Systems and methods are described herein for electron-beam lithography. In some aspects, a photo electron emitter and channel array assembly (PEECAA) may include a photo-electron emitting cathode having a uniform planar surface and an array of beam channels proximate to the cathode. In some cases, at least one of the cathode or the array of beam channels is removable from the PEECAA. The array of beam channels may include a grid of apertures, a plurality of beam channels, and a shared lens array including a plurality of lenses proximate to an exit of the plurality of beam channels. Individual apertures of the grid of apertures align with individual beam channels to allow electrons from the cathode to pass through the array of beam channels and the shared lens array to form a pixelated pattern, such that, upon exposure to the target, the pixelated pattern is permanently formed on the target.

A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.

A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.

An electron microscope equipped with automatic beam alignment is provided. The electron microscope can include a vacuum chamber having a receiving space to allow a measurement target specimen to be positioned inside the vacuum chamber. The electron microscope can also include an electron gun coupled to a top of the vacuum chamber with an insulating panel between the electron gun and the vacuum chamber and including a filament module configured to receive power from a power supply and emit an electron beam toward the measurement target specimen. The filament module can be connected to the power supply via a flexible wire inserted into a through hole of the insulating panel such that an assembly error is prevented from occurring when the filament module is coupled to the through hole and the electron beam emitted from the filament module is automatically aligned with a reference optical axis.

Disclosed are a filament positioning system and a filament positioning method. The filament positioning system includes a bottom plate, a first positioning regulating mechanism and a second positioning regulating mechanism, wherein the first positioning regulating mechanism is configured to conduct positioning regulation of a position of a filament seat on the bottom plate, so that filament seats of different models can be fixed to the bottom plate, and the second positioning regulating mechanism is configured to conduct positioning regulation on the filament; and a detection module configured to collect and display position information of a filament tip and the filament seat, wherein the first positioning regulating mechanism and the second positioning regulating mechanism correspondingly regulate positions of the filament seat and the filament tip according to the position information.

Disclosed are a filament positioning system and a filament positioning method. The filament positioning system includes a bottom plate, a first positioning regulating mechanism and a second positioning regulating mechanism, wherein the first positioning regulating mechanism is configured to conduct positioning regulation of a position of a filament seat on the bottom plate, so that filament seats of different models can be fixed to the bottom plate, and the second positioning regulating mechanism is configured to conduct positioning regulation on the filament; and a detection module configured to collect and display position information of a filament tip and the filament seat, wherein the first positioning regulating mechanism and the second positioning regulating mechanism correspondingly regulate positions of the filament seat and the filament tip according to the position information.

The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

A charged particle microscope and a method of operating a charged particle microscope are disclosed. The microscope employs a source for producing charged particles, and a source lens below the source to form a charged particle beam which is directed onto a specimen by a condenser system. A detector collects radiation emanating from the specimen in response to irradiation of the specimen by the beam. The source lens is a compound lens, focusing the beam within a vacuum enclosure using both a magnetic lens having permanent magnets outside the enclosure to produce a magnetic field at the beam, and a variable electrostatic lens within the enclosure.

A charged particle microscope and a method of operating a charged particle microscope are disclosed. The microscope employs a source for producing charged particles, and a source lens below the source to form a charged particle beam which is directed onto a specimen by a condenser system. A detector collects radiation emanating from the specimen in response to irradiation of the specimen by the beam. The source lens is a compound lens, focusing the beam within a vacuum enclosure using both a magnetic lens having permanent magnets outside the enclosure to produce a magnetic field at the beam, and a variable electrostatic lens within the enclosure.

A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam sources include an emitter including one or more emitter tips configured to generate one or more electron beams of a plurality of electron beams. The electron beam sources include a stack of one or more positioners configured to adjust a position of the emitter based on one or more measurements of the electron beam generated by the emitter. The emitter is configured to scan the one or more electron beams across an area surrounding a bore of an electron-optical column of the plurality of electron-optical columns. The electron beam source array includes a carrier plate and a source tower. The source tower is configured to adjust a position of the plurality of electron beam sources relative to a position of the plurality of electron-optical columns.