A powering device is configured to provide power to an ultraviolet (UV) lamp of a sanitizing system. The powering device includes a power delivery assembly configured to provide power to the UV lamp, and a power controller coupled to the power delivery assembly. The power controller is configured to control one or more aspects of the power provided from the power delivery assembly to the UV lamp.

A powering device is configured to provide power to an ultraviolet (UV) lamp of a sanitizing system. The powering device includes one or more batteries configured to provide power to the UV lamp, and a power controller coupled to the one or more batteries. The power controller is configured to control one or more aspects of the power provided from the one or more batteries to the UV lamp.

A powering device is configured to provide power to an ultraviolet (UV) lamp of a sanitizing system. The powering device includes one or more batteries configured to provide power to the UV lamp, and a power controller coupled to the one or more batteries. The power controller is configured to control one or more aspects of the power provided from the one or more batteries to the UV lamp.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

A lighting apparatus, for example for applications in the show-business or entertainment sector, including: a light-radiation generator, for example a laser generator, configured for projecting a lighting beam towards a lighting space in a certain direction; control circuitry of the light-radiation generator configured for controlling emission of the lighting beam by the light-radiation generator; and processing circuitry configured for calculating a thermal retinal radiance ratio of the light-radiation generator as a function of a distance from the light-radiation generator in the aforesaid direction and for acting on the control circuitry of the light-radiation generator in order to control the lighting beam of the light-radiation generator as a function of the thermal retinal radiance ratio, with the aim of maintaining the aforesaid thermal retinal radiance ratio below unity starting from a certain value of distance from the light-radiation generator in the aforesaid direction.

A lighting apparatus, for example for applications in the show-business or entertainment sector, including: a light-radiation generator, for example a laser generator, configured for projecting a lighting beam towards a lighting space in a certain direction; control circuitry of the light-radiation generator configured for controlling emission of the lighting beam by the light-radiation generator; and processing circuitry configured for calculating a thermal retinal radiance ratio of the light-radiation generator as a function of a distance from the light-radiation generator in the aforesaid direction and for acting on the control circuitry of the light-radiation generator in order to control the lighting beam of the light-radiation generator as a function of the thermal retinal radiance ratio, with the aim of maintaining the aforesaid thermal retinal radiance ratio below unity starting from a certain value of distance from the light-radiation generator in the aforesaid direction.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).