A display device includes: a substrate; an insulating layer on a top surface of the substrate; a plurality of light-emitting diodes on the insulating layer and including two light-emitting diodes spaced apart from each other and having a transmission area therebetween; an encapsulation member covering the plurality of light-emitting diodes; and a rear cover layer located on a rear surface of the substrate and including a first portion located in the transmission area, wherein the first portion includes a transparent material.

A display device includes a display module having a folding area and a non-folding area adjacent to the folding area. A glass substrate is disposed on the display module and comprises a first layer and a second layer disposed on the first layer. The second layer has a compressive strength that is higher than a compressive strength of the first layer. The first layer and the second layer of the glass substrate each include a folding portion overlapping the folding area and having a first thickness and a non-folding portion overlapping the non-folding area and having a second thickness greater than the first thickness. The second layer of the non-folding portion has a thickness that is greater than a thickness of the second layer of the folding portion.

A method of manufacturing a display apparatus includes forming a thin-film transistor on a substrate and forming a planarization layer to cover the thin-film transistor, forming, on the planarization layer, a pixel electrode electrically connected to the thin-film transistor and a pixel defining layer exposing at least a center portion of the pixel electrode, and defining at least one groove having a closed curve shape at a location corresponding to a second non-display area. When the thin-film transistor is formed, a voltage line is also formed at a location corresponding to a first non-display area. When the at least one groove is formed, a portion of the planarization layer disposed between the pad area and the display area is simultaneously removed such that a portion of the voltage line between the pad area and the display area is exposed.

A method of manufacturing a display apparatus includes forming a thin-film transistor on a substrate and forming a planarization layer to cover the thin-film transistor, forming, on the planarization layer, a pixel electrode electrically connected to the thin-film transistor and a pixel defining layer exposing at least a center portion of the pixel electrode, and defining at least one groove having a closed curve shape at a location corresponding to a second non-display area. When the thin-film transistor is formed, a voltage line is also formed at a location corresponding to a first non-display area. When the at least one groove is formed, a portion of the planarization layer disposed between the pad area and the display area is simultaneously removed such that a portion of the voltage line between the pad area and the display area is exposed.

The present disclosure is related to an array substrate. The array substrate may include a base substrate and a pixel defining layer on the base substrate. The pixel defining layer may include a plurality of thickness thinning regions. The thickness thinning regions may have a smaller height than other areas of the pixel define layer on the base substrate. The plurality of the thickness thinning regions may be configured to guide flow of fillers to form an encapsulating layer on the pixel defining layer.

Provided are a display substrate, a preparation method thereof, and a display apparatus. A portion of a pixel definition layer that is in contact with a light-emitting functional layer is configured to have the performance of switching between hydrophilicity and hydrophobicity when an external condition changes. When film layers of the light-emitting functional layer are formed, due to the inconsistent hydrophilicity or hydrophobicity of the film layers of the light-emitting functional layer, when a hydrophilic light-emitting functional layer is formed, the pixel definition layer switches, under processing via the external condition, the portion of the pixel definition layer that is in contact with the light-emitting functional layer to be hydrophobic, and when a hydrophobic light-emitting functional layer is formed, the pixel definition layer switches, under processing via the external condition, the portion of the pixel definition layer that is in contact with the light-emitting functional layer to be hydrophilic.

A display device includes a plurality of sub-pixels disposed on a display area of the display device and including a first electrode, a light emitting layer, and a second electrode, a pixel-defining layer defining emission areas of the plurality of sub-pixels, respectively, an organic planarization layer disposed on the pixel-defining layer and comprising one or more valleys overlapping a first area in a plan view and at least one protrusion overlapping a second area in a plan view, and a high-refractive planarization layer disposed on the organic planarization layer. The first area is located at an edge of the display area. A second area is located in a non-display area of the display device.

The display substrate includes: a first electrode located in a first display region and a second electrode located in a second display region; a first light emitting layer located in the first display region and a second light emitting layer located in the second display region; and a third electrode located in the first display region and a fourth electrode located in the second display region. By optimizing patterned design of the third electrode, a first electrode wiring mode in the first display region is optimized, so that a display effect in the first display region is improved, glare interference is reduced, the transmittance of the first display region is optimized and improved, and a photographing effect of an under-screen camera configured in the first display region is ensured.

A display panel having a base substrate, a light emitting layer on a side of the base substrate, and a wavelength converting layer on a side of light emitting layer away from the base substrate is provided.The light emitting layer includes light emitting units and a first pixel defining layer defining the plurality of light emitting units, the wavelength converting layer includes wavelength converting units and a second pixel defining layer defining the wavelength converting units, each of the of wavelength converting units converts a wavelength of a light emitted by at least one of the light emitting units, wherein in a direction perpendicular to the base substrate, the second pixel defining layer has a thickness twice or more that of the first pixel defining layer. A method for manufacturing the display panel and a display device are also provided.

The present disclosure relates to a display device, and a display device according to an embodiment includes a substrate, a transistor disposed on the substrate, a light emitting element connected to the transistor, an encapsulation layer disposed on the light emitting element, a sensing electrode disposed on the encapsulation layer, a first insulating layer disposed on the sensing electrode and including an opening, a second insulating layer disposed on the first insulating layer, and a third insulating layer disposed on the second insulating layer, wherein a refractive index of the third insulating layer is higher than that of the second insulating layer.