, and in the piezoelectric layer, a coefficient of linear expansion in the first direction is different from a coefficient of linear expansion in the second direction. At least one of the piezoelectric layer, the first electrode, and the second electrode is parallel to the first direction.

A piezoelectric thin film includes a piezoelectric element and a substrate supporting the piezoelectric element. The piezoelectric element includes a piezoelectric thin film and first and second electrodes opposing each other with the piezoelectric thin film interposed therebetween. The piezoelectric thin film has a first-electrode-side content of each of aluminum and scandium higher than a second-electrode-side content thereof and a first-electrode-side content of nitrogen lower than a second-electrode-side content thereof.

A filter device is provided that includes a substrate and a piezoelectric plate attached to the substrate. A conductor pattern is formed at a first surface of the piezoelectric plate and includes interdigital transducers of series and shunt resonators that each have interleaved fingers at respective diaphragms of the plate suspended. A first dielectric coating layer is formed over the interleaved fingers of the IDTs and on the first surface of the piezoelectric plate; and a second dielectric coating layer is formed on the second surface of the piezoelectric plate that is opposite the first surface. The second dielectric coating layer of the shunt resonator has a greater thickness than a thickness of the at least one second dielectric coating layer of the series resonator.

Acoustic filters are disclosed. A bandpass filter has a passband between a lower band edge and an upper band edge. The bandpass filter includes a plurality of transversely-excited film bulk acoustic resonators (XBARs) connected in a ladder filter circuit. The plurality of XBARs includes at least one lithium tantalate XBAR and at least one lithium niobate XBAR.

An acoustic wave device includes a (111)-oriented silicon substrate, a silicon nitride layer, a silicon oxide layer, a lithium tantalate layer, and an IDT electrode on the lithium tantalate layer. When the wavelength determined by the electrode finger pitch of the IDT electrode is λ, the thickness of the silicon nitride layer, SiN [λ], the thickness of the silicon oxide layer, SiO.sub.2 [λ], the thickness of the lithium tantalate layer, LT [λ], and one of the Euler angles of the lithium tantalate layer, LTθ [deg.], are thicknesses and an angle in ranges in which the phase of a first higher-order mode is about −20° or less.

A film bulk acoustic resonator (FBAR) structure includes a top electrode, a piezoelectric layer disposed below the top electrode, a bottom electrode disposed below the piezoelectric layer, a dielectric layer disposed below the bottom electrode, a bonding substrate disposed below the dielectric layer, a bottom cap wafer disposed below the bonding substrate, and a cavity disposed below the bottom electrode and formed by the dielectric layer, the bonding substrate, and the bottom cap wafer.