Provided is an electron emission source including a substrate, a fixed structure provided on the substrate, and an electron emission yarn provided between the substrate and the fixed structure. The fixed structure includes a first portion having a first width and a second portion having a second width greater than the first width, and the electron emission yarn extends on a first sidewall of the first portion of the fixed structure from between the fixed structure and the substrate.

A method of designing an x-ray emitter panel 100 including the step of determining a pitch scale, r, to be used in placing x-ray emitter elements 110 on the panel 100, thereby arriving at a specific design of x-ray emitter panel 100 suitable for a specific use.

A method and system for cleaning a field emission cathode device, the field emission cathode device including a substrate having a field emission layer engaged therewith, includes engaging the field emission cathode device with a vibration device such that the substrate is disposed above the field emission layer. The field emission cathode device is then vibrated with the vibration device in an X, Y, or Z direction at a predetermined frequency and at a predetermined amplitude for a predetermined time duration so as to clean the field emission cathode device by dislodging non-embedded particles from the field emission layer.

The present invention relates to large area field emission devices based on the incorporation of macroscopic, microscopic, and nanoscopic field enhancement features and a designed forced current sharing matrix layer to enable a stable high-current density long-life field emission device. The present invention pertains to a wide range of field emission sources and is not limited to a specific field emission technology. The invention is described as an X-ray electron source but can be applied to any application requiring a high current density electron source.

Provided is an electron emission source including a substrate, a fixed structure provided on the substrate, and an electron emission yarn provided between the substrate and the fixed structure. The fixed structure includes a first portion having a first width and a second portion having a second width greater than the first width, and the electron emission yarn extends on a first sidewall of the first portion of the fixed structure from between the fixed structure and the substrate.

A method and system for cleaning a field emission cathode device, the field emission cathode device including a substrate having a field emission layer engaged therewith, includes engaging the field emission cathode device with a vibration device such that the substrate is disposed above the field emission layer. The field emission cathode device is then vibrated with the vibration device in an X, Y, or Z direction at a predetermined frequency and at a predetermined amplitude for a predetermined time duration so as to clean the field emission cathode device by dislodging non-embedded particles from the field emission layer.

Provided is an electron emission source including a substrate, a fixed structure provided on the substrate, and an electron emission yarn provided between the substrate and the fixed structure. The fixed structure includes a first portion having a first width and a second portion having a second width greater than the first width, and the electron emission yarn extends on a first sidewall of the first portion of the fixed structure from between the fixed structure and the substrate.

An electron emission element (20) includes a first electrode (30a) and a second electrode (40) which are arranged facing each other, an intermediate layer (50) that is provided between the first electrode (30a) and the second electrode (40), and an insulating layer (60) that is formed with a thickness d1 on a substrate (30). A level difference between the insulating layer (60) and the first electrode (30a) is smaller than the thickness d1 of the insulating layer (60).

Enhanced Coulomb repulsion (electron) screening around light element nuclei is achieved by way of utilizing target structures (e.g., nanoparticles) that undergo plasmon oscillation when subjected to electromagnetic (EM) radiation, whereby transient high density electron clouds are produced in localized regions of the target structures during each plasmon oscillation cycle. Each target structure includes an integral body composed of an electrically conductive material that contains light element atoms (e.g., metal hydrides, metal deuterides or metal tritides). The integral body is also configured (i.e., shaped/sized) to undergo plasmon oscillations in response to the applied EM radiation such that the transient high density electron clouds are formed during each plasmon oscillation cycle, whereby brief but significantly elevated charge density variations are generated around light element (e.g., deuterium) atoms located in the localized regions, thereby enhancing Coulomb repulsion screening to enhance nuclear fusion reaction rates. Various target structure compositions and configurations are disclosed.

Provided are an electron emission device having a novel structure and being capable of improving characteristics and/or extending a lifetime of a related-art electron emission device, and a method of manufacturing the electron emission device. The method of manufacturing an electron emission device includes: a step A of providing one of an aluminum substrate and an aluminum layer supported by a substrate; a step B of anodizing a surface of the one of the aluminum, substrate and the aluminum layer to form a porous alumina layer having a plurality of pores; a step C of applying silver nanoparticles into the plurality of pores to cause the plurality of pores to support the silver nanoparticles; a step D of applying, after the step C, an insulating layer forming solution to substantially an entire surface of the one of the aluminum substrate and the aluminum layer; a step E of forming, after the step D, an insulating layer by at least reducing a solvent included in the insulating layer forming solution; and a step F of forming an electrode on the insulating layer.