A semiconductor structure includes: a substrate; bit lines located in the substrate and including a main body and a plurality of contact portions, the main body extending in a first direction, the contact portions being connected to the main body and extending toward the top surface of the substrate, and the plurality of contact portions being arranged at intervals in the first direction; and transistors located on a top surface of the contact portion, the extension direction of a channel of the transistor being perpendicular to a plane where the substrate is located.

Embodiments of the disclosure provide a semiconductor structure and a method for forming the same. The method includes: providing a semiconductor substrate including a plurality of active pillars arranged at intervals; etching the active pillar to form an annular groove, in which the annular groove does not expose a top surface and a bottom surface of the active pillar; and forming a first semiconductor layer in the annular groove to form the semiconductor structure; in which a band gap of the first semiconductor layer is smaller than a band gap of the active pillar.

A memory device and a method for forming the same are provided. A hard mask layer is formed on a semiconductor substrate; and then multiple parallel mask patterns extending in a third direction are formed on the semiconductor substrate by adopting self-aligned multi-patterning. Openings are arranged between the adjacent mask patterns. The surfaces of multiple drain regions and corresponding part of the isolation layer in the third direction are exposed by the openings.

Apparatuses and methods for manufacturing semiconductor memory devices are described. An example method includes: forming a conductive layer and sputtering the conductive layer with gas. The conductive layer includes a first portion having a top surface having a first height; and a second portion having a top surface having a second height lower than the first height. Sputtering the conductive layer with gas may be performed to remove the first portion of the conductive layer and increase the second height of the second portion of the conductive layer concurrently.

A method for fabricating a semiconductor device includes providing a substrate; forming a bit line conductive layer on the substrate and a bit line inner capping layer on the bit line conductive layer to form a bit line structure; a bit line structure; forming a bit line spacer capping layer covering the bit line structure; forming a cell contact adjacent to the bit line structure; forming a blanket pad layer on the bit line spacer capping layer and the cell contact; forming a plurality of pad openings along the blanket pad layer and extending to the bit line spacer capping layer and the bit line inner capping layer to turn the blanket pad layer into a plurality of landing pads; and selectively forming a sealing layer to form a plurality of air gaps between the bit line conductive layer and the plurality of landing pads.

An embodiment provides a method for fabricating a semiconductor structure. The method includes: providing a semiconductor substrate having an active area, the active area including a first active area and a second active area isolated from each other; forming a bitline contact groove on the semiconductor substrate, the bitline contact groove exposing the first active area; forming an etch stop layer covering a sidewall of the bitline contact groove, the etch stop layer exposing a partial area of the first active area at a bottom of the bitline contact groove; etching the semiconductor substrate by using the etch stop layer as a mask to form a pit at the bottom of the bitline contact groove, the pit being at least partially positioned in the first active area; removing the etch stop layer; forming a bitline structure; and forming a conductive plug electrically connected to the second active area.

The present disclosure provides a semiconductor structure and a manufacturing method thereof, and relates to the technical field of semiconductors. The method of manufacturing the semiconductor structure includes: providing a substrate; forming, on the substrate, a first initial conductive layer, a sacrificial layer and a first mask layer with a pattern that are stacked sequentially, a thickness of the sacrificial layer being 10 nm-20 nm; and etching, with the first mask layer as a mask, the first initial conductive layer and the substrate to form a bit line (BL) contact region.

The present disclosure relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes: a substrate including a peripheral region, wherein the peripheral region includes a wire lead-out area, and the substrate is arranged with a plurality of discrete bit line structures; a dielectric layer formed between the adjacent bit line structures, wherein the peripheral region is arranged with a first contact hole; a wire lead-out area with a second through hole; a filling layer filling part of a first contact hole, wherein a remaining part of the first contact hole is defined as a first through hole; a first conductive layer located in the first through hole and the second through hole; and a conductive connecting wire located over the dielectric layer and being in contact with the first conductive layer in the wire lead-out area.

The present disclosure provides a method for manufacturing a semiconductor structure. The method includes forming a bit line on a substrate, forming a first dielectric layer over the substrate and surrounding a lower portion of the bit line, forming a second dielectric layer over the bit line and the first dielectric layer, forming a contact over the second dielectric layer, wherein a height of the contact above the substrate is greater than a height of the first dielectric layer above the substrate, removing the first dielectric layer and the second dielectric layer, and forming a third dielectric layer conformally over the bit line, the substrate and the contact, thereby forming an air gap between the contact and the bit line.

The present application discloses a method for fabricating the semiconductor device. The method for fabricating a semiconductor device includes providing a substrate having a first lattice constant and forming a first word line positioned in the substrate and a plurality of stress regions positioned adjacent to lower portions of sidewalls of the first word line. The plurality of stress regions have a second lattice constant, the second lattice constant of the plurality of stress regions is different from the first lattice constant of the substrate.