An OLED display panel and fabrication method thereof are provided by the present application. The OLED display panel includes a substrate, a transparent conductive layer, a buffer layer, a metal oxide semiconductor layer, a gate insulating layer, a gate layer, an interlayer insulating layer, a source-drain layer, and an OLED device layer that are stacked. A light emitting direction of the OLED device layer faces the substrate. In the present application, a conductive electrode and a first electrode plate of a transparent capacitor are both patterned and formed with the transparent conductive layer, and only one process is required. Therefore, a mask is saved and fabrication cost is reduced.

A display panel and a manufacturing method include a substrate divided into a transparent region, a wiring changing region, and a display region; a first signal conducting wire including a first line segment and a second line segment and disposed on a plurality of insulating layers; and a planarization layer disposed on the first line segment, the second line segment, and the plurality of insulating layers. The first signal conducting wire further includes a first anode wiring disposed on the planarization layer, is located in the wiring changing region, and is electrically connected to the first line segment and the second line segment. Using signal conducting wires and wirings of the anode wirings reduces manufacturing of a layer of the signal conducting wires and a layer of the planarization layer above.

An OLED display substrate and a method for making the same, a display panel and a display device are provided. The OLED display substrate includes: a base substrate; a thin-film transistor array layer located on the base substrate; a pixel definition layer and a light-emitting unit located on a side of the thin-film transistor array layer away from the base substrate; where the pixel definition layer defines a pixel opening penetrating the pixel definition layer, at least part of the hierarchical structure of the light-emitting unit is located in the pixel opening, and a side surface of the pixel opening is provided with a insulative barrier layer.

Embodiments of the present application provide a display panel and a fabrication method thereof. The display panel includes an array substrate, a pixel defining layer, an encapsulation layer, and a black matrix. The pixel defining layer is disposed on the array substrate, the pixel defining layer is formed with a plurality of pixel pits, and the plurality of pixel pits have a first predetermined shape. The encapsulation layer is disposed on the pixel defining layer, and the black matrix is disposed on the encapsulation layer. The black matrix is formed with a plurality of color filter pits, the plurality of color filter pits have a second predetermined shape, and the plurality of color filter pits correspond to the plurality of pixel pits.

A display substrate, a method for manufacturing the display substrate, and a display apparatus are provided. The display substrate includes: a base substrate; a partition structure, where the partition structure has a first side and a second side opposite to each other; and a light guide structure arranged proximate to the partition structure. At least one light guide structure is located on the first side of the partition structure and configured to guide a light onto a part, which faces the light guide structure, of a side surface of the partition structure on the first side; and the partition structure has a first inclined side surface located on the first side, where the first inclined side surface extends distally from the base substrate and is inclined away from the second side, and a first space is formed between the first inclined side surface and the base substrate.

The display substrate includes a display area, a barrier wall disposing area, and a hole area, the display area surrounds the barrier wall disposing area, the barrier wall disposing area surrounds the hole area, and the method for manufacturing the display substrate includes: after a first electrode of a light emitting device of the display substrate is formed, removing a protective layer of the barrier wall disposing area, and exposing at least one circle of an initial barrier wall covered by the protective layer, the initial barrier wall is disposed around the hole area; and etching the at least one circle of the initial barrier wall, to form at least one circle of a barrier wall, a notch is formed on at least one side surface of the barrier wall.

A display panel includes a substrate, a pad, an auxiliary electrode layer, a data line layer, a first electrode layer, a light emitting layer, and a second electrode layer. The substrate has a display area and a peripheral area. The pad is disposed on a side of the substrate and located in the peripheral area. The auxiliary electrode layer is disposed on the same side of the substrate as the pad; the data line layer is disposed on a same layer as the auxiliary electrode layer; the first electrode layer is disposed on a side of the auxiliary electrode layer facing away from the substrate; the light emitting layer is disposed on a side of the first electrode layer facing away from the substrate; and the second electrode layer is disposed on a side of the light emitting layer facing away from the substrate and connected to the auxiliary electrode layer.

An optoelectronic device includes a semiconductor substrate, wherein a first transport layer is formed on a first partial region of the semiconductor substrate; a first insulation layer is formed on a second partial region around the first partial region; the first transport layer is formed on the first insulation layer; an interface layer is formed on the first transport layer; a light-emitting material layer containing perovskite material is formed on the interface layer; a second insulation layer is formed on the light-emitting material layer in the second partial region and on the light-emitting material layer near a second partial region side in the first partial region, so that the characteristic size of a single light-emitting pixel or effective working region is adjustable.

A display device according to an aspect of the disclosure includes a display region. The display region is provided with a plurality of first grooves and a plurality of second grooves formed between adjacent control lines and spaced apart from the plurality of control lines, in a plan view. Each of the plurality of first grooves extends in a second direction along a coupling semiconductor layer, between the adjacent control lines, in a plan view. Each of the plurality of second grooves extends in a direction intersecting a first groove of the plurality of first grooves, and is adjacent to at least one end portion of the first groove.

A display device includes a plurality of sub-pixels, a support body, a thin-film-transistor layer, a light-emitting-element layer, and a sealing layer. The thin-film-transistor layer includes a plurality of thin-film transistors and a planarization film. The light-emitting-element layer includes a plurality of light-emitting elements. Each of the plurality of light-emitting elements includes a lower electrode, a functional layer, and an upper electrode. The lower electrode is a sub-pixel electrode shaped into an island and provided for each of the sup-pixel electrodes. The upper electrode is a common electrode formed in common among all the plurality of sub-pixels. The planarization film includes a trench shaped into a frame and provided for each of the sub-pixels. The trench defines a light-emitting region of the light-emitting element for each of the sub-pixels.