A wiring board (10) includes a substrate (11) that is transparent and a wiring pattern region (20) that is disposed on the substrate (11) and that includes a plurality of wiring lines (21, 22). The wiring pattern region (20) has a sheet resistance of less than or equal to 5 Ω/sq, and each wiring line (21, 22) has a maximum width of less than or equal to 3 μm when viewed at a viewing angle of 120°.

A molded interconnect device that comprises a substrate and conductive elements disposed on the substrate is provided. The substrate comprising a polymer composition containing a polymer matrix that includes a thermotropic liquid crystalline polymer and from about 10 parts to about 80 parts by weight of a mineral filler per 100 parts by weight of the polymer matrix. The mineral filler has an average diameter of about 25 micrometers or less. The polymer composition contains copper in an amount of about 1,000 parts per million or less and chromium in an amount of about 2,000 parts per million or less, and further exhibits a surface resistivity of about 1×1014 ohm or more.

A method is provided for fabricating an electromagnetic shield for an electronic component on a PCB. The method includes providing a patterned metal layer; laminating the patterned metal layer with a second dielectric layer; forming a cavity in the second dielectric layer; applying a dry film resist over the second dielectric layer and the cavity; stripping the dry film resist from the second dielectric layer and portions of the cavity adjacent the cavity side walls; depositing a seed layer and metal over the second dielectric layer and the dry film resist; etching the preplating layer and the seed layer from top surfaces of a remainder of the dry film resist and the second dielectric layer; and stripping the remainder of the dry film resist, thereby exposing the preplating layer on the side walls of the cavity to provide the electromagnetic shield.

Disclosed is a structure of a flexible circuit board combined with a carrier board. The carrier board includes a thick copper layer, a thin copper layer, and a release layer formed between the thick copper layer and the thin copper layer. The flexible circuit substrate and the carrier board are bonded together by an adhesive layer. In a subsequent process, the release layer, together with the thick copper layer, is peeled from a top surface of the thin copper layer and the thin copper layer is preserved by being bonded by the adhesive layer to the flexible circuit substrate.

A photosensitive res in composition includes (A) a binder polymer having a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms, and a structural unit derived from a (meth)acrylic acid; (B) a photopolymerizable compound having an ethylenically unsaturated bond group; (C) a photopolymerization initiator; and (D) a styryl pyridine represented by the Formula (1). In Formula (1), each of R.sup.1, R.sup.2 and R.sup.3 independently represents an alkyl group having from 1 to 20 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, an alkyl ester group having from 1 to 6 carbon atoms, an amino group, an alkyl amino group having from 1 to 20 carbon atoms, a carboxy group, a ciano group, a nitro group, an acetyl group or a (meth)acryloyl group, each of a, b and c independently represents an integer of from 0 to 5. In a case in which each of a, b and c is independently 2 or more, the plural R.sup.1s, R.sup.2s, and R.sup.3s independently may be the same or different.

##STR00001##

A photosensitive resin composition comprises: a resin having a phenolic hydroxyl group; a photosensitive acid generator; a compound having at least one selected from the group consisting of an aromatic ring, a heterocycle and an alicycle, and at least one selected from the group consisting of a methylol group and an alkoxyalkyl group; and an aliphatic compound having two or more functional groups, the functional groups being at least one functional group selected from the group consisting of an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group, an oxetanyl alkyl ether group, a vinyl ether group and a hydroxyl group, wherein the photosensitive acid generator is a sulfonium salt containing an anion having at least one skeleton selected from the group consisting of a tetraphenylborate skeleton, an alkylsulfonate skeleton having 1 to 20 carbon atoms, a phenylsulfonate skeleton and a 10-camphorsulfonate skeleton.

One embodiment of the present disclosure provides a method for producing a substrate formed with a copper thin layer. The method includes providing a carrier, forming a separation-inducing layer on the surface of the carrier, forming a copper thin layer on the separation-inducing layer, and bonding a core to the copper thin layer.

A selective segment via plating process for manufacturing a circuit board selectively interconnects inner conductive layers as separate segments within the same via. Plating resist is plugged into an inner core through hole and then stripped off after an electroless plating process. Stripping of the electroless plating on the plating resist results in a plating discontinuity on the via wall. In a subsequent electroplating process, the inner core layer can not be plated due to the plating discontinuity. The resulting circuit board structure has separate electrically interconnected segments within the via.

A printed wiring board according to an aspect of the present invention includes: an electrically insulating base film; and an electrically conductive pattern stacked on at least one surface side of the base film, wherein an average width of a plurality of wiring portions included in the electrically conductive pattern is 5 μm or greater and 20 μm or less, wherein each of the wiring portions includes a seed layer and a plating layer, wherein the plating layer includes copper crystal planes of a (111) plane, a (200) plane, a (220) plane, and a (311) plane, and wherein an intensity ratio IR.sub.220 of an X-ray diffraction intensity of the copper crystal plane (220) obtained by Equation (1) below is 0.05 or greater and 0.14 or less,

IR.sub.220=I.sub.220/(I.sub.111+I.sub.220+I.sub.311)  (1)

(where I.sub.111 is an X-ray diffraction intensity of the (111) plane, I.sub.200 is an X-ray diffraction intensity of the (200) plane, I.sub.220 is the X-ray diffraction intensity of the (220) plane, and I.sub.311 is an X-ray diffraction intensity of the (311) plane in Equation (1)).

The present disclosure discloses a circuit board and a manufacturing method thereof. The manufacturing method of the circuit board comprises: forming an electroplated coating on a board body of the circuit board; performing image transfer on the board body; drilling the board body after image transfer to remove a copper layer, adjacent to the two sides of a gold finger, on the circuit board, thereby forming a strip; performing forward and reverse routing towards directions away from each other respectively at the two sides of each gold finger to form a first routing tape and a second routing tape, wherein the first routing tape and the second routing tape are connected to the two ends of the strip respectively; and removing burrs on a surface of the board body through an etching process.