PROBLEMS TO BE SOLVED: To provide a process for roughening both sides of a copper plate by forming a protrusion with a fine bump shape on the both sides of the copper plate, and then to provide a process for a deterioration of an electroplating solution for plating copper to become hard to progress therein. MEANS FOR SOLVING THE PROBLEMS: First of all, there is designed to be arranged electrodes (3, 3) as a similar pole for therebetween to be opposed to each other in an electroplating copper solution 2, and then to be arranged a copper plate 4 at therebetween. And then at first there becomes to be performed an anodic treatment for generating a copper fine particles on both surfaces of the copper plate 4, by performing an electrolytic process with the copper plate 4 as a positive electrode and the electrodes 3 as negative electrodes. And then thereafter there becomes to be performed a cathodic treatment, by performing an electroplating of copper with the copper plate 4 as a negative electrode and the electrodes 3 as positive electrodes, for the copper fine particles to be fixed onto the surfaces of the copper plate 4. Furthermore, there becomes to be formed the above mentioned protrusion with the fine bump shape thereon, by performing the anodic treatment and then the cathodic treatment as not less than one cycle thereof.

The present disclosure discloses a circuit board and a manufacturing method thereof. The manufacturing method of the circuit board comprises: forming an electroplated coating on a board body of the circuit board; performing image transfer on the board body; drilling the board body after image transfer to remove a copper layer, adjacent to the two sides of a gold finger, on the circuit board, thereby forming a strip; performing forward and reverse routing towards directions away from each other respectively at the two sides of each gold finger to form a first routing tape and a second routing tape, wherein the first routing tape and the second routing tape are connected to the two ends of the strip respectively; and removing burrs on a surface of the board body through an etching process.

A metal foil that has a carrier and a preparation method thereof. The metal foil with a carrier comprises a carrier layer, a barrier layer, a striping layer, and a metal foil layer. The carrier layer, the barrier layer, the striping lay, and the metal foil layer are sequentially stacked, or the carrier layer, the striping layer, the barrier layer, and the metal foil layer are sequentially stacked. The diffusion depth of the carrier layer to the metal foil layer is less than or equal to 3 μm and the diffusion depth of the metal foil layer toward the carrier layer is less than or equal to 3 μm at a temperature of 20-400° C. By setting the barrier layer, the carrier layer and the metal foil layer are prevented from diffusing mutually to cause bonding at a high temperature, so that the carrier layer and the metal foil layer are easy to peel off

Disclosed herein relates to a copper foil having a low roughness property by roughening a matte side, wherein a thickness of the copper foil is from 5 μm to 70 μm, and profilometer-measured mean roughness of the roughened surface of the copper foil is from 0.5 μm to 2.0 μm, and wherein profilometer-measured mean roughness Rz JIS of the roughened matte side of the copper foil is lower than that of a shiny side of the copper foil. The copper foil provided in the present invention has excellent adhesion with a resin and an electrical property while having low roughness through surface roughening.

Provided are an electrodeposited copper foil, an electrode comprising the same, and a lithium-ion secondary battery comprising the same. The electrodeposited copper foil has a drum side and a deposited side opposing the drum side, wherein at least one of the drum side and the deposited side exhibits a void volume value (Vv) in the range of 0.17 μm.sup.3/μm.sup.2 to 1.17 μm.sup.3/μm.sup.2; and an absolute value of a difference between a maximum height (Sz) of the drum side and a Sz of the deposited side is in the range of less than 0.60 μm.

A metal-clad laminate includes an insulating layer including a cured product of a resin composition, and a metal foil disposed on at least one principal surface of the insulating layer. The resin composition includes a thermosetting curing agent and a polyphenylene ether copolymer. The polyphenylene ether copolymer has an intrinsic viscosity ranging from 0.03 dl/g to 0.14 dl/g, inclusive. The intrinsic viscosity is measured in methylene chloride at 25° C. And the polyphenylene ether copolymer has, at a molecular terminal, a group represented by one of formula (1) and formula (2) at an average number of more than or equal to 0.8 and less than 1.5 per one molecule. Further, the metal foil includes a barrier layer containing cobalt on a first surface of the metal foil. The first surface is in contact with the insulating layer, and has a ten-point average roughness (Rz) of less than or equal to 2.0 μm. In formula (1), R.sup.1 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and R.sup.2 represents an alkylene group having 1 to 10 carbon atoms. In formula (2), R.sup.3 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. ##STR00001##

Provided is a copper-clad laminate in which a copper foil and a resin are joined together with high heat-resistant adhesion force though a fluororesin is used. This copper-clad laminate includes a surface-treated copper foil including a copper foil and a zinc-containing layer on at least one surface of the copper foil; and a sheet-shaped fluororesin on the zinc-containing layer side of the surface-treated copper foil. The zinc-containing layer is composed of Zn and a transition element M having a melting point of 1200° C. or more. When the interface between the copper foil and the zinc-containing layer is subjected to elemental analysis by GD-OES, the emission intensity ratio I.sub.Zn/I.sub.Cu of the emission intensity of Zn to that of Cu is 3.0×10.sup.−3 or less, and the emission intensity ratio I.sub.Zn/I.sub.M of the emission intensity of Zn to that of the transition element M is 0.30 to 0.50.

Provided is a method for manufacturing a copper-clad laminate in which a copper foil and a resin are joined together with high heat-resistant adhesion force though a fluororesin, which is a low dielectric constant thermoplastic resin, is used. This method includes providing a surface-treated copper foil including a copper foil and a zinc-containing layer on at least one surface of the copper foil, and affixing a sheet-shaped fluororesin to the zinc-containing layer side of the surface-treated copper foil. The zinc-containing layer is composed of Zn and a transition element M having a melting point of 1200° C. or more. When the interface between the copper foil and the zinc-containing layer is subjected to elemental analysis by XPS, the content of Zn is 10 wt % or less, and the Zn/M weight ratio, the ratio of the content of Zn to the content of the transition element M, is 0.2 to 0.6.

A surface treated copper foil 1 includes a copper foil 2, and a first surface treatment layer 3 formed on one surface of the copper foil 2. The first surface treatment layer 3 of the surface treated copper foil 1 has L* of a CIE L*a*b* color space of 44.0 to 84.0. A copper clad laminate 10 includes the surface treated copper foil 1 and an insulating substrate 11 adhered to a surface of the surface treated copper foil 1 opposite to the first surface treatment layer 3.

An advanced electrodeposited copper foil and a copper clad laminate using the same are provided. The advanced electrodeposited copper foil has an uneven micro-roughened surface. As observed by a scanning electron microscope operated with a +35 degree tilt and under 1,000× magnification, the uneven micro-roughened surface has a plurality of production direction stripes formed by copper crystals.