Patent classifications
H10K71/233
Thin film transistor and method of manufacturing the same and thin film transistor panel and electronic device
A thin film transistor includes a gate electrode, a semiconductor layer overlapped with the gate electrode, a gate insulating layer between the gate electrode and the semiconductor layer, and a source electrode and a drain electrode electrically connected to the semiconductor layer. The semiconductor layer includes a plurality of holes. The gate insulating layer may include a plurality of recess portions at a surface of the gate insulating layer facing the semiconductor layer. A method of manufacturing the thin film transistor is provided. A thin film transistor array panel and an electronic device may include the thin film transistor.
Array substrate and fabricating method thereof, display panel, and display apparatus
An array substrate includes a base substrate (1); a driving transistor (2) on the base substrate (1); an insulating layer (3) on the driving transistor (2), the insulating layer (3) comprising a via hole above a first electrode (21) of the driving transistor (2); a conductive portion (4) on the insulating layer (3); and a light emitting device (6) on the conductive portion (4) and electrically connected to the conductive portion (4). The conductive portion (4) may be electrically connected to the first electrode (21) of the driving transistor (2) through the via hole. The light emitting device (6) may be above the via hole, and an orthographic projection of the light emitting device (6) on the base substrate (1) may cover an orthographic projection of the via hole on the base substrate (1).
Pattern part, method for forming pattern part and method for manufacturing display device using same
A method of forming a pattern part includes forming a first film on a target object, the first film having a first cure shrinkage ratio, forming a second film on the first film, the second film having a second cure shrinkage ratio greater than the first cure shrinkage ratio, and patterning the first film and the second film to form a pattern.
MANUFACTURING METHOD OF PATTERNED QUANTUM DOT LIGHT-EMITTING LAYER AND MANUFACTURING METHOD OF LIGHT-EMITTING DEVICE
A manufacturing method of a patterned quantum dot light-emitting layer includes: forming a sacrificial layer on a side of a base substrate, wherein the sacrificial layer includes a first component and a second component mixed in the first component; forming a patterned photoresist layer on a side of the sacrificial layer facing away from the base substrate; etching the sacrificial layer by taking the patterned photoresist layer as a mask to form a patterned sacrificial layer; forming a quantum dot film layer on a side of the photoresist layer facing away from the sacrificial layer; making the second component decompose under the preset condition to produce the bubbles, to make the first component form the porous structure; and forming the patterned quantum dot light-emitting layer by removing the photoresist layer, the sacrificial layer and the quantum dot film layer attached to the sacrificial layer, by dissolution via a solvent.
DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
A display apparatus includes: a first pixel electrode and a second pixel electrode spaced apart from each other on a substrate; a pixel definition layer including an opening exposing a central portion of each of the first pixel electrode and the second pixel electrode; an intermediate layer on the first pixel electrode, the second pixel electrode, and the pixel definition layer and including a through hole exposing at least a portion of an upper surface of the pixel definition layer between the first pixel electrode and the second pixel electrode; an opposite electrode on the intermediate layer to face the first pixel electrode and the second pixel electrode; and an inorganic encapsulation layer over the opposite electrode.
DISPLAY PANEL, DISPLAY DEVICE AND FABRICATING METHOD OF DISPLAY PANEL
A display panel comprises includes: a base substrate; a first electrode layer and a second electrode layer on a side of the base substrate; a light-emitting layer between the first electrode layer and the second electrode layer; and a carrier functional layer located at least one of between the first electrode layer and the light-emitting layer, and between the second electrode layer and the light-emitting layer. The light-emitting layer has a plurality of light-emitting portions with different emergent light wavebands; and the carrier functional layer has a plurality of carrier functional portions corresponding to the plurality of light-emitting portions, the plurality of carrier functional portions having molecular chains, which is formed by cross-linking of monomers containing functional groups under light irradiation.
FLEXIBLE SUBSTRATE AND MANUFACTURING METHOD THEREOF, PANEL AND ELECTRONIC DEVICE
A flexible substrate and a manufacturing method thereof, a panel and an electronic device are provided. The flexible substrate includes a first inorganic layer and a first organic layer; the first organic layer is on the first inorganic layer and in contact with the first inorganic layer, and a surface, which is in contact with the first organic layer, of the first inorganic layer has a first groove.
FORMATION OF A TWO-LAYER VIA STRUCTURE TO MITIGATE DAMAGE TO A DISPLAY DEVICE
In some embodiments, the present disclosure relates to a method that includes forming an isolation structure over a reflector electrode and forming a protective layer over the isolation structure. Further, a first removal process is performed to form a first opening in the protective layer and the isolation structure to expose a first surface of the reflector electrode. A cleaning process is performed to clean the first surface of the reflector electrode. A conductive layer is formed over the protective layer and within the first opening. The conductive layer includes a different material than the protective layer. A second removal process is performed to remove peripheral portions of the protective layer and the conductive layer to form a via structure within the opening, extending through the isolation structure to contact the reflector electrode, and including the protective layer and the conductive layer.
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME
Provided are an exposure apparatus including a light source unit which provides light for exposure and comprises micro light emitting diodes arranged in a matrix form; a substrate transfer unit which transfers a target substrate; and a control unit which controls at least one of the light source unit and the substrate transfer unit. The control unit allocates coordinates or an address to each micro light emitting diode and individually controls an amount of light of each micro light emitting diode according to a preset pattern based on the coordinates or the address.
Display apparatus having self-aligned structures and method of manufacturing the same
A display apparatus includes a base substrate, a thin film transistor layer on the base substrate, an insulation layer on the thin film transistor layer, a first electrode on the insulation layer and in a light emitting area, a pixel defining layer having an opening that has a size and a shape substantially same as that of the first electrode, and on the insulation layer, a light emitting layer on the first electrode, and a second electrode on the light emitting layer.