Patent classifications
H01J37/073
PARTICLE BEAM GUN CONTROL SYSTEMS AND METHODS
Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}-6 cGy/bunch.
Plasmonic photocathode emitters at ultraviolet and visible wavelengths
A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure can serve as a spot-confining structure and an electrical underlayer for biasing the photocathode. The plasmonic structure can confine the incident light at subwavelength sizes.
FILAMENT-LESS ELECTRON SOURCE
Electron sources can include an electron source crystal coupled in series between opposing electrically conductive supports to form an electrically conductive path, wherein the electrical resistance of each of the electrically conductive supports is lower than the electrical resistance of the electron source crystal. Electron source crystals can include an emitting end and opposing shank end, wherein the shank end includes opposing leg portions. Electrically conductive supports can include foil supports spaced apart across a gap, wherein each of the opposing leg portions is attached to a respective foil support such that the foil supports are electrically connected to form the electrically conductive path. Particle focusing system are also disclosed. Electron sources can include an electron source crystal having an emitting end and opposing shank end, wherein the shank end is formed of a pair of opposing leg portions. Methods of manufacturing and operating electron sources are also disclosed.
Dielectric Coated Plasmonic Photoemitter
A dielectric coated plasmonic photoemitter is provided. An aspect of the present photonic apparatus includes a conductive photoemitter including a dielectric material coating or layered on a metallic core. The dielectric material being configured to enhance a local optical field strength and current density of the photoemitter as compared to a bare photoemitter without the dielectric layer. The dielectric layered photoemitter being tunable to transmit photoemissions from corners thereof with different photonic characteristics depending on a laser wavelength pulse received.
Dielectric Coated Plasmonic Photoemitter
A dielectric coated plasmonic photoemitter is provided. An aspect of the present photonic apparatus includes a conductive photoemitter including a dielectric material coating or layered on a metallic core. The dielectric material being configured to enhance a local optical field strength and current density of the photoemitter as compared to a bare photoemitter without the dielectric layer. The dielectric layered photoemitter being tunable to transmit photoemissions from corners thereof with different photonic characteristics depending on a laser wavelength pulse received.
Particle beam gun control systems and methods
Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}−6cGy/bunch.
Particle beam gun control systems and methods
Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}−6cGy/bunch.
Electron Gun, Electron Beam Applicator, and Method for Controlling Electron Gun
The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.
Electron Gun, Electron Beam Applicator, and Method for Controlling Electron Gun
The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.
PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTICLE MICROSCOPE
A particle beam system includes a multi-source system. The multi-source system comprises an electron emitter array as a particle multi-source. The inhomogeneous emission characteristics of the various emitters in this multi-source system are correctable, or pre-correctable for subsequent particle-optical imaging, via particle-optical components that are producible via MEMS technology. A beam current of the individual particle beams is adjustable in the multi-source system.