The present disclosure, in some embodiments, relates to a memory device. The memory device includes a bottom electrode via and a bottom electrode over a top of the bottom electrode via. A data storage layer is over the bottom electrode and a top electrode is over the data storage layer. A top electrode via is on an upper surface of the top electrode and is centered along a first line that is laterally offset from a second line centered upon a bottommost surface of the bottom electrode via. The first line is perpendicular to the upper surface of the top electrode and parallel to the second line.

One example includes a method for making a switch. The method includes forming an insulating layer over a substrate. The method also includes forming a resistive heating material over the insulating layer. The method also includes depositing a thermally conductive electrically insulating barrier layer over the heating material. The method also includes forming a phase-change material (PCM) component over the barrier layer spaced apart and proximal to the resistive heating material. The method also includes forming a quench layer proximal to at least one of the resistive heating material and the PCM component. The method further includes forming conductive lines from ends of the PCM component and control lines from ends of the resistive heating material.

Subject matter described pertains to methods, apparatuses, and circuits for programming a memory device.

An IC (integrated circuit) chip includes a substrate and a phase-change material (PCM) radio frequency (RF) switch, having a heating element, a PCM situated over the heating element, and PCM contacts situated over passive segments of the PCM. The heating element extends transverse to the PCM and underlies an active segment of the PCM. An active device is situated in the substrate. In one approach, the PCM RF switch is situated over the substrate, and the substrate is a heat spreader for the PCM RF switch. In another approach, the PCM RF switch is situated in or above a first metallization level, and a dedicated heat spreader is situated under the PCM RF switch. Alternatively, a PCM RF switch is situated in a flip chip, an active device is situated in the IC chip, and the flip chip is situated over the IC chip forming a composite device.

In fabricating a semiconductor device, a shared material is formed in a resonator region of the semiconductor device and in a phase-change material (PCM) switch region of the semiconductor device. A portion of the shared material is removed to concurrently form a heat spreader comprising the shared material in the PCM switch region and a piezoelectric segment comprising the shared material in the resonator region. The piezoelectric segment in the resonator region and the heat spreader in the PCM switch region are situated at substantially the same level in the semiconductor device. The PCM switch region includes a heating element between the heat spreader and a PCM. The resonator region includes the piezoelectric segment between two electrodes.

A radio frequency (RF) switch includes a phase-change material (PCM) and a heating element underlying an active segment of the PCM, the PCM and heating element being situated over a substrate. A contact dielectric is over the PCM. PCM contacts have upper portions and uniform plate slot lower portions. The uniform plate slot lower portions have a total plate resistance R.sub.PLATE, and a total plate slot interface resistance R.sub.PLATE-INT. The upper portions have a total capacitance C.sub.UPPER to the uniform plate slot lower portions, and the PCM has a total capacitance C.sub.PCM to the substrate. The uniform plate slot lower portions significantly reduce a product of (R.sub.PLATE+R.sub.PLATE-INT) and (C.sub.UPPER+C.sub.PCM). As an alternative to the uniform plate slot lower portions, PCM contacts have segmented lower portions. The segmented lower portions significantly reduce C.sub.UPPER.

A semiconductor device includes a substrate and a phase-change material (PCM) radio frequency (RF) switch, having a heating element, a PCM situated over the heating element, and PCM contacts situated over passive segments of the PCM. The heating element extends transverse to the PCM and underlies an active segment of the PCM. In one approach, the PCM RF switch is situated over the substrate, and the substrate is a heat spreader for the PCM RF switch. An integrated passive device (IPD) is disposed in an interlayer dielectric above the PCM RF switch, and is a metal resistor, a metal-oxide-metal (MOM) capacitor, and/or and inductor. In another approach, the PCM RF switch is disposed in an interlayer dielectric above the IPD, and the IPD is a poly resistor and/or a capacitor.

A semiconductor device includes a substrate, an integrated passive device (IPD), and a phase-change material (PCM) radio frequency (RF) switch. The PCM RF switch includes a heating element, a PCM situated over the heating element, and PCM contacts situated over passive segments of the PCM. The heating element extends transverse to the PCM, with a heater line underlying an active segment of the PCM. The PCM RF switch is situated over a heat spreader that is situated over the substrate. The heat spreader and/or the substrate dissipate heat generated by the heating element and reduce RF noise coupling between the PCM RF switch and the IPD. An electrically insulating layer can be situated between the heat spreader and the substrate. In another approach, the PCM RF switch is situated over an RF isolation region that allows the substrate to dissipate heat and that reduces RF noise coupling.

A high-yield, tunable radio frequency (RF) filter includes a plurality of process-dependent capacitors and a plurality of non-volatile RF switches. Each of the plurality of process-dependent capacitors is connected to at least one of the plurality of non-volatile RF switches. An auxiliary capacitor in the plurality of process-dependent capacitors is engaged by an ON-state non-volatile RF switch in the plurality of non-volatile RF switches. A primary capacitor in the plurality of process-dependent capacitors is disengaged by an OFF-state non-volatile RF switch in the plurality of non-volatile RF switches. The auxiliary capacitor substitutes for the primary capacitor.

The present description concerns a switch based on a phase-change material comprising: a region of the phase-change material; a heating element electrically insulated from the region of the phase-change material; and one or a plurality of pillars extending in the region of the phase-change material, the pillar(s) being made of a material having a thermal conductivity greater than that of the phase-change material.