The present invention is directed to circuits, systems, and methods to quickly to quench an arc that may form between high voltage electrodes associated with an ion source to shorten the duration of the arc and mitigate non-uniform ion implantations. In one example, an arc detection circuit for detecting an arc in an ion implantation system includes an analog-to-digital converter (ADC) and an analysis circuit. The ADC is configured to convert a sensing current indicative of a current being supplied to an electrode in the ion implantation system to a digital current signal that quantifies the sensing current. The analysis circuit is configured to analyze the digital current signal to determine if the digital current signal meets threshold parameter value and in response to the digital current signal meeting the threshold parameter value, provide an arc detection signal to a trigger control circuit that activates an arc quenching mechanism.

Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

An apparatus may include an ion source, arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.

A particle acceleration system includes an ion source that generates an ion, an accelerator that accelerates the ion, And a transporting unit that transports the ion from the ion source to the accelerator, in which an attachment angle and an attachment position of the ion source with respect to the transporting unit are able to be adjusted.

A technique for outputting heterologous ions having the same per-nucleon energy at different timings by using one ion source is provided. An ion generation device includes: an ion generation energy setter that causes first ions and second ions generated by ionization in a vacuum chamber to be emitted in a mixed state from an opening; an electric-field voltage adjuster that imparts a same predetermined per-nucleon energy to each of the first and second ions by applying electric potential formed between the opening and extraction electrodes while switching the electric potential between first and second electric-field voltages; and an excitation current adjuster that causes the first and second ions to be outputted at different timings by supplying a coil of a separation electromagnet with an excitation current while switching the excitation current between first and second excitation currents.

An accelerator 4 includes a circular vacuum container including circular return yokes 5A, 5B. An injection electrode 18 is disposed closer to an inlet of a beam extraction path 20 in the return yoke 5B than a central axis C of the vacuum container. Magnetic poles 7A to 7F are radially disposed from the injection electrode 18 at the periphery of the injection electrode 18 in the return yoke 5B. Recessions 29A to 29F are disposed alternately with the magnetic poles 7A to 7F in the circumferential direction of the return yoke 5B. In the vacuum container, a concentric trajectory region, in which multiple beam turning trajectories centered around the injection electrode 18 are present, is formed, and an eccentric trajectory region, in which multiple beam turning trajectories eccentric from the injection electrode 18 are present, is formed around the region.

Embodiments of the present invention disclose methods and systems for performing particle acceleration using a cyclotron RF resonator with an asymmetrical fixed tuner. A cyclotron RF resonator includes a single shorting plate tuner inside and a fixed short stem, and does not require top-bottom mirror symmetry. Small movements in relation to the wavelengths of the maximum acceleration voltage is bound by the capacitance of the accelerating surfaces. As such, the resonator may perform particle acceleration using asymmetrical tuning to reduce design complexity, cost of maintenance, fabrication and installation complexity, failure rate, and software complexity (e.g., control software), for example.

In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device, the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.

In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device, the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.

Cyclotron includes an acceleration chamber, a vacuum system, an ion source system, and a control system that is configured to determine at least one operating parameter as a particle beam is directed along a beam path of the cyclotron. The control system is configured to decrease a supply of the charged particles for the particle beam based on the at least one operating parameter. The particle beam continues after decreasing the supply of the charged particles. The control system is also configured to increase the supply of the charged particles for the particle beam after a predetermined time period or in response to determining that an amount of gas molecules has reduced based on the at least one operating parameter.