An acoustic resonator device includes a substrate and a piezoelectric plate. A first portion of the piezoelectric plate is attached to the substrate. A second portion of the piezoelectric forms a diaphragm suspended over a cavity in the substrate. An interdigital transducer (IDT) is formed on a surface of the piezoelectric plate, the IDT including first and second busbars disposed on the first portion and interleaved IDT fingers disposed on the diaphragm. A plurality of tethers support the diaphragm over the cavity, each tether providing an electrical connection between a corresponding one of the interleaved IDT fingers and one of the first and second busbars.

An acoustic resonator device includes a substrate and a piezoelectric plate. A first portion of the piezoelectric plate is on the substrate. A second portion of the piezoelectric forms a diaphragm suspended over a cavity in the substrate. An interdigital transducer (IDT) is on a surface of the piezoelectric plate, the IDT including first and second busbars on the first portion and interleaved IDT fingers on the diaphragm. A plurality of tethers support the diaphragm over the cavity, each tether providing an electrical connection between a corresponding one of the interleaved IDT fingers and one of the first and second busbars.

An acoustic resonator is fabricated by forming a patterned first photoresist mask on a piezoelectric plate at locations of a desired interdigital transducer (IDT) pattern. An etch-stop layer is then deposited on the plate and first photoresist mask. The first photoresist mask is removed to remove parts of the etch-stop and expose the plate. An IDT conductor material is deposited on the etch stop and the exposed plate. A patterned second photoresist mask is then formed on the conductor material at locations of the IDT pattern. The conductor material is then etched over and to the etch-stop to form the IDT pattern which has interleaved fingers on a diaphragm to span a substrate cavity. A portion of the plate and the etch-stop form the diaphragm. The etch-stop and photoresist mask are impervious to this etch. The second photoresist mask is removed to leave the IDT pattern.

A method and a band reject filter (BRF) using as acoustic resonators at least one of bulk acoustic wave (BAW) resonators and film bulk acoustic resonators (FBAR) are provided. The BRF includes at least one substrate having at least one of a plurality of capacitors formed thereon, the plurality of capacitors having capacitances selected to achieve a particular band reject response. The BRF also includes at least one die. At least one of a plurality of acoustic wave resonators are formed thereon. The plurality of acoustic wave resonators are one of BAW resonators and FBARs and are designed to have the same resonant frequency. A plurality of conductors between the substrate and the die are positioned to electrically connect the acoustic wave resonators and the capacitors.

A method and structure for a transfer process for an acoustic resonator device. In an example, a bulk acoustic wave resonator (BAWR) with an air reflection cavity is formed. A piezoelectric thin film is grown on a crystalline substrate. A first patterned electrode is deposited on the surface of the piezoelectric film. An etched sacrificial layer is deposited over the first electrode and a planarized support layer is deposited over the sacrificial layer, which is then bonded to a substrate wafer. The crystalline substrate is removed and a second patterned electrode is deposited over a second surface of the film. The sacrificial layer is etched to release the air reflection cavity. Also, a cavity can instead be etched into the support layer prior to bonding with the substrate wafer. Alternatively, a reflector structure can be deposited on the first electrode, replacing the cavity.

A method and structure for a transfer process for an acoustic resonator device. In an example, a bulk acoustic wave resonator (BAWR) with an air reflection cavity is formed. A piezoelectric thin film is grown on a crystalline substrate. Patterned electrodes are deposited on the surface of the piezoelectric film. An etched sacrificial layer is deposited over the electrodes and a planarized support layer is deposited over the sacrificial layer. The device can include a dielectric protection layer (DPL) that protects the piezoelectric layer from etching processes that can produce rough surfaces and reduces parasitic capacitance around the perimeter of the resonator when the DPL's dielectric constant is lower than that of the piezoelectric layer. The DPL can be configured between the top electrode and the piezoelectric layer, between the bottom electrode and the piezoelectric layer, or both.

A notch filter includes a substrate having piezoelectricity, the substrate including a high-acoustic-velocity member, a low-acoustic-velocity film provided on the high-acoustic-velocity member, and a piezoelectric thin film provided on the low-acoustic-velocity film; an interdigital transducer electrode provided on the piezoelectric thin film; and reflectors provided on both sides of the interdigital transducer electrode in an acoustic wave propagation direction. An IR gap is within one of two ranges: 0.1λ≤G.sub.IR<0.5λ or 0.5λ<G.sub.IR≤0.9λ, where λ is a wavelength determined by an electrode finger pitch of the interdigital transducer electrode, and the IR gap is a distance between electrode finger centers of an electrode finger of the interdigital transducer electrode closest to the reflector out of the electrode fingers of the interdigital transducer electrode, and an electrode finger of the reflector closest to the interdigital transducer electrode, out of the electrode fingers of the reflector.

A method and structure for a transfer process for an acoustic resonator device. In an example, a bulk acoustic wave resonator (BAWR) with an air reflection cavity is formed. A piezoelectric thin film is grown on a crystalline substrate. A first patterned electrode is deposited on the surface of the piezoelectric film. An etched sacrificial layer is deposited over the first electrode and a planarized support layer is deposited over the sacrificial layer, which is then bonded to a substrate wafer. The crystalline substrate is removed and a second patterned electrode is deposited over a second surface of the film. The sacrificial layer is etched to release the air reflection cavity. Also, a cavity can instead be etched into the support layer prior to bonding with the substrate wafer. Alternatively, a reflector structure can be deposited on the first electrode, replacing the cavity.

There is disclosed acoustic resonators and filter devices. An acoustic resonator device includes a piezoelectric plate, a portion of the piezoelectric plate forming a diaphragm, a thickness of the piezoelectric plate is greater than or equal to 300 nm and less than or equal to 500 nm, and an interdigital transducer (IDT) with interleaved fingers of the IDT on the diaphragm. The piezoelectric plate and the IDT are configured such that a radio frequency signal applied to the IDT excites a primary shear acoustic mode in the diaphragm.

There is disclosed acoustic resonators and filter devices. An acoustic resonator includes a single-crystal piezoelectric plate having front and back surfaces, a portion of the piezoelectric plate forming a diaphragm. A thickness of the piezoelectric plate is greater than or equal to 300 nm and less than or equal to 500 nm. An interdigital transducer (IDT) is formed on the front surface of the single-crystal piezoelectric plate such that interleaved fingers of the IDT are disposed on the diaphragm. The piezoelectric plate and the IDT are configured such that a radio frequency signal applied to the IDT excites a primary shear acoustic mode in the diaphragm. The interleaved fingers of the IDT are substantially molybdenum. The diaphragm is contiguous with the piezoelectric plate around at least 50% of the IDT.