An emitter includes an insulator, a pair of terminals attached to the insulator separately from each other, at least one filament attached between the pair of terminals in an arch shape, and an electron source fixed to the filament. The filament has bent portions between a contact with respect to the electron source and contacts with respect to the terminals. A device is provided with the emitter.

Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic body 1 having a through hole 10 formed by an inner wall surface; and a negative electrode 2 and a positive electrode 3 which are arranged, respectively, on one end and the other end of the through hole 10 in the ceramic body. The inner wall surface of the ceramic body 1 is configured such that a first region 22, which is electrically connected with the negative electrode 2, and a second region 23, which is electrically connected with the positive electrode 3, are electrically connected to each other. The surface resistivity of the first region 22 is lower than the surface resistivity of the second region 23.

Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic body 1 having a through hole 10 formed by an inner wall surface; and a negative electrode 2 and a positive electrode 3 which are arranged, respectively, on one end and the other end of the through hole 10 in the ceramic body. The inner wall surface of the ceramic body 1 is configured such that a first region 22, which is electrically connected with the negative electrode 2, and a second region 23, which is electrically connected with the positive electrode 3, are electrically connected to each other. The surface resistivity of the first region 22 is lower than the surface resistivity of the second region 23.

A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.

A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.

Sterilization apparatus for sterilizing packaging containers, the sterilization apparatus comprising a first carousel for supporting a plurality of sterilization devices, the sterilization devices being adapted to sterilize an interior of the packaging containers by electron beam irradiation, and a transport system for transporting the packaging containers, the transport system comprising a second carousel coaxial with the first carousel, wherein the first carousel comprises a first rotatable shaft and the second carousel comprises a separate second rotatable shaft coaxial with the first rotatable shaft.

The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.

The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.

An emitter includes an insulator, a pair of terminals attached to the insulator separately from each other, at least one filament attached between the pair of terminals in an arch shape, and an electron source fixed to the filament. The filament has bent portions between a contact with respect to the electron source and contacts with respect to the terminals. A device is provided with the emitter.

Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 sec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.410{circumflex over ()}-6 cGy/bunch.