A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

A coating system for coating a substrate by an arc discharge comprises a target holder for holding a target; a substrate holder arranged along an emission axis behind the target holder for holding a substrate to be coated by the target; an anode for generating an arc discharge between the target holder and the anode, wherein the anode is arranged between the target holder and the substrate holder; an manipulation system arranged along the emission axis behind the anode, which is arranged to generate an electric and/or magnetic field for influencing a plasma propagating from the target holder along the emission axis by the arc discharge. A method for generating a plasma by an arc discharge and for manipulating the plasma by a magnetic field generated by one or more than one electromagnetic coil disposed along the emission axis behind the anode.

A method to stabilize position and shape of a plasma beam established between a cathode and an anode, where an electrical field is established between the cathode and the anode and where the shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided and the at least one oriented electromagnetic coil has its coil axis oriented in a non-colinear manner to the reference line in such a way that at least one of the straight lines which are intersecting both of the coil openings and which are parallel to the coil axis intersects with the reference line and where a current is sent through the at least one oriented electromagnetic coil in order to establish a magnetic field which is used to deflect or attract the plasma beam.