A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

An annular apparatus is provided for generating accelerated electrons, wherein ions from a glow discharge plasma may be accelerated onto the surface of an annular second cathode and electrons emitted by the annular second cathode may be accelerated towards an annular electron exit window by a second electrical voltage applied between the annular second cathode and an annular second anode, wherein a housing is designed as a first cathode; a first anode comprises a number of wire-like electrodes which extend completely or partially through an annular evacuable space, and wherein a second reservoir contains a hydrocarbon-containing compound which may be admitted into the evacuable space through the at least one first inlet.

The present invention is a High-Power Plasma Electron Beam Installation (HPPEBI) system. The system comprises a cathode configured to generate high-energy electron beams within a vacuum chamber, an anode to stabilize the plasma, wherein the focus of the electron beam is based on cathode geometry, enabling cylindrical, circular, point, or linear configurations. The electron beam delivers energy directly to the target material, inducing localized heating, melting, evaporation, or structural modifications with minimal impact on surrounding areas. The system facilitates precise and efficient processes, such as phase transformations, thin film deposition, and defect creation, enhancing material properties. Cooling mechanisms integrated with the cathode and anode prevent overheating during high-energy operations.

The present invention is a High-Power Plasma Electron Beam Installation (HPPEBI) system. The system comprises a cathode configured to generate high-energy electron beams within a vacuum chamber, an anode to stabilize the plasma, wherein the focus of the electron beam is based on cathode geometry, enabling cylindrical, circular, point, or linear configurations. The electron beam delivers energy directly to the target material, inducing localized heating, melting, evaporation, or structural modifications with minimal impact on surrounding areas. The system facilitates precise and efficient processes, such as phase transformations, thin film deposition, and defect creation, enhancing material properties. Cooling mechanisms integrated with the cathode and anode prevent overheating during high-energy operations.