In some embodiments, the present disclosure relates to a method that includes forming an isolation structure over a reflector electrode and forming a protective layer over the isolation structure. Further, a first removal process is performed to form a first opening in the protective layer and the isolation structure to expose a first surface of the reflector electrode. A cleaning process is performed to clean the first surface of the reflector electrode. A conductive layer is formed over the protective layer and within the first opening. The conductive layer includes a different material than the protective layer. A second removal process is performed to remove peripheral portions of the protective layer and the conductive layer to form a via structure within the opening, extending through the isolation structure to contact the reflector electrode, and including the protective layer and the conductive layer.

The present disclosure provides a quantum dot light emitting panel, a display device, and a manufacturing method. The quantum dot light emitting panel comprises: a base substrate; a cathode layer, located on a side of the base substrate; an electron transfer layer, located on a side of the cathode layer located away from the base substrate; a quantum dot light emitting layer, located on a side of the electron transfer layer located away from the cathode layer, and having at least two light emitting portions having mutually different wavelength ranges of emitted light; a photosensitive polymer film layer, located between the quantum dot light emitting layer and the electron transfer layer, having photosensitive portions in a one-to-one correspondence with the light emitting portions, and configured such that molecular chains break when the photosensitive polymer film layer is subjected to preconfigured light irradiation; and an anode layer, located on a side of the quantum dot light emitting layer located away from the photosensitive polymer film layer.

The present disclosure provides an organic light-emitting display panel, a method for preparing the same and a display device. The method includes: providing a substrate, where the substrate includes a non-display area and a display area surrounding the non-display area; forming a barrier layer and a pixel circuit on the substrate, where an orthographic projection of the pixel circuit on the substrate and an orthographic projection of the non-display area on the substrate do not overlap; patterning the barrier layer in the non-display area to form at least one via hole penetrating the barrier layer; patterning the substrate by using the barrier layer as a mask in the non-display area to form a groove; forming a light emitting layer on the pixel circuit; and forming a thin film encapsulation layer covering the light emitting layer and the side wall of the draw-in structure on the light emitting layer.

Embodiments of the present disclosure provide a display panel and a method for manufacturing the same. In the embodiments, multiple layers in a functional area are removed through an etching process which is milder than a traditional cutting process and is not easy to introduce cracks into an inorganic material layer, so that a damage of components inside the display panel caused by moisture and oxygen is prevented, resulting in yield improvement of the display panel and cost saving.

A flexible substrate is provided, and the flexible substrate includes a second organic layer, a first inorganic layer, a first organic layer, and a second inorganic layer, which are sequentially stacked. A surface, which is in contact with the first organic layer, of the first inorganic layer has a first groove. A surface, which is in contact with the first inorganic layer, of the second organic layer has a second groove. A surface, which is in contact with the second inorganic layer, of the first organic layer has a third groove. In a direction perpendicular to the first inorganic layer, any two of the first groove, the second groove and the third groove at least partially are not aligned with each other. A manufacturing method of the flexible substrate, a panel including the flexible substrate, and an electronic device including the flexible substrate are also provided.

An organic thin film transistor includes a gate electrode, an organic semiconductor layer overlapped with the gate electrode, a hydrophilic nanolayer on the organic semiconductor layer, and a source electrode and a drain electrode electrically connected to the organic semiconductor layer.

An organic light-emitting display apparatus and a manufacturing method thereof have improved process stability and reliability by reducing damage to the organic light-emitting display apparatus during a manufacturing process. The organic light-emitting display apparatus includes: a substrate, a plurality of pixel electrodes, a pixel defining film, a plurality of hole control layers respectively arranged on the pixel electrodes, a plurality of emission layers respectively arranged on the hole control layers, a plurality of buffer layers respectively arranged on the emission layers, each of the buffer layers having a highest occupied molecular orbital (HOMO) energy level greater than the HOMO energy level of each of the plurality of emission layers, and an opposite electrode integrally provided over the buffer layers.

A method of manufacturing a display apparatus includes: forming a first lower lift-off layer, a first upper lift-off layer, and a first photoresist layer on a substrate on which a first pixel electrode is formed; forming a first masking layer including a first photoresist pattern, a first upper lift-off pattern, and a first lower lift-off pattern, which expose the first pixel electrode, by partially removing the first photoresist layer, the first upper lift-off layer, and the first lower lift-off layer; forming a first light emitting layer and a first counter electrode on the first pixel electrode by using the first masking layer; forming a first passivation layer on the first counter electrode; and removing the first masking layer.

A photopolymerizable resin composition includes a first layer and a second layer; and a barrier layer disposed between the first layer and the second layer, the barrier layer includes one or more of SiNx, SiOx, SiON, Mo, a Mo oxide, Cu, a Cu oxide, Al, an Al oxide, Ag, and a Ag oxide.

A shadow mask for patterned vapor deposition of an organic light-emitting diode (OLED) material includes a ceramic membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. A multilayer peripheral support is attached to a rear surface with a hollow portion beneath the aperture array. A compressively-stressed interlayer balances the tensile stress of the ceramic membrane. A shadow mask module with multiple shadow masks is also provided and includes a rigid carrier having plural windows with a shadow mask positioned in each window. To make the module, shadow mask blanks are affixed to each carrier window followed by etching of apertures and support layers. In this way extremely flat masks with precise aperture patterns are formed.