The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disposed in the magnetic field, and a multi-filament heater configured to directly heat the cathode tip to emit electrons through the magnetic lens. The multi-filament heater includes a first filament connected at each end to first and second positive terminals of a power source and a second filament connected at each end to first and second negative terminals of the power source. The first positive terminal, the second positive terminal, the first negative terminal, and the second negative terminal are arranged alternately around the cathode tip such that the first filament and the second filament intersect at the cathode tip and a resultant magnetic force applied to the cathode tip is reduced.

The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disposed in the magnetic field, and a multi-filament heater configured to directly heat the cathode tip to emit electrons through the magnetic lens. The multi-filament heater includes a first filament connected at each end to first and second positive terminals of a power source and a second filament connected at each end to first and second negative terminals of the power source. The first positive terminal, the second positive terminal, the first negative terminal, and the second negative terminal are arranged alternately around the cathode tip such that the first filament and the second filament intersect at the cathode tip and a resultant magnetic force applied to the cathode tip is reduced.

A charged particle beam source, such as for use in an electron microscope, can include an electrically conductive support member coupled to a base, a mounting member coupled to the support member and defining a bore, and an emitter member received in the bore and retained by a fixative material layer flowed around the emitter member in the bore.

A charged particle beam source, such as for use in an electron microscope, can include an electrically conductive support member coupled to a base, a mounting member coupled to the support member and defining a bore, and an emitter member received in the bore and retained by a fixative material layer flowed around the emitter member in the bore.

An electron gun includes a cathode that is heated to emit thermions; a cathode heating power supply that supplies a cathode heating current for heating the cathode; a grid that has a first aperture formed therein and that has a grid voltage applied thereto, the grid voltage having a potential lower than that of the cathode, wherein the grid converges the thermions passing through the first aperture by the grid voltage; an anode that has a second aperture formed therein and that has an anode voltage applied thereto, wherein the anode causes the thermions extracted from the cathode to pass through the second aperture as an electron beam by the anode voltage; an anode-voltage power supply that applies the anode voltage to the anode; and a controller that causes the anode voltage having a positive potential to be applied from the anode-voltage power supply to the anode.

An electron gun includes a cathode that is heated to emit thermions; a cathode heating power supply that supplies a cathode heating current for heating the cathode; a grid that has a first aperture formed therein and that has a grid voltage applied thereto, the grid voltage having a potential lower than that of the cathode, wherein the grid converges the thermions passing through the first aperture by the grid voltage; an anode that has a second aperture formed therein and that has an anode voltage applied thereto, wherein the anode causes the thermions extracted from the cathode to pass through the second aperture as an electron beam by the anode voltage; an anode-voltage power supply that applies the anode voltage to the anode; and a controller that causes the anode voltage having a positive potential to be applied from the anode-voltage power supply to the anode.

The invention relates to a gas injector (10) for supplying gas or a gas mixture to a reaction region (16). The gas injector (10) contains a main part (12) with a gas channel (14). Furthermore, a gas feed (30) is provided for the gas channels (14). The gas or the gas mixture reaches the reaction region (16) from the gas channel (14) via a first opening (26) or a first group (54) of openings (26) in the main part. The main part (12) is equipped with a second opening (27) or a second group (56) of openings (27) via which the gas of the gas mixture likewise reaches the reaction region (16) from the gas channel (14). Each of the openings (26, 27) or the groups (54, 56) of openings (26, 27) is paired with a respective separate gas feed (30, 40) in the main part (12) on the gas channel (14).

The invention relates to a gas injector (10) for supplying gas or a gas mixture to a reaction region (16). The gas injector (10) contains a main part (12) with a gas channel (14). Furthermore, a gas feed (30) is provided for the gas channels (14). The gas or the gas mixture reaches the reaction region (16) from the gas channel (14) via a first opening (26) or a first group (54) of openings (26) in the main part. The main part (12) is equipped with a second opening (27) or a second group (56) of openings (27) via which the gas of the gas mixture likewise reaches the reaction region (16) from the gas channel (14). Each of the openings (26, 27) or the groups (54, 56) of openings (26, 27) is paired with a respective separate gas feed (30, 40) in the main part (12) on the gas channel (14).

In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

A device for providing electrons and its method of making. The device includes an optical fiber with a tip and a metallic arrangement arranged at the tip. The metallic arrangement is arranged to be excited by an energy source to emit electrons or electron beams.