According to an aspect of the disclosure, in a non-display region inside a display region, an oxide semiconductor layer is provided in an island shape, a first opening is provided in a first inorganic insulating film so as to expose the oxide semiconductor layer in the non-display region, a common functional layer is provided so as to extend from the display region to the non-display region, and a second opening is provided so as to expose the oxide semiconductor layer in the common functional layer, a peripheral end of the second opening being surrounded by a peripheral end of the first opening in a plan view.

An aspect of the disclosure, in a non-display region, an oxide semiconductor layer is provided in a frame-like shape along a peripheral edge of a through hole, a first opening is provided in a first inorganic insulating film so as to surround the through hole in a plan view and expose the oxide semiconductor layer in the non-display region, a common functional layer is provided so as to extend from a display region to the non-display region, a second opening is provided in a frame-like shape so as to surround the through hole in a plan view and expose the oxide semiconductor layer in the common functional layer, and a second inorganic insulating film is in contact with the oxide semiconductor layer via the second opening.

A display device includes an active matrix substrate; a light-emitting element layer including a plurality of first electrodes, a function layer, and a second electrode; and a sealing layer. The light-emitting element layer further includes an edge cover layer configured to cover an end portion of each one of the plurality of first electrodes. The edge cover layer includes a plurality of openings configured to expose the plurality of first electrodes included in a plurality of pixels. The plurality of openings include a first opening with a rectangular shape. A first individual vapor deposition film with a rectangular shape is formed on the first electrode covering the first opening. In the first individual vapor deposition film, projection portions projecting from sections corresponding to at least some opposing vertices of the first opening to an opposite side to the first opening are provided on the edge cover layer.

A display device includes a base substrate, a thin film transistor layer including an upper layer insulating film and an organic resin layer, a plurality of light-emitting elements provided on the thin film transistor layer and each including a common function layer, a non-display region provided in the display region, an opening provided in the non-display region and passing through the base substrate, and a first frame-shaped protruding portion provided on the upper layer insulating film in a circumferential shape along the opening. The first frame-shaped protruding portion includes a portion where an area of a transverse section parallel to an upper face of the base substrate decreases from an upper face to a bottom face, the common function layer is also provided in the non-display region, and a slit surrounding the first frame-shaped protruding portion is formed in the common function layer provided in the non-display region.

A display panel, a manufacturing method of the display panel, and a display device are provided. The display panel includes an under-screen device area and a non-under-screen device area, wherein an area under the under-screen device area includes an area where hardware is installed; the under-screen device area includes a substrate portion, an anode layer, a pixel definition layer, a deformation layer, a cathode layer, and an encapsulation layer; wherein, a volume of the deformation layer expands under a first predetermined condition to enable a thickness of the cathode layer in the under-screen device area less than a thickness of the cathode layer in the non-under-screen device area.

A display panel and a manufacturing method are provided, wherein the display panel includes an array substrate, a first anode layer, a pixel definition layer, a second anode layer, a light-emitting layer, and a cathode layer. The array substrate includes an array area. The first anode layer is disposed on the array area. The pixel definition layer disposed on the array area and the first anode layer includes a plurality of holes and a first area. The second anode layer is disposed on the first area. The light-emitting layer is disposed in the plurality of holes. The cathode layer is disposed on the pixel definition layer and the light-emitting layer.

A display device including a base substrate including a display area and a non-display area positioned at a side of the display area; at least one transistor in the display area of the base substrate and conductive lines in the non-display area of the base substrate; at least one light- emitting element in the display area that is coupled to the at least one transistor; an encapsulation layer covering the light-emitting element; a sensing electrode on the encapsulation layer and a sensing line on the encapsulation layer coupled to the sensing electrode; and an align mark on the encapsulation layer at least partially overlapping some of the conductive lines in the non-display area, in a plan view.

A display device may include a display panel including a signal pad and a circuit board including a connection pad having a first connection pad portion and a second connection pad portion. The second connection pad portion may be thicker than the first connection pad portion and may not be overlapped with the first connection pad portion in a plan view. The connection pad may be in contact with the signal pad. A first surface roughness between the first connection pad portion and the signal pad may be greater than a second surface roughness between the second connection pad portion and the signal pad.

This disclosure relates to a display panel and a manufacturing method thereof, and a display device. The display panel includes a display area, an opening area and an isolation area located between the display area and the opening area and surrounding the opening area, and includes: a base substrate; a driving circuit layer including a thin film transistor and a storage capacitor that are formed on the base substrate and located in the display area, the thin film transistor including a gate electrode, a first gate insulating layer, an interlayer dielectric layer and source and drain electrodes that are sequentially formed, the storage capacitor including a first electrode plate on the same layer as the gate electrode and a second electrode plate between the first gate insulating layer and the interlayer dielectric layer; a first isolation column formed on the base substrate and located in the isolation area.

A display panel and a method for fabricating the same are discussed. The display panel can include a first area in which pixels are disposed, and a second area in which pixels having lower pixels per inch (PPI) than the first area are disposed and a plurality of light-transmitting portions are disposed. The light-transmitting portions include circular or elliptical light-transmitting portions arranged in a zigzag pattern along a second direction crossing a first direction in the second area. Each of the pixel groups in the second area includes a second electrode, and the second electrode is removed from the light-transmitting area to expose light-transmitting portions.