A method of plating a conductive material includes providing conductive material. An aqueous bath solution comprised of at least one solvent, a nickel source, a phosphorous source, a reducing agent, a pH-controlling material, a stabilizer and a complexing agent is used to plate the conductive material. The conductive material contacts the bath solution. Electroless plating occurs on top of the conductive material and the plating includes from about 88 to 93 wt. % nickel and from at least 7 to about 12 wt. % phosphorous to form a nickel-phosphorous plating. The thickness of the plating is from about 50 to about 300 nm and the plating is generally uniform with the thickness of the surface being within 20 percent of the average thickness across the surface of the plating.

A wiring substrate includes a substrate containing a resin as a main component and including a mixed layer in which the resin and a catalyst are mixed together; and a metal wire disposed to cover the mixed layer and being in contact with the catalyst. The wiring substrate with such a configuration can increase the adhesion of the metal wire to the substrate.

A multi-layer circuit board capable of being applied with electrical testing includes a metallic delivery loading plate, a bottom-layer circuit structure, a conductive corrosion-barrier layer, and a multi-layer circuit structure. The bottom-layer circuit structure is overlapping on the delivery loading plate. The conductive corrosion-barrier layer is disposed on the bottom dielectric layer. The multi-layer circuit structure is overlapping on the bottom-layer circuit structure. The top-layer circuit of the multi-layer circuit structure is electrically connected to the conductive corrosion-barrier layer through the inner-layer circuit of the multi-layer circuit structure and the bottom-layer circuit of the bottom-layer circuit structure. The delivery loading plate and the bottom dielectric layer of the bottom-layer circuit structure expose the conductive corrosion-barrier layer.

The present invention provides for depositing a desired pattern (31) of magnetic material (30) on a non-magnetic substrate (20). Control of the deposition pattern (31) is achieved by use of a magnetised template (10) shaped to correspond to the desired deposition pattern. In use, the template (10) is placed behind the substrate (20). Subsequently, the front surface of the substrate (20) is exposed to a solution containing the magnetic material (30) to be deposited. The magnetic material (30) is attracted to the magnetised template (10) and consequently is deposited in a pattern (31) covering areas corresponding to the shape of the template (10).

A wiring substrate includes a first wiring layer; a first insulation layer including a reinforcement material and a first opening extending through the reinforcement material and exposing a partial region of an upper surface of the first wiring layer, in which an end of the reinforcement material projects in the first opening; a second insulation layer not including a reinforcement material, covering an upper surface of the first insulation layer, a wall surface of the first opening, and a first part of the partial region and an entire surface of the reinforcement material projecting in the first opening, and including a second opening exposing a second part of the partial region; and a second wiring layer including a wiring portion formed on an upper surface of the second insulation layer and a via portion formed in the second opening and connecting the wiring portion to the first wiring layer.

A process of forming an article utilizes an ultra-thin, removable, catalytic film for Laser Direct Structuring (LDS). The process includes forming a film from a laser-activatable material, the film exhibiting thickness of less than 100 m; applying the film to a black or opaque substrate to form a film-substrate element; applying a laser to the film-substrate element; removing a portion of the film from the film-substrate element; and applying metal plating to a portion of the black or opaque substrate. Removal of the film from the film-substrate element may follow metal plating of the black or opaque substrate. An article formed by the process may be useful in a computer device, electromagnetic interference device, printed circuit, Wi-Fi device, Bluetooth device, GPS device, cellular antenna device, smart phone device, automotive device, medical device, sensor device, RF antenna device, LED device, RFID device, or a component of a cell phone antenna.

A printed wiring board includes a base film having insulation properties and a conductive pattern including multiple wiring portions laminated so as to run on at least one surface of the base film, wherein each wiring portion includes a first conductive portion and a second conductive portion coating an outer surface of the first conductive portion, wherein an average width of each wiring portion is 10 m or greater to 50 m or smaller, and an average thickness of the second conductive portion is 1 m or greater to smaller than 8.5 m. A method for manufacturing a printed wiring board includes a first conductive portion forming step of forming a first conductive portion forming each wiring portion by plating an opening of the resist pattern on the conductive foundation layer, a conductive foundation layer removing step, and a second conductive portion coating step.

A printed circuit board according to an embodiment of the present invention includes a base film having an insulating property and a conductive pattern disposed on at least one surface of the base film. The conductive pattern includes a copper particle bond layer which is fixed to the base film, and a lightness L* of a conductive pattern non-formed region of the base film is 60 or less. The base film may include a modified layer on one surface side thereof.

A printed circuit board according to an embodiment of the present invention includes a base film containing, as a main component, a polyimide and a conductive pattern disposed on at least one surface of the base film. The conductive pattern includes a copper particle bond layer which is fixed to the base film. An external transmittance for a wavelength of 500 nm in a conductive pattern non-formed region of the base film is 70% or less of an internal transmittance for a wavelength of 500 nm in a middle layer portion of the base film.

A three-dimensional wiring board production method is provided that includes: a preparation step of preparing a resin film (1) having a breaking elongation of 50% or more; a first metal film formation step of forming a first metal film (3) on a surface of the resin film; a pattern formation step of performing patterning on the first metal film to form a desired pattern; a three-dimensional molding step of performing three-dimensional molding by heating and pressurizing the resin film; and a second metal film formation step of forming a second metal film (21) on the first metal film having a pattern formed thereon. In the first metal film formation step, metal is deposited in a particle state to form the first metal film in a porous state.