Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.

An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.

An ion generator includes: an arc chamber which defines a plasma generation space; a cathode which emits thermoelectrons toward the plasma generation space; and a repeller which faces the cathode with the plasma generation space interposed therebetween. The arc chamber includes a box-shaped main body on which a front side is open, and a slit member which is mounted to the front side of the main body and provided with a front slit for extracting ions. An inner surface of the main body which is exposed to the plasma generation space is made of a refractory metal material, and an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.

An ion generator includes: an arc chamber which defines a plasma generation space; a cathode which emits thermoelectrons toward the plasma generation space; and a repeller which faces the cathode with the plasma generation space interposed therebetween. The arc chamber includes a box-shaped main body on which a front side is open, and a slit member which is mounted to the front side of the main body and provided with a front slit for extracting ions. An inner surface of the main body which is exposed to the plasma generation space is made of a refractory metal material, and an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.

An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.

An apparatus for generating electron radiation comprises a wire-shaped hot cathode that is much more extensive in a longitudinal direction than in a transverse direction. Electron radiation emerges from the hot cathode that, due to the elongated shape of the hot cathode, exhibits an elongated, line-shaped cross section perpendicular to its direction of propagation, where the extension in longitudinal direction of the line is significantly greater than in transverse direction of the line. The apparatus further comprises a cathode electrode and an anode. A voltage for accelerating the electrons emitted from the hot cathode is applied between the cathode electrode and the anode. The hot cathode is arranged to be spaced apart from the cathode electrode such that electrons that are accelerated to the anode are emitted from the hot cathode in each of the transverse directions.

An apparatus for generating electron radiation comprises a wire-shaped hot cathode that is much more extensive in a longitudinal direction than in a transverse direction. Electron radiation emerges from the hot cathode that, due to the elongated shape of the hot cathode, exhibits an elongated, line-shaped cross section perpendicular to its direction of propagation, where the extension in longitudinal direction of the line is significantly greater than in transverse direction of the line. The apparatus further comprises a cathode electrode and an anode. A voltage for accelerating the electrons emitted from the hot cathode is applied between the cathode electrode and the anode. The hot cathode is arranged to be spaced apart from the cathode electrode such that electrons that are accelerated to the anode are emitted from the hot cathode in each of the transverse directions.

An electron gun includes an emitter, an electron gun electrode, and a short-circuiting mechanism for setting the emitter and the electron gun electrode at the same potential. The short-circuiting mechanism includes a first switch member provided with a first switch electrode that is connected to the emitter and a second switch electrode that is connected to the electron gun electrode, a second switch member provided with a third switch electrode, and a drive unit that operates at least one of the first switch member and the second switch member to switch between a state in which the first switch electrode and the second switch electrode are in contact with the third switch electrode and a state in which the first switch electrode and the second switch electrode are separated from the third switch electrode. The short-circuiting mechanism has the same potential as a predetermined voltage.

An electron gun includes an emitter, an electron gun electrode, and a short-circuiting mechanism for setting the emitter and the electron gun electrode at the same potential. The short-circuiting mechanism includes a first switch member provided with a first switch electrode that is connected to the emitter and a second switch electrode that is connected to the electron gun electrode, a second switch member provided with a third switch electrode, and a drive unit that operates at least one of the first switch member and the second switch member to switch between a state in which the first switch electrode and the second switch electrode are in contact with the third switch electrode and a state in which the first switch electrode and the second switch electrode are separated from the third switch electrode. The short-circuiting mechanism has the same potential as a predetermined voltage.