Provided is a charged particle beam device capable of stably obtaining an effect of improving the depth of focus or the effect of correcting spherical aberration. The charged particle beam device includes an aperture having an annular slit or an electrode having an annular slit and is provided with means for adjusting the incident angle at which the charged particle beam is incident on the aperture or the electrode. Since the incident angle at which the charged particle beam is incident on the aperture or electrode having an annular slit can be made closer to perpendicular, the effect of improving the depth of focus or the effect of correcting spherical aberration can be stably obtained.

An ion beam apparatus includes a source part generating plasma therein, a process part in which a process using an ion beam is performed, and a slit structure provided between the source part and the process part and extracting the ion beam from the plasma. The slit structure includes at least one electrode structure. The electrode structure has a slit penetrating the electrode structure and extending in a first direction. The ion beam is irradiated onto a substrate at an incident angle through the slit. The incident angle of the ion beam is adjusted by rotating the electrode structure on a rotation axis parallel to the first direction.

Elongated or other non-circular charged-particle beams (CPBs) are used to produce substrate images that can be processed such as by deconvolution to produce a final image. In some cases, first and second images associated with an asymmetric CPB beams aligned along parallel axes are deconvolved and then combined to produce the final image or combined and then deconvolved to produce the final image. Milling or other processing can be performed by aligning an asymmetric CPB with respect to a CPB scan or processing direction.

Elongated or other non-circular charged-particle beams (CPBs) are used to produce substrate images that can be processed such as by deconvolution to produce a final image. In some cases, first and second images associated with an asymmetric CPB beams aligned along parallel axes are deconvolved and then combined to produce the final image or combined and then deconvolved to produce the final image. Milling or other processing can be performed by aligning an asymmetric CPB with respect to a CPB scan or processing direction.

An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.

A substrate processing apparatus includes an upper chamber including an ion source generator, a grid system overlapping the ion source generator in a vertical direction and configured to extract and accelerate an ion source generated by the ion source generator, and a lower chamber, wherein the lower chamber includes, therein, a support configured to support a substrate, a plurality of reflectors arranged in the vertical direction above the support, and a switch configured to switch each of the plurality of reflectors between an on-state and an off-state.

A substrate processing apparatus includes an upper chamber including an ion source generator, a grid system overlapping the ion source generator in a vertical direction and configured to extract and accelerate an ion source generated by the ion source generator, and a lower chamber, wherein the lower chamber includes, therein, a support configured to support a substrate, a plurality of reflectors arranged in the vertical direction above the support, and a switch configured to switch each of the plurality of reflectors between an on-state and an off-state.

The present disclosure relates to modular assembly for engaging modules of an apparatus together. The assembly comprising two modules configured to be mutually engageable to adjoin each other. The modules each having a body and multiple engagers that are each configured to engage with a corresponding engager of another of the modules and to complete a corresponding verification circuit. Each verification circuit is configured to be closed on engagement of an engager of one of the modules with a corresponding engager of the other of the modules. The engager is configured to be electrically isolated from the body of the one of the two modules, and the corresponding engager is configured to be electrically connected to the body of the other of the two modules.

Embodiments of the present disclosure include systems, methods, algorithms, and non-transitory media storing computer-readable instructions for charged particle imaging and microanalysis. A charged particle beam system can include an objective lens assembly, defining an aperture collocated with a first axis. The system can include a bifurcated acceleration tube. The acceleration tube can include a primary segment, a secondary segment, intersecting the primary segment, the secondary segment being oriented at an angle, a, relative to the first axis, and a common segment, disposed at least partially in the aperture. The system can include a separator. The separator can include one or more charged-particle optical elements disposed in the common segment and configured to apply a deflection force to electrons having a negative velocity in a first direction. The deflection force can redirect the electrons toward a second direction substantially aligned with a second axis.

Embodiments of the present disclosure include systems, methods, algorithms, and non-transitory media storing computer-readable instructions for charged particle imaging and microanalysis. A charged particle beam system can include an objective lens assembly, defining an aperture collocated with a first axis. The system can include a bifurcated acceleration tube. The acceleration tube can include a primary segment, a secondary segment, intersecting the primary segment, the secondary segment being oriented at an angle, a, relative to the first axis, and a common segment, disposed at least partially in the aperture. The system can include a separator. The separator can include one or more charged-particle optical elements disposed in the common segment and configured to apply a deflection force to electrons having a negative velocity in a first direction. The deflection force can redirect the electrons toward a second direction substantially aligned with a second axis.