A display panel, an electronic device and a fabrication method are provided. The display panel includes: a substrate, an anode layer and a cathode layer arranged on a same side of the substrate, a luminescent function layer and a partition structure. The anode layer is arranged between the substrate and the cathode layer. The luminescent function layer is arranged between the anode layer and the cathode layer and includes at least one sub-function layer and multiple pixel units arranged in an array. The partition structure is arranged between at least two of the pixel units adjacent to each other in a first direction. The partition structure is configured to break at least one sub-function layer at a location between the at least two of the pixel units, and the first direction is parallel to the substrate.

A mask set and method for forming FinFET semiconductor devices provides a complementary set of fin-cut masks that are used in DPT (double patterning technology) to remove fins from non-active areas of a semiconductor device, after the fins are formed. Adjacent fins, or adjacent groups of fins, are removed using pattern features from different ones of the multiple fin-cut masks.

The method for manufacturing a display device includes forming a light emitting element and a terminal on a substrate, forming a sealing film including a first inorganic insulating film and a second inorganic insulating film to cover the light emitting element and the terminal, forming a resist having a taper shape in which a thickness of an end portion on the sealing film becomes thinner as it goes to the terminal side by using a gray-tone mask, forming a taper shape in which thicknesses in end portions of the first inorganic insulating film and the second inorganic insulating film becomes thinner as it goes to the terminal side by etching, forming a touch electrode above the sealing film and forming wiring connected to the terminal via the end portions together with connecting to the touch electrode for detecting a touched position.

A method of making a stack of the type comprising a first electrode, an active layer, and a second electrode, for use in an electronic device, in particular of the organic photodetector type or the organic solar cell type, the method comprising the following steps: a) depositing a first layer (2) of conductive material on a substrate (1) in order to form the first electrode; b) depositing an active layer (3) in the form of a thin organic semiconductor layer, this layer including non-continuous zones (30); c) locally eliminating the first conductive layer (2) through the non-continuous zones (30) of the active layer by chemical attack; and d) depositing a second layer (4) of conductive material on the active layer (3) in order to form the second conductive electrode.

Embodiments of the present disclosure provide a quantum dot light emitting device, a preparation method thereof and a quantum dot display panel, the method includes: forming a first function layer; forming a first sacrificial layer and a first photoresist layer; patterning the first photoresist; patterning the first sacrificial layer, the first function layer includes a first part and a second part, and the first sacrificial layer pattern and the first photoresist pattern are stacked on the first part, the second part is exposed by the first sacrificial layer pattern and the first photoresist pattern; forming a first quantum dot material layer; stripping the first sacrificial layer pattern to remove the first sacrificial layer pattern, the first photoresist pattern and the first quantum dot material layer on the first sacrificial layer pattern, retaining the first quantum dot material layer on the second part of the first function layer.

The present disclosure provides a black matrix and a method for manufacturing the same, and a color filter substrate and a method for manufacturing the same. The method for manufacturing the black matrix includes: providing a substrate; forming a sacrificial layer on the substrate, the sacrificial layer including a plurality of sacrificial patterns; forming a light shielding film layer on the sacrificial layer, wherein the light shielding film layer includes a plurality of first light shielding patterns and a plurality of second light shielding patterns, and each of the second light shielding patterns and an adjacent first light shielding pattern are separated by the sacrificial pattern; removing the sacrificial layer and the second light shielding pattern and forming the black matrix.

The present disclosure relates to the technical field of display devices, in particular to an OLED display panel and a manufacturing method thereof The OLED display panel includes a display region and a blind hole region located in the display region disposed on a substrate, wherein the display region includes: a driving circuit arranged on the substrate; a light-emitting layer disposed above the driving circuit; and the blind hole region includes: an opening; traces arranged on the substrate and surrounding the opening; and a light-shielding layer disposed above the traces, wherein the traces and a part of the driving circuit are located on a film layer, and the light-shielding layer and another part of the driving circuit are located on another film layer.

An organic EL device including: a substrate; a bank layer having therewithin an opening having an elongated shape in plan view; and a functional layer including an organic material, disposed within the opening, and having an elongated shape in plan view. The bank layer includes first banks opposing each other with the functional layer therebetween in an transverse direction of the functional layer and extending along a longitudinal direction of the functional layer and second banks opposing each other with the functional layer therebetween in the longitudinal direction of the functional layer and extending along the transverse direction of the functional layer. An angle θ2 between an inclined surface of a second bank and an upper surface of the substrate is greater than an angle θ1 between an inclined surface of a first bank and the upper surface of the substrate.

A method of making a device includes providing a fluorinated material layer over the device substrate having one or more target areas for patterning. One or more lift-off structures are formed at least in part by developing a first pattern of one or more open areas in the fluorinated material layer in alignment with the one or more target areas by contact with a developing agent including a fluorinated solvent which dissolves the fluorinated material at a first rate. After patterning, the lift-off structures are removed by contact with a lift-off agent including a fluorinated solvent wherein the lift-off agent dissolves the fluorinated material at a second rate that is at least 150 nm/sec and higher than the first rate.

A method of patterning a device is disclosed using a resist precursor structure having at least two fluoropolymer layers. A first fluoropolymer layer includes a first fluoropolymer material having a fluorine content of at least 50% by weight and is substantially soluble in a first hydrofluoroether solvent or in a first perfluorinated solvent, but substantially less soluble in a second hydrofluoroether solvent relative to both the first hydrofluoroether and the first perfluorinated solvent. The second fluoropolymer layer includes a second fluoropolymer material having a fluorine content less than that of the first fluoropolymer material and is substantially soluble in the first or second hydrofluoroether solvents, but substantially less soluble in the first perfluorinated solvent relative to both the first and second hydrofluoroether solvents.