A mask includes a substrate and an electrochromic layer that overlap each other. The electrochromic layer includes an electrochromic material.

The present invention is a resin composition including (a) a resin, (b) an antioxidizing agent, and (d) a crosslinking agent, wherein the resin composition is characterized by the following: the resin (a) is formed of one or more kinds of resins selected from among polyimide precursor, polyamide, polyimide, polybenzoxazole, and copolymers thereof; and the crosslinking agent (d) includes a phenolic hydroxyl group in one molecule, and also includes a substituent group having a molecular weight of 40 or more at both ortho positions of the phenolic hydroxyl group. Provided is the resin composition by which obtained is a pattern-cured film that enables fine patterns to be obtained, that exhibits excellent in-plane pattern uniformity while being curable at a low temperature of 250° C. or less, and that retains high extensibility and high adhesion with metal wires even after a reliability evaluation which is an actual-use accelerated test.

The present application can provide a nanoparticle, a method for patterning a nanoparticle layer and a light emitting device. When the nanoparticle provided by the present application is adopted for manufacturing a light emitting layer of the light emitting device, a cross-linking reaction occurs among first ligands of adjacent nanoparticles under irradiation of ultraviolet light, and the cross-linked nanoparticles may be firmly connected to a front film layer of the light emitting layer, so that when a developing solution is adopted for developing treatment, the cross-linked nanoparticles are not insoluble in the developing solution and are retained while non-cross-linked nanoparticles are dissolved in the developing solution and are separated from the front film layer to be removed, therefore completing patterning of the nanoparticle layer.

A displaying base plate includes an opening region, an adjacent region surrounding the opening region, and a displaying region surrounding the adjacent region, and the displaying base plate located within the adjacent region includes: a substrate base plate; a flat layer and a passivation layer that are provided on one side of the substrate base plate, wherein the passivation layer is provided on one side of the flat layer that is further away from the substrate base plate, a surface of the one side of the flat layer that is further away from the substrate base plate includes at least an inclined plane adjacent to one side of the opening region, and the flat layer includes a first protrusion provided on the inclined plane; and a first isolating groove that at least partially overlaps with the first protrusion and extends throughout the passivation layer and extends into the first protrusion.

Embodiments of the present disclosure generally relate to electroluminescent (EL) devices. More specifically, embodiments described herein relate to methods for forming arrays of the EL devices and selectively patterning a filler material in the EL devices. The EL device formed from the methods described herein will have improved outcoupling efficiency because of the patterned filler. The methods described herein pattern the filler and provide large area, low cost, and high resolution EL device formation by not relying on ink-jet printing or thermal evaporation with a fine metal mask.

A pixel defining structure includes a first sub-pixel defining structure surrounding a first sub-pixel region configured to form a first sub-pixel having a first color. The first sub-pixel defining structure includes a lyophilic portion one the bottom side of the first sub-pixel region and a lyophobic portion on a side opposite to the bottom side. The pixel defining structure includes a second sub-pixel defining structure surrounding a second sub-pixel region configured to form a second sub-pixel having a second color. The second sub-pixel defining structure includes a lyophilic portion one the bottom side of the second sub-pixel region and a lyophobic portion on a side opposite to the bottom side. The second color is different from the first color. Thicknesses of the lyophilic portion of the first sub-pixel defining structure and the lyophilic portion of the second sub-pixel defining structure are different.

The present invention addresses the problem of providing a photosensitive resin composition which exhibits good imidization rate even in cases where the photosensitive resin composition is fired at a temperature of 200° C. or less, while having high pattern processability, and a cured film of which exhibits high long-term reliability if used in an organic EL display device. In order to solve the above-described problem, a photosensitive resin composition according to the present invention contains (a) a polyimide precursor, (b) a phenolic compound having an electron-withdrawing group and (c) a photosensitive compound; and the polyimide precursor (a) has a residue which is derived from a diamine that has an ionization potential of less than 7.1 eV.

A method of fabricating microstructures of polar elastomers includes coating a substrate with a dielectric material including a polar elastomer, coating the dielectric material with a photoresist, exposing the photoresist to ultraviolet (UV) light through a photomask to define a pattern on the photoresist, developing the photoresist to form the pattern on the photoresist, etching the dielectric material to transfer the pattern from the photoresist to the dielectric material, and removing the photoresist from the patterned dielectric material.

The present disclosure relates to a photolithography process method and a display device manufactured thereby, and more particularly, to a photolithography process method using a quantum dot thin film having greatly improved resistance to an organic solvent by applying a quantum dot coated with ligand onto a substrate and injecting a precursor used in atomic layer deposition, and a display manufactured thereby.

According to an aspect, a display device includes: a substrate; a planarization layer provided on the substrate; a plurality of electrodes provided on the planarization layer and arrayed in a first direction and a second direction; a bank provided on the planarization layer and the electrodes and formed in a grid pattern so as to surround each of the electrodes; and a light-emitting layer provided on the electrodes. The bank protrudes with respect to the electrodes in a third direction orthogonal to the first direction and the second direction, and a cutout is formed in part of the bank.